公开(公告)号：US20040251143A1

公开(公告)日：2004-12-16

申请号：US10788811

申请日：2004-02-27

Applicant: Rohm and Haas Electronic Materials, L.L.C.

Inventor： Suda Kazuyuki ,  Makoto Kondo

IPC: B05B001/00 ,  C09D005/00 ,  C09D005/10

CPC classification number: C25D3/60 ,  C25D3/32

Abstract: A tin electroplating solution, characterized in that it has a pH of 1.5 to 6.0 and comprises the following components: (1) 5 to 60 g/L of a tin (II) ion, (2) a complexing agent, (3) a surfactant and (4) 0.01 to 0.5 g/L of a bismuth (III) ion; and a method for the tin plating of electronic parts or the like which comprises using the tin electroplating solution are disclosed. The tin electroplating solution exhibits a soldering wettability being comparable with or superior to a conventional tin-lead alloy (solder) without the use of hazardous lead or an organic brightening agent.

Abstract translation: 一种锡电镀溶液，其特征在于其pH为1.5至6.0，并包括以下组分：（1）5至60g / L的锡（II）离子，（2）络合剂，（3） 表面活性剂和（4）0.01〜0.5g / L的铋（III）离子; 并且公开了包括使用锡电镀溶液的电子部件等的镀锡方法。 锡电镀溶液表现出与常规锡铅合金（焊料）相当或优于焊锡润湿性，而不使用危险铅或有机增亮剂。

公开(公告)号：US20040220066A1

公开(公告)日：2004-11-04

申请号：US10835928

申请日：2004-04-30

Applicant: Rohm and Haas Electronic Materials, L.L.C.

Inventor： Edward W. Rutter JR.

IPC: H05H001/00

CPC classification number: H01L21/02063 ,  C11D7/14 ,  C11D7/3209 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/425 ,  H05K3/288

Abstract: Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are also provided.

Abstract translation: 提供了适合于从基底去除聚合物材料，特别是后等离子体蚀刻聚合物材料的组合物。 这些组合物含有一种或多种季铵硅酸盐作为活性成分。 还提供了使用这些组合物除去聚合物材料的方法。

公开(公告)号：US20040171773A1

公开(公告)日：2004-09-02

申请号：US10789857

申请日：2004-02-27

Applicant: Rohm and Haas Electronic Materials, L.L.C.

Inventor： Lujia Bu ,  Charles R. Szmanda ,  Kathleen B. Spear-Alfonso ,  Kathleen M. O'Connell

IPC: C08G002/00

CPC classification number: C08F6/04 ,  C08F214/22 ,  C08F259/08 ,  C08L51/003 ,  C08L27/16 ,  C08L2666/02

Abstract: Provided herein is a process of fractionating ferroelectric, preferably vinylidene fluoride polymers using a solvent having at least one polarizable functional group, and a precipitant. The composition of the fractionated ferroelectric polymers is selected so as to adjust the properties of a ferroelectric film made from the polymers. Films formed using the fractionated vinylidene fluoride polymers have improved properties, particularly with respect to roughness and crystal domain size, and suitability for use in data processing devices.

Abstract translation: 本文提供了使用具有至少一个可极化官能团的溶剂和沉淀剂来分选铁电体，优选偏二氟乙烯聚合物的方法。 选择分级铁电聚合物的组成以调节由聚合物制成的铁电体膜的性质。 使用分馏的偏二氟乙烯聚合物形成的膜具有改进的性能，特别是在粗糙度和晶体域尺寸方面，以及适用于数据处理装置。