公开(公告)号：US12055862B2

公开(公告)日：2024-08-06

申请号：US17952067

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LaFarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03F7/20 ,  C23C16/44 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US11454895B2

公开(公告)日：2022-09-27

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US11086238B2

公开(公告)日：2021-08-10

申请号：US16623898

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Henricus Johannes Stevens ,  Nina Vladimirovna Dziomkina ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg

IPC: G03F7/20 ,  H01L21/687

Abstract: A system including: a substrate support configured to hold a substrate; a conductive or semi-conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi-conductive element.

公开(公告)号：US09989867B2

公开(公告)日：2018-06-05

申请号：US15587086

申请日：2017-05-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20150124234A1

公开(公告)日：2015-05-07

申请号：US14390973

申请日：2013-03-19

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Harmeet Singh

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/70341 ,  G03F7/70708 ,  H01L21/6831 ,  H01L21/6875

Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.

Abstract translation: 一种用于光刻设备的衬底保持器，所述衬底保持器包括：具有表面的主体; 从表面突出并具有用于支撑基板的端面的多个毛刺; 以及在所述主体表面上的薄膜堆叠并形成电气部件，所述薄膜叠层具有导电层，所述导电层被配置为基本上均匀地分布电荷，所述导电层在导电层所位于的堆叠的整个平面内。

公开(公告)号：US10254660B2

公开(公告)日：2019-04-09

申请号：US15994492

申请日：2018-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US09737934B2

公开(公告)日：2017-08-22

申请号：US15296968

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03B27/58 ,  B22F7/06 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/00 ,  B23K26/342 ,  B33Y10/00 ,  B33Y80/00 ,  B22F3/105

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US09507274B2

公开(公告)日：2016-11-29

申请号：US14373291

申请日：2013-01-17

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03B27/58 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract translation: 用于光刻设备的物体保持器（100）具有具有表面（400a）的主体（400）。 在薄膜堆叠（410,440,450）的表面上或孔中形成有用于支撑物体的多个毛刺（406）。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。

公开(公告)号：US11754929B2

公开(公告)日：2023-09-12

申请号：US17856520

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03F7/20 ,  G03F7/00 ,  B23K26/354 ,  B23K26/342 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/06 ,  B22F10/25 ,  B22F10/28 ,  B22F10/66

CPC classification number: G03F7/70341 ,  B05D3/06 ,  B05D5/00 ,  B22F7/062 ,  B22F10/00 ,  B22F10/20 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708 ,  G03F7/70416 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  B22F10/25 ,  B22F10/28 ,  B22F10/66

Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.

公开(公告)号：US11376663B2

公开(公告)日：2022-07-05

申请号：US17132084

申请日：2020-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.