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公开(公告)号:US20130128256A1
公开(公告)日:2013-05-23
申请号:US13692865
申请日:2012-12-03
申请人: Joeri LOF , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
发明人: Joeri LOF , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
IPC分类号: G03F9/00
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
摘要: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
摘要翻译: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准,并且使用先前的映射可以准确地暴露衬底。 因此,映射不会发生在液体环境中。
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公开(公告)号:US20110279800A1
公开(公告)日:2011-11-17
申请号:US13194136
申请日:2011-07-29
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/42
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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13.Illumination system for illuminating a patterning device and method for manufacturing an illumination system 失效
标题翻译: 用于照射图案形成装置的照明系统和用于制造照明系统的方法公开(公告)号:US07889321B2
公开(公告)日:2011-02-15
申请号:US11730751
申请日:2007-04-03
CPC分类号: G03F7/70833 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/702 , G03F7/70808
摘要: An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
摘要翻译: 照明系统包括壳体和位于壳体内的光学系统。 光学系统包括至少一个光学元件。 光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。 中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。
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公开(公告)号:US07593093B2
公开(公告)日:2009-09-22
申请号:US11710408
申请日:2007-02-26
申请人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
发明人: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号:US07514186B2
公开(公告)日:2009-04-07
申请号:US11167560
申请日:2005-06-28
IPC分类号: G03F1/00
CPC分类号: G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/38 , G03F1/40 , G03F7/707 , G03F7/70708 , G21K2201/06
摘要: A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.
摘要翻译: 掩模版包括设置有用于将掩模版电接地的导电金属基复合涂层的区域。 掩模版适用于光刻设备,由此使用极紫外辐射对掩模版图案进行成像。 保持在零电位的一个或多个导电引脚可以被压靠在导电涂层上,以在通过电子束写入或在光刻设备中的使用期间在掩模版图案化期间将掩模版电接地。 涂覆有金属基化合物的区域是耐磨的,其减少由于导电引脚和导电涂层之间的机械接触而引起的损伤的发生。
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16.Illumination system for illuminating a pattering device and method for manufacturing an illumination system 失效
标题翻译: 用于照明图案装置的照明系统和用于制造照明系统的方法公开(公告)号:US20080246940A1
公开(公告)日:2008-10-09
申请号:US11730751
申请日:2007-04-03
CPC分类号: G03F7/70833 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/702 , G03F7/70808
摘要: An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
摘要翻译: 照明系统包括壳体和位于壳体内的光学系统。 光学系统包括至少一个光学元件。 光学系统被构造和布置成用从中间焦点分散的辐射束照射图案形成装置。 中间焦点位于基本上在照明系统的底部的相同水平或低于底部的位置处。
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公开(公告)号:US07213963B2
公开(公告)日:2007-05-08
申请号:US10857614
申请日:2004-06-01
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和传感器之间的空间填充有液体。
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18.Lithographic apparatus and device manufacturing method involving a member and a fluid opening 有权
标题翻译: 涉及构件和流体开口的平版印刷设备和设备制造方法公开(公告)号:US09152058B2
公开(公告)日:2015-10-06
申请号:US13194136
申请日:2011-07-29
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03F7/20
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
摘要翻译: 一种曝光装置,包括可移动工作台,构件,可移动地与工作台分离并且位于工作台的顶表面上,以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统 被配置为将辐射束投射到基板的辐射敏感目标部分上,以及液体供应系统,其配置成向投影系统和物体之间的空间提供液体。
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公开(公告)号:US08472002B2
公开(公告)日:2013-06-25
申请号:US12698938
申请日:2010-02-02
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号:US20120274911A1
公开(公告)日:2012-11-01
申请号:US13306532
申请日:2011-11-29
申请人: Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Joannes Theodoor De Smit , Johannes Catherinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Joannes Theodoor De Smit , Johannes Catherinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/52
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和传感器之间的空间填充有液体。
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