公开(公告)号：US10942461B2

公开(公告)日：2021-03-09

申请号：US16639566

申请日：2018-07-02

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald Huisman ,  Sebastianus Adrianus Goorden ,  Irwan Dani Setija

IPC: G03F9/00

Abstract: An apparatus for determining a characteristic of a feature of an object comprises: a measurement radiation source; a measurement radiation delivery system; a measurement system; a pump radiation source; and a pump radiation delivery system. The measurement radiation source is operable to produce measurement radiation and the measurement radiation delivery system is operable to irradiate at least a part of a top surface of the object with the measurement radiation. The measurement system is operable to receive at least a portion of the measurement radiation scattered from the top surface and is further operable to determine a characteristic of the feature of the object from at least a portion of the measurement radiation scattered from the top surface. The pump radiation source is operable to produce pump radiation and the pump radiation delivery system is operable to irradiate at least a part of the top surface of the object with the pump radiation so as to produce a mechanical response (for example an acoustic wave) in the object.

公开(公告)号：US10649345B2

公开(公告)日：2020-05-12

申请号：US16035961

申请日：2018-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Pisarenco ,  Markus Gerardus Martinus Maria Van Kraaij ,  Sebastianus Adrianus Goorden

IPC: G06F17/50 ,  G03F7/20 ,  G01N21/47 ,  G01N21/88 ,  G01N21/956

Abstract: Methods and apparatuses for estimation of at least one parameter of interest of a feature fabricated on a substrate, the feature having a plurality of structure parameters, the structure parameters including the at least one parameter of interest and one or more nuisance parameters. A receiver receives radiation scattered from one or more measured features on the substrate. A pupil generator generates an unprocessed pupil representation of the received radiation. A matrix multiplier multiplies a transformation matrix with intensities of each of a plurality of pixels of the unprocessed pupil representation to determine a post-processed pupil representation in which effects of the one or more nuisance parameters are mitigated or removed. A parameter estimator estimates the at least one parameter of interest based on the post-processed pupil representation.

公开(公告)号：US10527959B2

公开(公告)日：2020-01-07

申请号：US16325471

申请日：2017-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald Huisman ,  Simon Gijsbert Josephus Mathijssen ,  Sebastianus Adrianus Goorden ,  Duygu Akbulut ,  Alessandro Polo

IPC: G03F7/20 ,  G03F9/00 ,  G02B5/20 ,  G02B5/30

Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.

公开(公告)号：US12276921B2

公开(公告)日：2025-04-15

申请号：US17923913

申请日：2021-04-21

Applicant: ASML Netherlands B.V.

Inventor： Olger Victor Zwier ,  Maurits Van Der Schaar ,  Hilko Dirk Bos ,  Hans Van Der Laan ,  S. M. Masudur Rahman Al Arif ,  Henricus Wilhelmus Maria Van Buel ,  Armand Eugene Albert Koolen ,  Victor Emanuel Calado ,  Kaustuve Bhattacharyya ,  Jin Lian ,  Sebastianus Adrianus Goorden ,  Hui Quan Lim

IPC: G03F7/00

Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.

公开(公告)号：US11927891B2

公开(公告)日：2024-03-12

申请号：US16963273

申请日：2018-12-20

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Duygu Akbulut ,  Alessandro Polo ,  Sebastianus Adrianus Goorden

IPC: G01N29/11 ,  G01B9/02015 ,  G01N29/06 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F9/7061 ,  G01B9/02015 ,  G01N29/0681 ,  G03F7/70625 ,  G03F7/70633 ,  G01B2290/25 ,  G01N2291/2697

Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.

公开(公告)号：US11409206B2

公开(公告)日：2022-08-09

申请号：US17049597

申请日：2019-04-02

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F9/00

Abstract: A method of determining a position of a feature (for example an alignment mark) on an object (for example a silicon wafer) is disclosed. The method comprises determining an offset parameter, determining the second position; and determining a first position from the second position and the offset parameter, the position of the mark being the first position. The offset parameter is a measure of a difference in: a first position that is indicative of the position of the feature; and a second position that is indicative of the position of the feature. The offset parameter may be determined using a first measurement apparatus and the second position may be determined using a second, different measurement apparatus.

公开(公告)号：US11333985B2

公开(公告)日：2022-05-17

申请号：US17254601

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Duygu Akbulut ,  Alessandro Polo ,  Johannes Antonius Gerardus Akkermans ,  Arie Jeffrey Den Boef

IPC: G03F9/00

Abstract: The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.

公开(公告)号：US11175593B2

公开(公告)日：2021-11-16

申请号：US17049707

申请日：2019-04-03

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Simon Reinald Huisman ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Yuxiang Lin ,  Vu Quang Tran ,  Sebastianus Adrianus Goorden ,  Justin Lloyd Kreuzer ,  Christopher John Mason ,  Igor Matheus Petronella Aarts ,  Krishanu Shome ,  Irit Tzemah

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.

公开(公告)号：US11042096B2

公开(公告)日：2021-06-22

申请号：US16619803

申请日：2018-05-15

Applicant: ASML Netherlands B.V.

Inventor： Stefan Michiel Witte ,  Alessandro Antoncecchi ,  Hao Zhang ,  Stephen Edward ,  Paulus Clemens Maria Planken ,  Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Irwan Dani Setija ,  David Ferdinand Vles

IPC: G03B27/54 ,  G03F7/20 ,  G03F9/00

Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam. The signal to background ratio is a ratio of: (a) signals generated at the surface by reflections of acoustic waves from the feature to (b) background signals generated at the surface by reflections of acoustic waves which have not reflected from the feature.

公开(公告)号：US12282263B2

公开(公告)日：2025-04-22

申请号：US18036788

申请日：2021-11-01

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald Huisman ,  Sebastianus Adrianus Goorden

IPC: G03F7/00 ,  G03F9/00

Abstract: Disclosed is a metrology system comprising: a pre-alignment metrology tool operable to measure a plurality of targets on a substrate to obtain measurement data; and a processing unit. The processing unit is operable to: process said measurement data to determine for each target at least one position distribution which describes variation of said position value over at least part of said target; and determine a measurement correction from said at least one position distribution which corrects for within-target variation in each of said targets, said measurement correction for correcting measurements performed by an alignment sensor.