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公开(公告)号：US10732513B2
公开(公告)日：2020-08-04
申请号：US16561096
申请日：2019-09-05
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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12.发明授权公开(公告)号：US10274834B2
公开(公告)日：2019-04-30
申请号：US15915674
申请日：2018-03-08
Applicant: ASML Netherlands B.V.
Inventor： Alexander Ypma , Jasper Menger , David Deckers , David Han , Adrianus Cornelis Matheus Koopman , Irina Lyulina , Scott Anderson Middlebrooks , Richard Johannes Franciscus Van Haren , Jochem Sebastiaan Wildenberg
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in said multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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公开(公告)号：US11720029B2
公开(公告)日：2023-08-08
申请号：US17497207
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
CPC classification number: G03F7/705 , G03F7/7065 , G03F7/70625 , G03F7/70633 , G06T7/12 , G06T7/149 , G06T7/60 , G06T2207/10061 , G06T2207/20161 , G06T2207/30148
Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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公开(公告)号：US11143970B2
公开(公告)日：2021-10-12
申请号：US16943296
申请日：2020-07-30
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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公开(公告)号：US11016397B2
公开(公告)日：2021-05-25
申请号：US15777601
申请日：2016-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Scott Anderson Middlebrooks , Omer Abubaker Omer Adam , Adrianus Cornelis Matheus Koopman , Henricus Johannes Lambertus Megens , Arie Jeffrey Den Boef
IPC: G03F7/20
Abstract: A method and a computer program product that relates to lithographic apparatuses and, processes, and more particularly to a method and computer program to inspect substrates produced by the lithographic apparatuses and processes. The method and/or computer program product includes determining contributions from independent sources from results measured from a lithography process or a substrate processed by the lithography process, wherein the results are measured using a plurality of different substrate measurement recipes.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20180253015A1
公开(公告)日：2018-09-06
申请号：US15915674
申请日：2018-03-08
Applicant: ASML Netherlands B.V.
Inventor： Alexander Ypma , Jasper Menger , David Deckers , David Han , Adrianus Cornelis Matheus Koopman , Irina Lyulina , Scott Anderson Middlebrooks , Richard Johannes Franciscus Van Haren , Jochem Sebastiaan Wildenberg
CPC classification number: G03F7/70616 , G03F7/70508 , G03F7/70525 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F9/7092 , G06F17/30572
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in said multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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17.发明公开公开(公告)号：US20240019788A1
公开(公告)日：2024-01-18
申请号：US18232570
申请日：2023-08-10
Applicant: ASML Netherlands B.V.
Inventor： Alexander Ypma , Jasper Menger , David Deckers , David Han , Adrianus Cornelis Matheus Koopman , Irina Lyulina , Scott Anderson Middlebrooks , Richard Johannes Franciscus Van Haren , Jochem Sebastiaan Wildenberg
IPC: G03F7/00
CPC classification number: G03F7/706837 , G03F7/70525 , G03F7/70616 , G06F16/26
Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.
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公开(公告)号：US11847570B2
公开(公告)日：2023-12-19
申请号：US17837096
申请日：2022-06-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Adrianus Cornelis Matheus Koopman , Scott Anderson Middlebrooks , Antoine Gaston Marie Kiers , Mark John Maslow
IPC: G06N3/08 , G06N3/084 , G06T7/11 , G03F7/00 , G06T7/00 , G06F18/214 , G06F18/2431 , G06F18/2413 , G06V10/764 , G06V10/82
CPC classification number: G06N3/084 , G03F7/705 , G06F18/214 , G06F18/2431 , G06F18/24133 , G06N3/08 , G06T7/0004 , G06T7/11 , G06V10/764 , G06V10/82 , G06T2207/30148
Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data comprising an input image of at least a part of a substrate having a plurality of features and a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation of the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.
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公开(公告)号：US11379970B2
公开(公告)日：2022-07-05
申请号：US16968966
申请日：2019-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Adrianus Cornelis Matheus Koopman , Scott Anderson Middlebrooks , Antoine Gaston Marie Kiers , Mark John Maslow
Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.
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公开(公告)号：US20220026811A1
公开(公告)日：2022-01-27
申请号：US17497207
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Markus Gerardus Martinus Maria Van Kraaij , Adrianus Cornelis Matheus Koopman , Stefan Hunsche , Willem Marie Julia Marcel Coene
Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.
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