公开(公告)号：US20200326635A1

公开(公告)日：2020-10-15

申请号：US16761608

申请日：2018-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20200292947A1

公开(公告)日：2020-09-17

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Satish ACHANTA ,  Jeroen BOUWKNEGT ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US20180231897A1

公开(公告)日：2018-08-16

申请号：US15580806

申请日：2016-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robert DE JONG ,  Martinus Hendrikus Antonius LEENDERS ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Frank Pieter Albert VAN DEN BERKMOTEL

IPC: G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.

公开(公告)号：US20180190534A1

公开(公告)日：2018-07-05

申请号：US15580601

申请日：2016-06-01

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ ,  Martijn HOUBEN ,  Abraham Alexander SOETHOUDT

IPC: H01L21/687 ,  H01L21/027 ,  G03F7/20 ,  B23H7/26

CPC classification number: H01L21/6875 ,  B23H7/26 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/0274 ,  H01L21/6831 ,  H01L21/6838

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

公开(公告)号：US20220113640A1

公开(公告)日：2022-04-14

申请号：US17423818

申请日：2019-11-05

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ ,  Michel Ben Isel HABETS ,  Abraham Alexander SOETHOUDT ,  Herman MARQUART

IPC: G03F7/20

Abstract: The present invention provides a testing substrate (W) for estimating stress in production substrates due to a substrate support, said testing substrate having a support surface (SS) divided into predefined portions, wherein the predefined portions comprise at least one first portion (1) having a first coefficient of friction being substantially uniform across the at least one first portion, and at least one second portion (2) having a second coefficient of friction being substantially uniform across the at least one second portion, wherein the second coefficient of friction is different to the first coefficient of friction. The present invention also provides a method for estimating stress in a substrate due to a substrate support and a system for making such an estimation.

公开(公告)号：US20220082952A1

公开(公告)日：2022-03-17

申请号：US17533947

申请日：2021-11-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

Abstract: A method including: generating a first force to attract a substrate holder to a support surface, the holder including a body having opposing first and second body surfaces, first burls at the first body surface, wherein each first burl has a distal end to support a substrate, and second burls at the second body surface to support the substrate holder on the support surface through contact with distal ends of the second burls; generating a second force to attract the substrate to the substrate holder; and controlling the first force and/or second force in a release step to deform the body between the second burls such as to create a gap between the distal ends of a first subset of the plurality of first burls and the substrate and such that the substrate is supported on distal ends of a second subset of the plurality of first burls.

公开(公告)号：US20190043749A1

公开(公告)日：2019-02-07

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687 ,  B25B11/00

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20250069932A1

公开(公告)日：2025-02-27

申请号：US18724495

申请日：2022-11-25

Applicant: ASML Netherlands B.V.

Inventor： Martinus Cornelis REIJNEN ,  Thomas POIESZ ,  René Adrianus VAN ROOIJ ,  Alexander Barbara Jacobus Maria DRIESSEN ,  Keane Michael LEVY

IPC: H01L21/683

Abstract: The invention provides an object holder to hold an object, comprising: a clamp side to clamp the object, wherein the clamp side is electrically conductive, at least one electrode arranged at a distance from the clamp side, and electrically isolated from the clamp side, a controller arranged to provide an electrode voltage to the at least one electrode based on a measured charge signal representative for a charge level of the object holder and/or the object in order to decrease a potential difference between an electrical potential of the clamp side and an electrical potential of the object.

公开(公告)号：US20240234196A9

公开(公告)日：2024-07-11

申请号：US18547470

申请日：2022-02-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Augustinus Christiaan VERSCHUREN ,  Thomas POIESZ

IPC: H01L21/687 ,  G03F7/00 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/68721 ,  G03F7/70708 ,  H01L21/67028 ,  H01L21/6833

Abstract: A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.

公开(公告)号：US20240136218A1

公开(公告)日：2024-04-25

申请号：US18547470

申请日：2022-02-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Augustinus Christiaan VERSCHUREN ,  Thomas POIESZ

IPC: H01L21/687 ,  G03F7/00 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/68721 ,  G03F7/70708 ,  H01L21/67028 ,  H01L21/6833

Abstract: A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.