公开(公告)号：US09514969B2

公开(公告)日：2016-12-06

申请号：US14550781

申请日：2014-11-21

Applicant: Applied Materials, Inc.

Inventor： Aaron Miller ,  Mehran Behdjat ,  Norman L. Tam ,  Michael Liu

IPC: H01L21/67 ,  H01L21/66 ,  H01L21/324 ,  H01L21/687

CPC classification number: H01L21/67115 ,  H01L21/67248 ,  H01L21/68792

Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

Abstract translation: 本公开的实施例提供一种盖组件，其包括设置在基板的装置侧表面和反射板之间的盖，所述盖设置在热处理室内。 衬底的器件侧表面与反射板之间的存在与常规热处理室设计相比具有许多优点，其包括在处理期间改进的温度均匀性，减少的室停机时间和改进的拥有成本 在热处理室中进行的处理。 在一些构造中，盖包括形成在其中的两个或更多个端口，并且被定位成在处理期间将气体从形成在反射板和盖之间的空间传送到基板的期望区域，以减少横跨 基质。

公开(公告)号：US09735034B2

公开(公告)日：2017-08-15

申请号：US14456682

申请日：2014-08-11

Applicant: Applied Materials, Inc.

Inventor： Kim Vellore ,  Dinesh Kanawade ,  Stephen Moffatt ,  Aaron Miller ,  Leonid M. Tertitski ,  Norman L. Tam ,  Michael Liu ,  Colin Fox

IPC: H05B3/68 ,  H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US20160376706A1

公开(公告)日：2016-12-29

申请号：US15192159

申请日：2016-06-24

Applicant: Applied Materials, Inc.

Inventor： Aaron Miller ,  Kallol Bera

IPC: C23C16/455

CPC classification number: C23C16/45578 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/45565 ,  H01J37/3244

Abstract: Apparatus and methods for processing a substrate including an injector unit insert with a plurality of flow paths leading to a first plenum, each of the flow paths providing one or more of substantially the same residence time, length and/or conductance. Injector units including the injector unit inserts have increased flow uniformity.

Abstract translation: 用于处理衬底的设备和方法，其包括具有通向第一增压室的多个流动路径的喷射器单元插入件，每个流动路径提供基本上相同的停留时间，长度和/或电导的一个或多个。 包括注射器单元插入件的进样器单元具有增加的流动均匀性。