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公开(公告)号:US3833519A
公开(公告)日:1974-09-03
申请号:US27006972
申请日:1972-07-10
Applicant: M & T CHEMICALS INC
Inventor: EJK A , RINGWOOD R
Abstract: IMPROVED STABILIZER COMPOSITIONS WHICH REQUIRE LESS TIN TO IMPART A GIVEN DEGREE OF HEAT STABILIZATION TO VINYL CHLORIDE-CONTAINING POLYMERS ARE OBTAINED USING REACTION PRODUCTS OF DIORGANOTIN COMPOUNDS WITH ESTERS OF ALIPHATIC POLYHYDROXYLATED ORGANIC COMPOUNDS IN COMBINATION WITH CERTAIN BARIUM DERIVATES. UP TO 50% OF THE ORGANOTIN REACTION PRODUCT PRESENT IN A POLYMER COMPOSITION CAN BE REPLACED BY BARIUM COMPOUNDS WITHOUT A SIGNIFICANT DECREASE IN HEAT STABILIZATION.
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公开(公告)号:US3804728A
公开(公告)日:1974-04-16
申请号:US26215172
申请日:1972-06-12
Applicant: M & T CHEMICALS INC
Abstract: THIS INVENTION RELATES TO NOVEL COMPOSITION AND TO A PROCESS FOR ELECTROPLATING CHROMIUM PLATE INTO A BASIS METAL WHICH COMPRISES PASSING CURRENT FROM AN ANODE TO A CATHODE AT LEAST A PORTION OF WHICH CONTAINS A CONDUCTIVE METAL LAYER THROUGH AN AQUEOUS ACIDIC CHROMIUM PLATING SOLUTION CONTAINING: (1) AT LEAST ONE CHROMIUM COMPOUND PROVIDING HEXAVALENT CHROMIUM IONS FOR ELECTROPLATING CHROMIUM; AT LEAST ONE CATALYST SELECTED FROM THE GROUP COMPRISING SULFATE IONS, COMPLEX FLUORIDE IONS AND FLUORIDE IONS; (2) AT LEAST ONE MEMBER OF THE GROUP CONSISTING OF SULFOACETATE AND SULFOACETIC ACID, ISETHINATE AND ISETHIONIC ACID, AND (3) AT LEAST ONE SOLUBLE COMPOUND CONTAINING SELENIUM; FOR A TIME SUFFICIENT TO DEPOSIT A CHROMIUM ELECTROPLATE HAVING A THICKNESS OF AT LEAST 1X10**4 MILLIMETER.
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公开(公告)号:US3804726A
公开(公告)日:1974-04-16
申请号:US35331073
申请日:1973-04-23
Applicant: M & T CHEMICALS INC
Inventor: PASSAL F
Abstract: THIS INVENTION RELATES TO A PROCESS AND COMPOSITION FOR THE PREPARATION OF AN ELECTRODEPOSIT WHICH CONTAINS AT LEAST ONE METAL SELECTED FROM THE GROUP CONSISTING OF NICKEL AND COBALT AND WHICH ALSO MAY CONTAIN IRON, WHICH COMPRISES PASSING CURRENT FROM AN ANODE TO A CATHODE THROUGH AN AQUEOUS PLATING SOLUTION CONTAINING AT LEAST ONE MEMBER SELECTED FROM THE GROUP CONSISTING OF COBALT COMPOUNDS AND NICKEL COMPOUNDS AND WHICH MAY ALSO CONTAIN IRON COMPOUNDS TO PROVIDE COBALT, NICKEL AND FERROUS IONS FOR ELECTRODEPOSITING COBALT, NICKEL NICKEL-COBALT ALLOYS, NICKEL-IRON ALLOYS, OR NICKEL-COBALT-IRON ALLOYS THE IMPROVEMENT COMPRISING THE PRESENCE OF AN EFFECTIVE AMOUNT OF BORIC ACID AND AT LEAST ONE MEMBER SELECTED FROM THE GROUP CONSISTING OF MANNITOL, SORBITOL, AND DULCITOL IN A SINGLE OR COMBINED CONCENTRATION OF 2 GRAMS PER LITER TO 100 GRAMS PER LITER FOR A TIME PERIOD SUFFICIENT TO FORM A SOUND METAL ELECTROPLATE UPON SAID CATHODE SURFACE.
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公开(公告)号:US3758390A
公开(公告)日:1973-09-11
申请号:US3758390D
申请日:1971-06-18
Applicant: M & T CHEMICALS INC
Abstract: THIS INVENTION RELATES TO NOVEL COMPOSITIONS AND TO A PROCESS FOR ELECTROPLATING CHROMIUM PLATE ONTO A BASIS METAL WHICH COMPRISES PASSING CURRENT FROM AN ANODE TO A CATHODE AT LEAST A PORTION OF WHICH CONTAINS A CONDUCTIVE METAL LAYER THROUGH AN AQUEOUS ACIDIC CHROMIUM PLATING SOLUTION CONTAINING: (1) AT LEAST ONE CHROMIUM COMPOUND PROVIDING HEXAVALENT CHROMIUM IONS FOR ELECTROPLATING CHROMIUM; AT LEAST ONE CATALYST SELECTED FROM THE GROUP COMPRISING SULFATE IONS AND FLUORIDE IONS, AND (2) AT LEAST ONE MEMBER OF THE GROUP CONSISTING OF SULFOACETIC ACID, ISETHIONATE AND ISETHIONIC ACID; FOR A TIME SUFFICIENT TO DEPOSIT A CHROMIUM ELECTROPLATE HAVING A THICKNESS OF AT LEAST 1X10**-4 MILLIMETER.
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公开(公告)号:US3758341A
公开(公告)日:1973-09-11
申请号:US3758341D
申请日:1971-10-29
Applicant: M & T CHEMICALS INC
Inventor: WOWK A
CPC classification number: C07F7/2268 , C08K5/58 , C08L27/06
Abstract: THIS INVENTION COMPRISES NOVEL COMPOUNDS EXHIBITING THE FORMULA:
CL-SN(-R)(-S-R''-COO-R")N-(S-R''-COO-SN(-R''")2-O-R")(2-N)
WHEREIN R,R'', R" AND R"'' ARE HYDROCARBONS AND N IS O OR 1, METHODS OF PREPARING THESE NOVEL COMPOUNDS, AND POLYMERS STABILIZED BY THESE NOVEL COMPOUNDS AGAINST THE DETERIORATIVE EFFECTS OF HEAT AND LIGHT.-
公开(公告)号:US3755096A
公开(公告)日:1973-08-28
申请号:US3755096D
申请日:1971-07-01
Applicant: M & T CHEMICALS INC
Inventor: PASSAL F
IPC: C07D307/46 , C08G65/28 , C25D3/32 , C23B5/14 , C23B5/46
CPC classification number: C07D307/46 , C25D3/32
Abstract: This invention relates to the electrodeposition of tin; acid tin plating compositions, acid tin plating baths; to processes for the electrodeposition of bright tin in the presence of glacial acrylic acid, at least one non-ionic alkoxylated wetting agent, and as a novel brightener, the reaction product of hexan-2,5dione and a compound selected from the group consisting of homocyclic aromatic aldehydes and 5-membered ring heterocyclic aldehydes, wherein the aldehyde group is bonded directly to the aromatic ring, conjugated aromatic ring or 5-membered ring heterocyclic group, said ring or group being otherwise inertly substituted or unsubstituted; to said novel brighteners; and a method of producing said novel brighteners.
Abstract translation: 本发明涉及电沉积锡; 酸性镀锡组合物,酸性锡电镀浴; 在冰丙烯酸,至少一种非离子烷氧基化润湿剂存在下电沉积光亮的锡的方法,并且作为新型增白剂,己二-2,5-二酮与选自下组的化合物的反应产物 由环状芳族醛和5元环杂环醛组成,其中醛基直接键合到芳香环,共轭芳环或5元环杂环基团,所述环或基团为惰性取代或未取代的; 对所述新型增白剂; 以及生产所述新型增白剂的方法。
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17.
公开(公告)号:US3715333A
公开(公告)日:1973-02-06
申请号:US3715333D
申请日:1969-11-13
Applicant: M & T CHEMICALS INC
Inventor: LARKIN W
Abstract: This invention relates to stabilizing compositions; to the process for preparing a novel halogen-containing polymer; and to polymers stabilized against the deteriorative effect of heat which comprises a vinyl chloride or vinylidene chloride homopolymer or copolymer and a stabilizing amount of: as a first stabilizer an organotin halide exhibiting the formula RSnX3 wherein R is a hydrocarbon and X is halogen and as a second stabilizer a sulfur-containing organotin compound exhibiting two direct carbon to tin bonds and two direct sulfur to tin bonds.
Abstract translation: 本发明涉及稳定化组合物; 涉及制备新型含卤聚合物的方法; 以及针对包含氯乙烯或偏二氯乙烯均聚物或共聚物的稳定量的稳定的热稳定化的聚合物,作为第一稳定剂,表现出式RS n X 3的有机锡卤化物,其中R是烃,X是卤素,作为 第二稳定剂是显示两个直接碳 - 锡键和两个直接硫 - 锡键的含硫有机锡化合物。
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公开(公告)号:US3686196A
公开(公告)日:1972-08-22
申请号:US3686196D
申请日:1968-02-01
Applicant: M & T CHEMICALS INC
Inventor: CONSIDINE WILLIAM J , SELTZER RAYMOND
IPC: C07D285/08 , C07D513/22 , C08G75/02 , C08G75/32 , C08D13/10 , C08G33/02
CPC classification number: C07D285/08 , C08G75/02 , C08G75/32
Abstract: IN ACCORDANCE WITH CERTAIN OF ITS ASPECTS, THIS INVENTION RELATES TO NOVEL COMPOSITIONS AND TO A PROCESS FOR PREPARING A POLYMER COMPRISING RECURRING UNITS OF THE FORMULA:
(5-(R-S-),3-((-)S-)-1,2,4-THIADIAZOLE)N
IN WHICH R IS SELECTED FROM THE GROUP CONSISTING OF ALKYLENE, ACTIVATED ARYLENE, ARALKYLENE, ACTIVATED ALKARYLENE, AND DIVALENE HETEROCYCLIC GROUPS AND N IS AN INTEGER AT LEAST 2, WHICH COMPRISES REACTING (I) A DIFUNCTIONAL COMPOUND OF THE FORMULA:
X-R-X
IN WHICH X IS A HALOGEN RADICAL OR AN ESTER GROUP OF A LOWER CARBOXYLIC ACID WITH (II) A STABLE METAL PERTHIOCYANATE; AND RECOVERING SAID POLYMER.-
公开(公告)号:US3681378A
公开(公告)日:1972-08-01
申请号:US3681378D
申请日:1967-04-17
Applicant: M & T CHEMICALS INC
Inventor: PASSAL FRANK
IPC: C07D233/84 , C07D233/86 , C25D3/18 , C07D49/32
CPC classification number: C25D3/18 , C07D233/84 , C07D233/86
Abstract: This invention relates to novel processes and to novel Beta cyanoethylated compounds selected from the group consisting of Beta -cyanoethylated thiohydantoin, Beta -cyanoethylated thiobarbituric acid, and Beta -cyanoethylated 2-thiouracil. This invention relates to electroplating nickel and more particularly to the electrodeposition of bright nickel.
Abstract translation: 本发明涉及新颖的方法和新颖的β-氰基乙烯基化合物,其选自β-氰基乙基化硫代乙内酰脲,β-氰基乙基化硫代巴比妥酸和β-氰基乙基化的2-硫尿嘧啶。
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公开(公告)号:US3658820A
公开(公告)日:1972-04-25
申请号:US3658820D
申请日:1969-12-19
Applicant: M & T CHEMICALS INC
Inventor: PASSAL FRANK
IPC: C07D233/84 , C07D233/86 , C07D51/24
CPC classification number: C07D233/86 , C07D233/84
Abstract: THIS INVENTION RELATES TO A B-CYANOETHYLATED THIOBARBITURIC ACID SELECTED FROM THE GROUP CONSISTING OF THOSE OF THE FORMULAE:
1-(NC-CH2-CH2-),2-(S=),5,5-DI(NC-CH2-CH2-)-HEXAHYDRO-
PYRIMIDINE-4,6-DIONE
2-(S=),5-(NC-CH2-CH2-)-HEXAHYDROPYRIMIDINE-4,6-DIONE,
1,5-DI(NC-CH2-CH2-),2-(S=)-HEXAHYDROPYRIMIDIN-4,6-DIONE
1,3,5,5-TETRA(NC-CH2-CH2-),2-(S=)-HEXAHYDROPYRIMIDIN-
4,6-DIONE
THESE COMPOUNDS ARE USED AS PRIMARY BRIGHTENERS IN NICKEL PLATING.
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