公开(公告)号：US09844804B2

公开(公告)日：2017-12-19

申请号：US14737590

申请日：2015-06-12

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Michael Varga ,  Alexander I. Ershov ,  Robert L. Morse

IPC: A47B96/06 ,  B08B11/02 ,  G03F7/20 ,  B08B3/02 ,  G02B27/00 ,  B23K26/06 ,  B23K26/16

CPC classification number: B08B11/02 ,  B08B3/02 ,  B23K26/0643 ,  B23K26/16 ,  G02B27/0006 ,  G03F7/70925

Abstract: A carrier holds an extreme ultraviolet light source collector mirror. The carrier includes a front panel having an inner surface and an outer surface opposite the inner surface, and defining a through opening that has an edge having a plurality of scallops; a back panel having an inner surface that faces the front panel and an outer surface opposite the inner surface; and a plurality of posts that are configured to connect the back panel to the front panel and to sandwich a flat rim around the circular boundary of the collector mirror between the inner surface of one of the panels and flanges of the posts. The scallops are positioned around a circumference of the edge and being separated by arcs, where the arcs define a circle that has a diameter that is less than a diameter of the circular boundary of the reflective surface of the collector mirror.

公开(公告)号：US09557650B2

公开(公告)日：2017-01-31

申请号：US14740916

申请日：2015-06-16

Applicant: ASML Netherlands B.V.

Inventor： Silvia De Dea ,  Alexander I. Ershov ,  Brandon Verhoff ,  Gregory Wilson ,  Bruno M. La Fontaine

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/2039 ,  G03F7/70175 ,  G03F7/70925 ,  H05G2/005 ,  H05G2/008

Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.

Abstract translation: 用于极紫外（EUV）光源的系统包括自由基输送系统，其包括一个或多个导管，所述一个或多个导管中的每一个包括侧壁，所述侧壁包括直线部分和第二部分，所述线性部分 侧壁包括限定第一开口的第一端，并且所述侧壁的第二部分包括从所述导管的内部到所述导管的外部的一个或多个开口，其中所述一个或多个导管中的至少一个的第二部分 相对于在集电体和第二部分之间具有间隙的EUV光源的真空室内部的集电器定位; 和控制系统。

公开(公告)号：US20160174352A1

公开(公告)日：2016-06-16

申请号：US15048708

申请日：2016-02-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander I. Ershov ,  David Evans ,  Matthew Graham

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/2008 ,  H05G2/005 ,  H05G2/008

Abstract: A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.