公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20220113640A1

公开(公告)日：2022-04-14

申请号：US17423818

申请日：2019-11-05

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ ,  Michel Ben Isel HABETS ,  Abraham Alexander SOETHOUDT ,  Herman MARQUART

IPC: G03F7/20

Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

公开(公告)号：US20220082952A1

公开(公告)日：2022-03-17

申请号：US17533947

申请日：2021-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

Abstract: A method including: generating a first force to attract a substrate holder to a support surface, the holder including a body having opposing first and second body surfaces, first burls at the first body surface, wherein each first burl has a distal end to support a substrate, and second burls at the second body surface to support the substrate holder on the support surface through contact with distal ends of the second burls; generating a second force to attract the substrate to the substrate holder; and controlling the first force and/or second force in a release step to deform the body between the second burls such as to create a gap between the distal ends of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal ends of a second subset of the plurality of first burls.

公开(公告)号：US20210165334A1

公开(公告)日：2021-06-03

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20190332015A1

公开(公告)日：2019-10-31

申请号：US16315125

申请日：2017-07-06

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Thomas POIESZ ,  Satish ACHANTA ,  Mehmet Ali AKBAS ,  Pavlo ANTONOV ,  Jeroen BOUWKNEGT ,  Joost Wilhelmus Maria FRENKEN ,  Evelyn Wallis PACITTI ,  Nicolaas TEN KATE ,  Bruce TIRRI ,  Jan VERHOEVEN

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US20190043749A1

公开(公告)日：2019-02-07

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687 ,  B25B11/00

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20250069932A1

公开(公告)日：2025-02-27

申请号：US18724495

申请日：2022-11-25

Applicant: ASML Netherlands B.V.

Inventor： Martinus Cornelis REIJNEN ,  Thomas POIESZ ,  René Adrianus VAN ROOIJ ,  Alexander Barbara Jacobus Maria DRIESSEN ,  Keane Michael LEVY

IPC: H01L21/683

Abstract: The invention provides an object holder to hold an object, comprising: a clamp side to clamp the object, wherein the clamp side is electrically conductive, at least one electrode arranged at a distance from the clamp side, and electrically isolated from the clamp side, a controller arranged to provide an electrode voltage to the at least one electrode based on a measured charge signal representative for a charge level of the object holder and/or the object in order to decrease a potential difference between an electrical potential of the clamp side and an electrical potential of the object.

公开(公告)号：US20240234196A9

公开(公告)日：2024-07-11

申请号：US18547470

申请日：2022-02-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Augustinus Christiaan VERSCHUREN ,  Thomas POIESZ

IPC: H01L21/687 ,  G03F7/00 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/68721 ,  G03F7/70708 ,  H01L21/67028 ,  H01L21/6833

Abstract: A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.

公开(公告)号：US20240136218A1

公开(公告)日：2024-04-25

申请号：US18547470

申请日：2022-02-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Augustinus Christiaan VERSCHUREN ,  Thomas POIESZ

IPC: H01L21/687 ,  G03F7/00 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/68721 ,  G03F7/70708 ,  H01L21/67028 ,  H01L21/6833

Abstract: A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.

公开(公告)号：US20220357675A1

公开(公告)日：2022-11-10

申请号：US17870444

申请日：2022-07-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.