公开(公告)号：US20210107887A1

公开(公告)日：2021-04-15

申请号：US16970116

申请日：2019-02-15

Applicant: ADEKA CORPORATION

Inventor： Kenji HARA ,  Wataru MIYATA ,  Masatomi IRISAWA

IPC: C07D335/16 ,  C08F2/50 ,  C08F2/44 ,  C08F16/06

Abstract: Provided are: a radical polymerization initiator which has excellent sensitivity and solubility in water; a composition containing the same; a cured product of the composition; a method of producing the cured product; and a compound. The radical polymerization initiator contains a compound represented by Formula (A) below (wherein Z1 represents a direct bond or the like; Z2 represents >CR1022 or the like; R1 to R8 each represent a hydrogen atom or the like, or a group containing a salt-forming group, which is represented by Formula (B1) below (wherein L1 represents a direct bond or the like, B represents an acidic group salt or the like, b represents 1 to 10, and the asterisk (*) represents a binding site); at least one of R1 to R8 is the group containing a salt-forming group; R101 and the like each represent a hydrogen atom or the like; one or more hydrogen atoms in the alkyl group and the like used as R1 to R8 and the like are optionally substituted with an ethylenically unsaturated group or the like; one or more methylene groups in R1 to R8 and the like are optionally substituted with a double bond or the like; adjacent groups such as R1 and R2 are optionally bound together to form a ring and optionally form a fused ring with a benzene ring in Formula (A); and R′ represents a hydrogen atom or the like).

公开(公告)号：US20180039179A1

公开(公告)日：2018-02-08

申请号：US15551736

申请日：2016-02-23

Applicant: ADEKA CORPORATION

Inventor： Toshihiko MURAI ,  Kenji HARA ,  Masatomi IRISAWA

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16 ,  G03F7/095 ,  G03F7/039

CPC classification number: G03F7/11 ,  G03F7/0035 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/027 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/095 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/32 ,  G03F7/322 ,  G03F7/325 ,  G03F7/40

Abstract: Provided are: a pattern-forming method by which a laminate that has excellent interlayer adhesion of a resist film, yields a high-definition pattern and exhibits excellent gas barrier properties and high solvent resistance is obtained; and an electronic device produced by the same. The pattern-forming method includes: the step (1) of forming a film using a composition on a support; the exposure step (2) of irradiating a prescribed part of the thus formed film with an active energy ray to modify the developability of the prescribed part; and the development step (3) of developing the film to obtain a pattern, wherein, a plurality of compositions that differ in solubility to a developing solution are used as the composition, and the resulting pattern has a multilayer structure.