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    Process for preparing a planographic printing form
    11.
    发明授权
    Process for preparing a planographic printing form 失效
    制作平面印刷形式的过程

    公开(公告)号：US3617266A

    公开(公告)日：1971-11-02

    申请号：US3617266D

    申请日：1968-03-06

    Applicant: AGFA GEVAERT NV

    Inventor： WILLEMS JOZEF FRANS ,  ENGELAND JOZEF LEONARD VAN ,  VOLDER NOEL JOZEF DE

    IPC: G03G13/28 ,  G03G13/22 ,  G03F7/02

    CPC classification number: G03G13/28

    Abstract: A planographic printing plate prepared by electrostatic exposure and development and carrying a hydrophobic deposit from such development in the image areas thereof is hydrophilized by treatment with an aqueous solution containing a polymeric compound having in the recurring units thereof an amino salt and/or quaternary salt group the polymer compound being free of long chain hydrocarbon groups. Preferred hydrophilizing compounds are polyamines having aliphatic linkages between the amino groups and polyvinyl compounds having hydrogen-containing heterocyclic side groups.

    Light-sensitive material
    13.
    发明授权
    Light-sensitive material 失效

    公开(公告)号：US3595662A

    公开(公告)日：1971-07-27

    申请号：US3595662D

    申请日：1967-12-07

    Applicant: AGFA GEVAERT NV

    Inventor： WILLEMS JOZEF FRANS ,  THIERS ROBRECHT JULIUS

    IPC: G03C1/09 ,  G03C1/34

    CPC classification number: G03C1/09 ,  G03C1/346

    Abstract: A LIGHT-SECSITVE MATERIAL COMPRISING A SILVER HALIDE EMULSION LAYER AND CONTAINING A MERCURY(II) CHELATE OF A (POLY) AMINO-(POLY)CARBOXYLIC ACID IN THE FORM OF THE ACID OR A WATER-SOLUBLE SALT IS DESCRIBED. THE CHELATC EXERSTS A STABILIZING AND FOG-INHIBITING ACTION UPON THE LIGHTSENSITIVE MATERIAL WITHOUT CAUSING APPRECIABLE DESENSITIZATION.

    Photography
    17.
    发明授权
    Photography 失效
    摄影

    公开(公告)号：US3658535A

    公开(公告)日：1972-04-25

    申请号：US3658535D

    申请日：1968-11-27

    Applicant: AGFA GEVAERT NV

    Inventor： WILLEMS JOZEF FRANS

    IPC: G03C5/50 ,  G03C5/32

    CPC classification number: G03C5/50

    Abstract: The method of rendering silver halides developable in photographic elements by treating the elements with a processing liquid comprising a tin(II)chelate of a (poly)amino(poly)carboxylic acid in acid form or in the form of a water-soluble salt is described. The aforesaid tin(II)chelates have good chemical fogging action forming developable specks in a light-sensitive silver halide material and remain stable in alkaline solutions permitting their incorporation in a developer solution eliminating need of an independent processing bath.

    Abstract translation: 通过用包含酸形式或水溶性盐形式的（多）氨基（多）羧酸的锡（II）螯合物的处理液处理元素，可以在照相元件中显影银卤化物的方法， 描述。 上述锡（II）螯合物具有良好的化学雾化作用，在感光卤化银材料中形成可显影斑点，并且在碱性溶液中保持稳定，允许其结合到显影剂溶液中，消除了独立处理浴的需要。

    Photographic material with improved surface properties
    18.
    发明授权
    Photographic material with improved surface properties 失效
    具有改进表面特性的摄影材料

    公开(公告)号：US3656954A

    公开(公告)日：1972-04-18

    申请号：US3656954D

    申请日：1969-08-26

    Applicant: AGFA GEVAERT NV

    Inventor： THIERS ROBRECHT JULIUS ,  WILLEMS JOZEF FRANS

    IPC: G03C1/053 ,  G03C1/30 ,  G03C1/34 ,  G03C1/815 ,  G03C1/85 ,  G03C1/95 ,  G03C1/76

    CPC classification number: G03C1/34 ,  G03C1/053 ,  G03C1/30 ,  G03C1/8155 ,  G03C1/856 ,  G03C1/95 ,  Y10S430/151 ,  Y10S430/155

    Abstract: Photographic materials comprising a support, a light-sensitive silver halide emulsion layer on said support and thereover a hydrophilic colloidal protective coating is described. The photographic material will include resorcin in the emulsion layer and a poly-N-vinyl lactam or polyvinyl lactone in the emulsion layer or in the protective surface coating. The surface coating will include silica particles and a polycarbocyclic aromatic sulphonic acid or water-soluble salt thereof. The photographic material is free or substantially free from milkiness or cloudiness normally associated with photographic materials comprising resorcin, polyvinyllactam or polyvinyllactone, and silica.

    Abstract translation: 描述了包含载体，所述载体上的感光卤化银乳剂层和亲水胶体保护涂层的照相材料。 照相材料将包括乳剂层中的间苯二酚和乳液层中的聚-N-乙烯基内酰胺或聚乙烯基内酯或保护性表面涂层。 表面涂层将包括二氧化硅颗粒和多碳环芳族磺酸或其水溶性盐。

    Photographic etching resist and preparation thereof
    19.
    发明授权
    Photographic etching resist and preparation thereof 失效
    摄影蚀刻及其制备

    公开(公告)号：US3652274A

    公开(公告)日：1972-03-28

    申请号：US3652274D

    申请日：1968-06-10

    Applicant: AGFA GEVAERT NV

    Inventor： VERELST JOHAN LODEWIJK ,  WILLEMS JOZEF FRANS

    IPC: C07D303/16 ,  C07F7/08 ,  C07F7/18 ,  G03F7/40 ,  G03C5/00 ,  G03F7/00

    CPC classification number: C07D303/16 ,  C07F7/0852 ,  C07F7/182 ,  G03F7/40 ,  G03F7/405

    Abstract: A printing plate of the type which is prepared by coating a metal supporting surface with a photo-insolubilizable polymer, exposing the coating to a light image, developing the exposed coating by treatment with a liquid dissolving the unexposed areas only of the coating so that the exposed areas remain as a resist layer on the metal surface, and etching the metal surface with the resist layer thereon by means of an aqueous etching liquid therefore, is given increased resistance in the exposed regions to the attack of the etching liquid by incorporating into the developing liquid a hydrophobizing agent which is either an organic compound containing at least one fluorine substituted alkyl group of an organic silane or siloxane compound containing at least one alkyl or aryl group linked to at least one of its silicon atoms, the hydrophobizing agent also containing a reactive group capable of chemically reacting with the photoinsolubilizable polymer. The polymer preferably includes active hydrogen atoms after insolubilization and preferred chemically active groups in the hydrophobizing agent are acid anhydride, isocyanate, epoxy, and acid chloride groups.

    Abstract translation: 一种印刷版，其通过用光不可溶化聚合物涂覆金属支撑表面而制备，将涂层暴露于光图像，通过用仅溶解涂层的未曝光区域的液体处理来显影曝光涂层，使得 暴露的区域作为抗蚀剂层保留在金属表面上，并且因此借助于水性蚀刻液体在其上的抗蚀剂层上蚀刻金属表面，通过掺入到蚀刻液中使曝光区域的电阻增加到蚀刻液的侵蚀 显影液体是疏水化剂，其是含有至少一个含有至少一个与至少一个硅原子连接的烷基或芳基的有机硅烷或硅氧烷化合物的氟取代的烷基的有机化合物，疏水化剂还含有 能够与光不可溶化聚合物发生化学反应的反应性基团。 聚合物优选在不溶化之后包括活性氢原子，并且疏水化剂中优选的化学活性基团是酸酐，异氰酸酯，环氧基和酰氯基团。

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