摘要:
An excimer radiation lamp assembly. The lamp assembly comprises a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.
摘要:
There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.
摘要:
There is described an excimer radiation lamp assembly. The lamp assembly comprises: an elongate member having an annular cross-section to define an elongate passageway aligned with a longitudinal axis of the lamp assembly; an electrode element in electrical connection with at least a portion of the elongate passageway; and a cooling element disposed in the elongate passageway, the cooling element being electrically isolated with respect to the electrode element.
摘要:
There is disclosed an optical radiation sensor system. The system includes a sensor device and a cleaning device. The sensor device detects and responds to radiation from a radiation field and includes a surface that is movable with respect to the radiation field between a first position in which the surface is in the radiation field and a second position in which at least a portion of the surface is out of the radiation field. The cleaning device operates to remove fouling materials from at least a portion of the surface in the second position. The cleaning device may be a chemical cleaning device, a mechanical cleaning device or a combined chemical/mechanical device.
摘要:
There is described a photocatalyst composition of matter comprising a support material. A surface of the support material configured to comprise: (i) a first catalytic material for catalyzing the conversion of H2O to H2 and O2, and (ii) a second catalytic material catalyzing reaction of hydrogen with a target compound. The photocatalyst composition of matter can be used to treat an aqueous fluid containing a target chemical compound, for example, by a process comprising the steps of: (i) contacting the aqueous fluid with the above-mentioned photocatalyst composition of matter; (ii) contacting the aqueous fluid with radiation during Step (i); (iii) catalyzing the conversion of water in the aqueous fluid to H2 and O2 with the first catalytic material; and (iv) catalyzing reaction of the target chemical compound in the aqueous fluid with hydrogen from Step (iii) in the presence of the second catalytic material to produce a modified chemical compound.
摘要:
The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in contact with a first portion of the cavity comprising the mercury-containing material. The heating unit has adjustable heat output.
摘要:
There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.
摘要:
There is described an excimer radiation lamp assembly. The lamp assembly comprises: an elongate member having an annular cross-section to define an elongate passageway aligned with a longitudinal axis of the lamp assembly; an electrode element in electrical connection with at least a portion of the elongate passageway; and a cooling element disposed in the elongate passageway, the cooling element being electrically isolated with respect to the electrode element.
摘要:
There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.
摘要:
There is described an excimer radiation lamp assembly. The lamp assembly comprise a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.