公开(公告)号：US11947256B2

公开(公告)日：2024-04-02

申请号：US16634910

申请日：2018-06-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia Kurganova ,  Adrianus Johannes Maria Giesbers ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/62 ,  C01B32/186 ,  G03F7/00

CPC classification number: G03F1/62 ,  C01B32/186 ,  G03F7/70958 ,  G03F7/70983

Abstract: A method of manufacturing a pellicle for a lithographic apparatus, the method including locally heating the pellicle using radiative heating, and depositing coating material simultaneously on both sides of the pellicle, and pellicles manufactured according to this method. Also disclosed is the use of a multilayer graphene pellicle with a double-sided hexagonal boron nitride coating in a lithographic apparatus.

公开(公告)号：US10908496B2

公开(公告)日：2021-02-02

申请号：US16093537

申请日：2017-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles Abegg ,  Nirupam Banerjee ,  Michiel Alexander Blauw ,  Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Matthias Kruizinga ,  Egbert Lenderink ,  Nicolae Maxim ,  Andrey Nikipelov ,  Arnoud Willem Notenboom ,  Claudia Piliego ,  Mária Péter ,  Gijsbert Rispens ,  Nadja Schuh ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Antonius Willem Verburg ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/82 ,  G02B5/20 ,  G02B5/28

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US10466585B2

公开(公告)日：2019-11-05

申请号：US16062017

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03B27/42 ,  G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/20

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

公开(公告)号：US12117726B2

公开(公告)日：2024-10-15

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit van den Bosch ,  Wilhelmus Theodorus Anthonius Johannes van den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US12066758B2

公开(公告)日：2024-08-20

申请号：US17728608

申请日：2022-04-25

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F1/62 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US11754918B2

公开(公告)日：2023-09-12

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit Van Den Bosch ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20230134837A1

公开(公告)日：2023-05-04

申请号：US18090873

申请日：2022-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Onvlee ,  Antonius Franciscus Johannes De Groot ,  Wim Symens ,  David Ferdinand Vles

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.

公开(公告)号：US11556063B2

公开(公告)日：2023-01-17

申请号：US16092021

申请日：2017-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Onvlee ,  Antonius Franciscus Johannes De Groot ,  Wim Symens ,  David Ferdinand Vles

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

公开(公告)号：US11762281B2

公开(公告)日：2023-09-19

申请号：US17130537

申请日：2020-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich Nasalevich ,  Erik Achilles Abegg ,  Nirupam Banerjee ,  Michiel Alexander Blauw ,  Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Matthias Kruizinga ,  Egbert Lenderink ,  Nicolae Maxim ,  Andrey Nikipelov ,  Arnoud Willem Notenboom ,  Claudia Piliego ,  Mária Péter ,  Gijsbert Rispens ,  Nadja Schuh ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Antonius Willem Verburg ,  Johannes Petrus Martinus Bernardus Vermeulen ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/82 ,  G02B5/20 ,  G03F7/00 ,  G02B5/28

CPC classification number: G03F1/62 ,  G02B5/208 ,  G02B5/283 ,  G03F1/82 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US11673169B2

公开(公告)日：2023-06-13

申请号：US17294013

申请日：2019-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Dmitry Kurilovich ,  Fabio Sbrizzai ,  Marcus Adrianus Van de Kerkhof ,  Ties Wouter Van der Woord ,  Willem Joan Van der Zande ,  Jeroen Van Duivenbode ,  David Ferdinand Vles

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

CPC classification number: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.