公开(公告)号：US08428336B2

公开(公告)日：2013-04-23

申请号：US11431709

申请日：2006-05-11

申请人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

发明人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

IPC分类号： G06K9/00

CPC分类号： G06F3/0486 ,  G06F2203/04803 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148

摘要： A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.

摘要翻译： 一种用于对缺陷进行分类的方法，包括：通过对样品上的缺陷进行成像而获得的缺陷图像的特征量化计算; 通过使用关于计算的特征量的信息将缺陷图像分类成分类的类别; 在分类的类别的显示屏幕上的区域中显示分类的缺陷图像; 将分类类别的信息添加到所显示的缺陷图像; 将所述分类类别中的信息添加到所述其他类别中的所显示的缺陷图像，并且将所传送的缺陷图像显示在所述显示屏幕上定义为所述其他类别之一的区域中; 并更改关于该类别的信息。

公开(公告)号：US07733474B2

公开(公告)日：2010-06-08

申请号：US12081107

申请日：2008-04-10

申请人： Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

发明人： Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

IPC分类号： G01N21/00

CPC分类号： H04N7/18 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increase a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, an oblique detection optics system receives the light from the defect at a reduced elevation angle with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and increases the amount of the light from the defect and detected. The diameter of a lens is smaller than the diameter of a second lens, resulting in a reduction in the ability to focus the scattered light.

摘要翻译： 缺陷检查系统可以抑制来自样品粗糙表面或规则电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益，以高灵敏度检测样品表面上的缺陷。 当使用具有大NA值的透镜时，倾斜检测光学系统相对于样品表面以降低的仰角接收来自缺陷的光，以减少来自样品粗糙表面的光，氧化膜粗糙的底表面和 电路图案，并且增加来自缺陷的光的量并检测。 透镜的直径小于第二透镜的直径，导致聚焦散射光的能力降低。

公开(公告)号：US07068834B1

公开(公告)日：2006-06-27

申请号：US09452149

申请日：1999-12-01

申请人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

发明人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

IPC分类号： G06K9/00

CPC分类号： G06F3/0486 ,  G06F2203/04803 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148

摘要： The present invention has an analyzing unit including an image detection device for producing a plurality of images of a workpiece, a storage for storing detected images produced by the image detection device, and a display having a screen with a first area for displaying a plurality of detected images stored in the storage and a plurality of second areas for classifying the detected images according to features of the detected images, whereby the plurality of detected images are moved on the screen from the first area to selected second areas to classify the plurality of detected images in the second areas.

摘要翻译： 本发明具有一种分析单元，包括用于产生工件的多个图像的图像检测装置，用于存储由图像检测装置产生的检测图像的存储器以及具有用于显示多个图像的第一区域的屏幕的显示器 检测存储在存储器中的图像和多个第二区域，用于根据检测到的图像的特征对检测到的图像进行分类，由此多个检测图像在屏幕上从第一区域移动到选定的第二区域，以对多个检测到的图像进行分类 图像在第二个区域。

公开(公告)号：US5059559A

公开(公告)日：1991-10-22

申请号：US265704

申请日：1988-11-01

申请人： Michio Takahashi ,  Tooru Mita ,  Yasuo Nakagawa ,  Toshimitsu Hamada ,  Hisafumi Iwata ,  Aizo Kaneda ,  Kouji Serizawa ,  Hiroyuki Tanaka ,  Koichi Sugimoto ,  Toshihiko Sakai ,  Keizo Matsukawa ,  Tsutomu Mimata

发明人： Michio Takahashi ,  Tooru Mita ,  Yasuo Nakagawa ,  Toshimitsu Hamada ,  Hisafumi Iwata ,  Aizo Kaneda ,  Kouji Serizawa ,  Hiroyuki Tanaka ,  Koichi Sugimoto ,  Toshihiko Sakai ,  Keizo Matsukawa ,  Tsutomu Mimata

IPC分类号： H01L21/00 ,  H01L21/603

CPC分类号： H01L21/67144 ,  H01L24/50 ,  Y10T29/49121

摘要： The present invention relates to a multi-pin chip mounting method and apparatus based on a TAB (Tape Automated Bonding) system in which leads formed on a tape and bumps formed an IC chip are aligned with each other and compress-bonded to each other. An IC chip having bumps formed on a surface thereof and inner leads formed on a carrier tape are disposed opposite to each other at a bonding station. A position of the IC chip on a stage is detected through the inner leads at the bonding station to determine the amount of correction of position of the stage. The inner leads and the IC chip are aligned with each other on the basis of the determined correction amount and are thereafter bonded to each other.

摘要翻译： 本发明涉及一种基于TAB（磁带自动接合）系统的多针芯片安装方法和装置，其中形成在磁带上的引线和形成IC芯片的凸起彼此对准并且彼此压接。 在其表面形成有凸起的IC芯片和形成在载带上的内部引线在接合台处彼此相对设置。 通过焊接台的内部引线检测台架上的IC芯片的位置，以确定台阶位置的校正量。 内部引线和IC芯片基于确定的校正量彼此对准，然后彼此结合。

公开(公告)号：US20100271473A1

公开(公告)日：2010-10-28

申请号：US12770337

申请日：2010-04-29

申请人： Kenji AIKO ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

发明人： Kenji AIKO ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

IPC分类号： H04N7/18 ,  G01N21/88 ,  G02B3/02

CPC分类号： H04N7/18 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is 10a, and an angle between the sample surface and a traveling direction of the light from a defect is α1. An oblique detection optics system receives the light from the defect at a reduced elevation angle α2 with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and to increase the amount of the light from the defect and detected. The diameter 10a of a lens is smaller than the diameter 10b, resulting in a reduction in the ability to focus the scattered light. When a lens with an outer diameter 10c is used to improve the focus ability, the lens interferes with the sample. To avoid the interference, a portion of the lens interfering with the sample is removed. The lens has an aperture larger than the diameter 10b while the lens receives the light scattered at the elevation angle α2, making it possible to improve the ability to detect defects and lens performance simultaneously.

摘要翻译： 缺陷检查系统可以抑制来自样品粗糙表面或常规电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益以高灵敏度检测样品表面上的缺陷。 当使用具有大NA值的透镜时，透镜的外径为10a，并且样品表面与来自缺陷的光的行进方向之间的角度为α1。 倾斜检测光学系统以相对于样品表面的降低的仰角α2接收来自缺陷的光，以减少来自样品粗糙表面，氧化膜粗糙底表面和电路图案的光，并且增加 来自缺陷的光并检测。 透镜的直径10a小于直径10b，导致散射光聚焦的能力降低。 当使用外径为10c的透镜来提高聚焦能力时，透镜会干扰样品。 为了避免干扰，去除了与样品干扰的一部分透镜。 透镜具有大于直径10b的孔径，而透镜接收以仰角α2散射的光，从而可以提高同时检测缺陷和透镜性能的能力。

公开(公告)号：US20080291436A1

公开(公告)日：2008-11-27

申请号：US12081107

申请日：2008-04-10

申请人： Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

发明人： Kenji Aiko ,  Shuichi Chikamatsu ,  Minori Noguchi ,  Hisafumi Iwata

IPC分类号： G01N21/88

CPC分类号： H04N7/18 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is 10a, and an angle between the sample surface and a traveling direction of the light from a defect is α1. An oblique detection optics system receives the light from the defect at a reduced elevation angle α2 with respect to the sample surface to reduce light from the sample rough surface, an oxide film rough bottom surface, and a circuit pattern, and to increase the amount of the light from the defect and detected. The diameter 10a of a lens is smaller than the diameter 10b, resulting in a reduction in the ability to focus the scattered light. When a lens with an outer diameter 10c is used to improve the focus ability, the lens interferes with the sample. To avoid the interference, a portion of the lens interfering with the sample is removed. The lens has an aperture larger than the diameter 10b while the lens receives the light scattered at the elevation angle α2, making it possible to improve the ability to detect defects and lens performance simultaneously.

摘要翻译： 缺陷检查系统可以抑制来自样品粗糙表面或常规电路图案的光的影响，并且增加来自诸如异物的缺陷的光的增益以高灵敏度检测样品表面上的缺陷。 当使用具有大NA值的透镜时，透镜的外径为10a，并且样品表面与来自缺陷的光的行进方向之间的角度为α1。 倾斜检测光学系统以相对于样品表面的降低的仰角α2接收来自缺陷的光，以减少来自样品粗糙表面，氧化膜粗糙底表面和电路图案的光，并且增加 来自缺陷的光并检测。 透镜的直径10a小于直径10b，导致散射光聚焦的能力降低。 当使用外径为10c的透镜来提高聚焦能力时，透镜会干扰样品。 为了避免干扰，去除了与样品干扰的一部分透镜。 透镜具有大于直径10b的孔径，而透镜接收以仰角α2散射的光，从而可以提高同时检测缺陷和透镜性能的能力。

公开(公告)号：US20060274932A1

公开(公告)日：2006-12-07

申请号：US11431709

申请日：2006-05-11

申请人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

发明人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

IPC分类号： G06K9/00 ,  G06K9/62 ,  G06K9/46

CPC分类号： G06F3/0486 ,  G06F2203/04803 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148

摘要： A method for classifying defects, including: calculating feature quantifies of defect image which is obtained by imaging a defect on a sample; classifying the defect image into a classified category by using information on the calculated feature quantities; displaying the classified defect image in a region on a display screen which is defined to the classified category; adding information on the classified category to the displayed defect image; transferring the displayed defect image which is added the information on the classified category to one of the other categories and displaying the transferred defect image in a region on the display screen which is defined to the one of the other categories; and changing information on the category.

公开(公告)号：US20060139629A1

公开(公告)日：2006-06-29

申请号：US11296290

申请日：2005-12-08

申请人： Yoshimasa Ohshima ,  Hisafumi Iwata ,  Hiroyuki Nakano

发明人： Yoshimasa Ohshima ,  Hisafumi Iwata ,  Hiroyuki Nakano

IPC分类号： G01N21/88

CPC分类号： G01N21/47 ,  G01N21/21 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8825

摘要： There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.

摘要翻译： 公开了一种将激光束聚焦并将其照射到待检查样品的表面上的缺陷检测装置，并且由于将光束照射到散射光上而检测存在于表面上的异物/缺陷 样品表面。 为了稳定地检测异物等缺陷，根据本发明的缺陷检测装置的结构是使用光束形状光学系统，通过该光束系统将从激光源发射的激光束成形为将照射强度从其高斯分布改变为 平坦分布，使得即使改变了缺陷/异物与激光束照射位置的相对位置，也能够稳定地产生检测信号。

公开(公告)号：US06826735B2

公开(公告)日：2004-11-30

申请号：US10196146

申请日：2002-07-17

申请人： Makoto Ono ,  Hisafumi Iwata ,  Kanako Harada

发明人： Makoto Ono ,  Hisafumi Iwata ,  Kanako Harada

IPC分类号： G06F1750

CPC分类号： G01N21/95684 ,  G06T7/0002 ,  G06T7/62 ,  G06T2200/24 ,  G06T2207/30148

摘要： Inspection data output from an inspection apparatus is read, the inspection data containing at least one information piece of coordinate value information and size information of a particle or a pattern defect of an inspected object, and drawing data of a product of the inspected object is read. Information is extracted which is representative of a relation between at least one information piece of coordinated value information and size information of the particle or pattern defect of the inspected object in the read inspection data and the read drawing data input at said drawing data input step. The extracted information is compared with determination criterion information registered beforehand and it is determined whether each particle or pattern defect of the inspected object in the inspection data is a detection error or not.

摘要翻译： 读取从检查装置输出的检查数据，读取包含检测对象的粒子或图案缺陷的坐标值信息和尺寸信息的至少一个信息的检查数据和被检查对象的乘积的绘制数据 。 提取信息，其代表在读取检查数据中的至少一个协调价值信息信息和被检查对象的粒子或图案缺陷的尺寸信息与在所述绘制数据输入步骤输入的读取绘制数据之间的关系。 将提取的信息与预先登记的确定标准信息进行比较，并且确定检查数据中被检查对象的每个粒子或图案缺陷是否是检测错误。

公开(公告)号：US06775817B2

公开(公告)日：2004-08-10

申请号：US10004168

申请日：2001-10-30

申请人： Makoto Ono ,  Hisafumi Iwata ,  Keiko Kirino

发明人： Makoto Ono ,  Hisafumi Iwata ,  Keiko Kirino

IPC分类号： G06F1750

CPC分类号： H01L21/67271 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/20

摘要： A method and system are provided for analyzing defects having the potential to become electrical failures, during the inspection of particles and/or pattern defects of a wafer used in the manufacture of electronic devices such as semiconductor integrated circuits. Defect map data is processed along with failure probability data. Next, defect-dependent failure probability calculations are made to obtain the failure probability of each defect in the defect map data. That data is then used to prepare failure-probability-added defect map data. Further, a selection process of defects to be reviewed is used to reorder and filter defects from the failure-probability-added defect map data, thus selecting one or more defects for review.

摘要翻译： 提供了一种方法和系统，用于在用于制造诸如半导体集成电路的电子器件的晶片的颗粒和/或图案缺陷的检查期间分析具有变为电气故障的可能性的缺陷。 缺陷图数据与故障概率数据一起处理。 接下来，进行与缺陷相关的故障概率计算，以获得缺陷图数据中的每个缺陷的故障概率。 然后将该数据用于准备故障概率添加缺陷图数据。 此外，使用要检查的缺陷的选择处理用于从故障概率添加缺陷图数据重新排序和过滤缺陷，从而选择一个或多个缺陷以供审查。