公开(公告)号：US20190235391A1

公开(公告)日：2019-08-01

申请号：US16229009

申请日：2018-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Edo Maria Hulsebos ,  Henricus Johannes Lambertus Megens ,  Robert John Socha ,  Youping Zhang

IPC: G03F7/20 ,  G03F9/00 ,  G06F17/50

CPC classification number: G03F7/7085 ,  G03F7/70425 ,  G03F7/70516 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7046 ,  G03F9/7088 ,  G06F17/5068

Abstract: A measurement apparatus and method for determining a substrate grid describing a deformation of a substrate prior to exposure of the substrate in a lithographic apparatus configured to fabricate one or more features on the substrate. Position data for a plurality of first features and/or a plurality of second features on the substrate is obtained. Asymmetry data for at least a feature of the plurality of first features and/or the plurality of second features is obtained. The substrate grid based on the position data and the asymmetry data is determined. The substrate grid and asymmetry data are passed to the lithographic apparatus for controlling at least part of an exposure process to fabricate one or more features on the substrate.

公开(公告)号：US09053280B2

公开(公告)日：2015-06-09

申请号：US14108886

申请日：2013-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John Socha

IPC: G06F17/50

CPC classification number: G06F17/5072 ,  G03F1/70 ,  G06F17/50 ,  G06F17/5081

Abstract: Methods, computer program products and apparatuses for optimizing design rules for producing a mask are disclosed, while keeping the optical conditions (including but not limited to illumination shape, projection optics numerical aperture (NA) etc.) fixed. A cross-correlation function is created by multiplying the diffraction order functions of the mask patterns with the eigenfunctions from singular value decomposition (SVD) of a TCC matrix. The diffraction order functions are calculated for the original design rule set, i.e., using the unperturbed condition. ILS is calculated at an edge of a calculated image of a critical polygon using the cross-correlation results and using translation properties of a Fourier transform. Once an optimum separation is calculated, it is incorporated into the design rule to optimize the mask layout for improved ILS throughout the mask.

Abstract translation: 公开了用于优化用于制造掩模的设计规则的计算机程序产品和装置，同时保持光学条件（包括但不限于照明形状，投影光学数值孔径（NA）等））。 通过将掩模图案的衍射级函数与TCC矩阵的奇异值分解（SVD）的本征函数相乘，创建互相关函数。 对于原始设计规则集，即使用未受干扰的条件，计算衍射级函数。 使用互相关结果并使用傅里叶变换的平移特性，在临界多边形的计算图像的边缘处计算ILS。 一旦计算出最佳分离，就将其并入设计规则中，以优化整个掩模中改进的ILS的掩模布局。