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    Nickel plating
    2.
    发明授权
    Nickel plating 失效
    镍镀层

    公开(公告)号：US3677913A

    公开(公告)日：1972-07-18

    申请号：US3677913D

    申请日：1971-04-01

    Applicant: M & T CHEMICALS INC

    Inventor： PASSAL FRANK

    IPC: C25D3/14 ,  C23B5/08 ,  C23B5/46

    CPC classification number: C25D3/14

    Abstract: THE NOVEL PROCESS OF THIS INVENTION FOR ELECTROPLATING A SEMI-BRIGHT SUFLUR-FREE, NICKEL PLATE ONTO A BASIS METAL COMPRISING PASSING FROM AN ANODE TO A BASIS METAL CATHODE THROUGH AN AQUEOUS ACIDIC NICKEL PLATING SOLUTION CONTAINING AT LEAST ONE NICKEL COMPOUND PROVIDING NICKEL IONS FOR ELECTROPLATING OF NICKEL, AND INCLUDING AS COOPERATING SEMI-BRIGHT ADDITIVES: (A) THE ALIPHATIC ACETYLENIC COMPOUND 3-HEXYNE-2,5-DIOL, AND (B) A COMPOUND CONTAINING AN OXYAMEGASULFOHYDROCARBON-DI-YL COUMARIN ANION WHEREIN THE HYDROCARBON-DI-YL MOIETY CONTAINS AT LEAST TWO CARBON ATOMS AND WHEREIN THE OXYOMEGASULFOHYDROCARBON-DI-YL GROUP IS SUBSTITUTED ON THE CARBOCYLIC NUCLEUS OF THE COUMARIN GROUP.

    Novel processes and compositions for electroplating nickel
    4.
    发明授权
    Novel processes and compositions for electroplating nickel 失效
    电镀镍的新工艺及组合物

    公开(公告)号：US3592943A

    公开(公告)日：1971-07-13

    申请号：US3592943D

    申请日：1967-10-25

    Applicant: M & T CHEMICALS INC

    Inventor： PASSAL FRANK

    IPC: C25D3/18 ,  C23B5/08

    CPC classification number: C25D3/18

    Abstract: IN ACCORDANCE WITH CERTAIN OF ITS ASPECTS, THIS INVENTION RELATES TO NOVEL COMPOSITIONS AND TO AN IMPLROVED PROCESS FOR ELECTROPLATING BRIGHT NICKEL WHICH COMPRISES ELECTRODEPOSITING NICKEL FROM AN AQUEOUS NICKEL-CONTAINING ELECTROPLATING BATH WHICH CONTAINS (A) A FIRST PRIMARY BRIGHTENER, (B) A SECONDARY BRIGHTENER, AND (C) AS AN ADDITIONAL COOPERATING PRIMARY BRIGHTENER, A NITROGEN-HETEROCYCLIC COMPOUND OF THE FORMULA:

    (A-(RING(-R*)A)-(R)B-)X-RING(-R*)A-A WHERE A IS ATTACHED

    TO N

    WHEREIN EACH

    RING

    IS INDEPENDENTLY A PYRIDINE, QUINOOLINE OR ISOQUINOLINE NUCLEUS; EACH A IS AN INTEGER 0-6; EACH A IS INDEPENDENTLY OXYGEN (O) OR THE GROUP -OR''SO3M WHEREIN R'' IS A DIVALENT HYDROCARBON GROUP OF 1-12 CARBON ATOMS AND M IS HYDROGEN, A NITROGEN ATOM, OR A BATH-COMPATIBLE METAL CATION; R IS A DIVALENT GROUP CONTAINING 1-12 CARBON ATOMS; B AND X ARE INTEGERS 0-1; A IS

    -OR''SO3M

    WHEN X=0; AND R* IS A SUBSTITUENT SELECTED FROM THE GROUP CONSISTING OF ALKYL, HYDROXYALKYL, HALOGEN, ALKOXY, CARBOXYL, CARBALKOXY, ACETYL, SULFO, CARBOXAMIDE, CYANO, ARALKYL, ALKARYL, AND ARYL; ALL UNSUBSTITUTED CARBON ATOMS ARE BONDED TO HYDROGEN ATOMS; AND WHEN X=0 AND A IS - OR''SO3M, (D) A SECONDARY AUXILIARY BRIGHTENER.

    Electroplating processes and compositions
    7.
    发明授权
    Electroplating processes and compositions 失效
    电镀工艺和组合物

    公开(公告)号：US3697391A

    公开(公告)日：1972-10-10

    申请号：US3697391D

    申请日：1970-07-17

    Applicant: M & T CHEMICALS INC

    Inventor： PASSAL FRANK

    IPC: C25D3/12 ,  C25D3/56 ,  C23B5/08 ,  C23B5/32 ,  C23B5/46

    CPC classification number: C25D3/12 ,  C25D3/562

    Abstract: (A) PRIMARY BRIGHTENER (B) SECONDARY BRIGHTENER (C) SECONDARY AUXILIARY BRIGHTENER (D) ANTI-PITTING AGENT; AND

    (2) AN ORGANIC HYDROXY-SULFONATE COMPOUND OF THE FORMULA:

    (R-CH(-OH)-SO3(-))K M

    WHEREIN M IS A CATION HAVING A VALENCE OF 1-2; K IS AN INTEGER 1-2 CORRESPONDING TO THE VALENCE OF M; AND R IS HYDROGEN OR A MONOVALENT ALIPHATIC GROUP OF 1-16 CARBON ATOMS; FOR A TIME PERIOD SUFFICIENT TO FORM A SOUND METAL ELECTROPLATE UPON SAID CATHODE SURFACE.
    IN ACCORDANCE WITH CERTAIN OF ITS ASPECTS, THIS INVENTION RELATES TO A PROCESS FOR THE PREPARATION OF AN ELECTRODEPOSIT WHICH CONTAINS AT LEAST ONE METAL SELECTED FROM THE GROUP CONSISTING OF NICKEL AND COBALT WHICH COMPRISES PASSING CURRENT FROM AN ANODE TO A CATHODE THROUGH AN AQUEOUS PLATING SOLUTION CONTAINING A MEMBER SELECTED FROM THE GROUP CONSISTING OF COBALT COMPOUNDS AND NICKEL COMPOUNDS PROVIDING COBALT OR NICKEL IONS FOR ELECTRODEPOSITING COBALT OR NICKEL AND CONTAINING IN COMBINATION AN EFFECTIVE AMOUNT OF: (1) AT LEAST ONE MEMBER SELECTED FROM THE GROUP OF COOPERATING ADDITIVES CONSISTING OF:

    Nickel electroplating and electrolytes therefor
    9.
    发明授权
    Nickel electroplating and electrolytes therefor 失效
    镍电镀及其电解质

    公开(公告)号：US3677912A

    公开(公告)日：1972-07-18

    申请号：US7698770

    申请日：1970-09-30

    Applicant: M & T CHEMICALS INC

    Inventor： PASSAL FRANK

    IPC: C25D3/14 ,  C23B5/08 ,  C23B5/46

    CPC classification number: C25D3/14

    Abstract: IN ACCORDANCE WITH CERTAIN OF ITS ASPECTS, THE NOVEL PROCESS OF THIS INVENTION FOR ELECTROPLATING NICKEL MAY COMPRISE ELECTRODEPOSITING NICKEL FROM AN AQUEOUS NICKEL ELECTROPLATING BATH CONTAINING (A) AS A FIRST PRIMARY BRIGHTENER AN EFFECTIVE AMOUNT OF A WATER-SOLUBLE ACETYLENIC COMPOUND, AND (B) AS A SECOND PROMARY BRIGHTENER, AN EFFECTIVE AMOUNT OF A COMPOUND HAVING AS CATION:

    A-CH2-(+)N
    WHEREIN

    N
    IS A PYRIDINE, QUINOLINE, OR ISOQUINOLINE NUCLEUS; A IS 0-5; A IS-CX=CHX OR C$CH; X IS AN ACTIVE HALIDE; AND R* IS A SUBSTITUTENT SELECTED FROM THE GROUP CONSISTING OF ALKYL, PREFERABLY HAVING 1-4 CARBON ATOMS, HYDROXY-ALKYL PREFERABLY HAVING 1-4 CARBON ATOMS, HALOGEN, ALKOXY, CARBOXYL, CARBALKOXY, ACETYL, BENZYL, SULFO, CARBOXAMIDO, AND CYANO.

    Tin-lead alloy plating
    10.
    发明授权
    Tin-lead alloy plating 失效
    钛铅合金镀层

    公开(公告)号：US3926749A

    公开(公告)日：1975-12-16

    申请号：US54143275

    申请日：1975-01-16

    Applicant: M & T CHEMICALS INC

    Inventor： PASSAL FRANK

    IPC: C25D3/60 ,  H05K3/34 ,  C25D3/56

    CPC classification number: C25D3/60 ,  H05K3/3473

    Abstract: This invention relates to the electrodeposition of tin-lead alloys; tin-lead alloy plating compositions, tin-lead alloy plating baths; and to processes for the electrodeposition of tinlead alloys in the presence of at least one polyether surfactant and at least one aryl hydroxy (-OH) compound as cooperating additives.

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