公开(公告)号：US20240110283A1

公开(公告)日：2024-04-04

申请号：US18476009

申请日：2023-09-27

Applicant: ASM IP Holding, B.V.

Inventor： Peter Bryan Ruckle ,  Shujin Huang ,  Junwei Su ,  Daw Gen Lim

IPC: C23C16/48 ,  H01L21/66

CPC classification number: C23C16/482 ,  C23C16/481 ,  H01L22/14

Abstract: Methods and systems for monitoring a heat lamp system are disclosed. An exemplary method includes installing a new heat lamp within a reactor system, measuring an initial resistance value of the heat lamp, recording, by a controller, the initial resistance value of the heat lamp, determining a subsequent resistance value of the heat lamp, comparing the subsequent resistance value to the initial resistance value, determining whether the subsequent resistance value deviates from the initial resistance value by a programmed threshold value or more and/or falls below a programmed threshold voltage, and providing a user output to a user interface if the subsequent resistance value deviates from the initial resistance value by the programmed threshold value and/or falls below the programmed threshold voltage. An exemplary system can perform the method of monitoring the heat lamp system.

公开(公告)号：US20220298672A1

公开(公告)日：2022-09-22

申请号：US17697107

申请日：2022-03-17

Applicant: ASM IP Holding B.V.

Inventor： Hichem M'Saad ,  Alexandros Demos ,  Xing Lin ,  Junwei Su ,  Matthew Goodman ,  Daw Gen Lim ,  Shujin Huang ,  Rutvij Naik

IPC: C30B25/16 ,  H01L21/66 ,  C30B25/10 ,  C30B25/12 ,  C30B23/06 ,  C23C16/52 ,  C23C16/46 ,  C23C14/54 ,  F27B17/00 ,  H05B3/00 ,  H05B1/02 ,  G01J5/00

Abstract: A method of operating a reactor system to provide wafer temperature gradient control is provided. The method includes operating a center temperature sensor, a middle temperature sensor, and an edge temperature sensor to sense a temperature of a center zone of a wafer on a susceptor in reaction chamber of the reactor system, to sense a temperature of a middle zone of the wafer, and to sense a temperature of an edge zone of the wafer. The temperatures of the center, middle, and edge zones of the wafer are processed with a controller to generate control signals based on a predefined temperature gradient for the wafer. First, second, and third sets of heater lamps are operated based on the temperature of the center, middle, and edge zones to heat the center, the middle, and the edge zone of the wafer. Reactor systems are also described.