公开(公告)号：US10551748B2

公开(公告)日：2020-02-04

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US11963285B2

公开(公告)日：2024-04-16

申请号：US17435861

申请日：2020-03-09

Applicant: ASML Netherlands B.V.

Inventor： Abhiram Lakshmi Ganesh Govindaraju ,  David Bessems ,  Sandeep Rai ,  Petrus Adrianus Willems ,  Serkan Kincal ,  Joshua Mark Lukens ,  Jon David Tedrow

IPC: H05G2/00 ,  G03F7/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/008

Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.

公开(公告)号：US20190086817A1

公开(公告)日：2019-03-21

申请号：US15711678

申请日：2017-09-21

Applicant: ASML, Netherlands B.V.

Inventor： David Bessems ,  Jon David Tedrow ,  Colin Michael Odneal

IPC: G03F7/20

CPC classification number: G03F7/70841 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

Abstract: A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

公开(公告)号：US20170219936A1

公开(公告)日：2017-08-03

申请号：US15490598

申请日：2017-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert STAVENGA ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US09291914B2

公开(公告)日：2016-03-22

申请号：US14473700

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： David Bessems ,  Rogier Hendrikus Magdalena Cortie ,  Marcus Johannes Van Der Zanden ,  Cornelius Maria Rops ,  Paul Willems ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Erik Henricus Egidius Catharina Eummelen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 位于弯月面钉扎特征的径向外侧的气体供应开口; 以及位于弯液面钉扎特征的径向外侧并且至少部分地围绕气体供应开口的气体回收开口。