Method for patterning micro features by using developable bottom anti-reflection coating
    12.
    发明授权
    Method for patterning micro features by using developable bottom anti-reflection coating 有权
    通过使用可显影的底部抗反射涂层来图案化微观特征的方法

    公开(公告)号:US07341939B2

    公开(公告)日:2008-03-11

    申请号:US11061056

    申请日:2005-02-18

    CPC classification number: G03F7/38 G03F7/091 H01L21/0276

    Abstract: In the manufacture of a semiconductor, a DBARC layer is deposited upon a wafer to prevent reflection. A photo resist layer is deposited upon the DBARC layer and the wafer is selectively exposed to irradiation. The irradiation generates photo acid (H+ ions) in the exposed areas of the photo resist and DBARC. In order to provide better resolution in the DBARC for micro-features, an electric field is generated vertically through the coated wafer before or during post exposure baking (PEB) to create a uniform vertical distribution of H+ ions though the DBARC. The coated wafer is then developed to remove either the unexposed portions, or exposed portion of the DBARC. The cavities formed by the developer have side walls that are substantially vertical as a result of the uniform vertical distribution of the H+ ions.

    Abstract translation: 在制造半导体时,将DBARC层沉积在晶片上以防止反射。 光致抗蚀剂层沉积在DBARC层上,并且晶片被选择性地暴露于照射下。 照射在光致抗蚀剂和DBARC的曝光区域产生光酸(H +离子)。 为了在DBARC中为微特征提供更好的分辨率,在后曝光烘烤(PEB)之前或期间,通过涂覆的晶片垂直产生电场,以通过DBARC产生H +离子的均匀垂直分布。 然后将涂覆的晶片展开以除去DBARC的未曝光部分或曝光部分。 由显影剂形成的空腔由于H +离子的均匀垂直分布而具有基本垂直的侧壁。

    Optical recording and/or reproducing device with a buffer member
    13.
    发明申请
    Optical recording and/or reproducing device with a buffer member 失效
    具有缓冲部件的光学记录和/或再现装置

    公开(公告)号:US20050028175A1

    公开(公告)日:2005-02-03

    申请号:US10883843

    申请日:2004-07-06

    Applicant: Chih-Cheng Lin

    Inventor: Chih-Cheng Lin

    CPC classification number: G11B17/056

    Abstract: An optical disk drive includes a disk-carrying tray, a shielding member and buffer member disposed at adjoining position of the disk-carrying tray and the shielding member to absorb impact of broken pieces in case of breakup of an optical disk during the reading and writing operations.

    Abstract translation: 一种光盘驱动器包括一个盘片托盘,一个屏蔽部件和缓冲部件,它们设置在盘片托盘和屏蔽部件的相邻位置处,用于吸收在读取和写入期间光盘分解的情况下损坏的碎片的冲击 操作。

    Optical disc drive
    14.
    发明授权
    Optical disc drive 失效
    光盘驱动器

    公开(公告)号:US08046781B2

    公开(公告)日:2011-10-25

    申请号:US12211049

    申请日:2008-09-15

    CPC classification number: G11B33/123 G11B17/043

    Abstract: An optical disc drive suitable for reading a data in an optical disc is provided. The optical disc drive includes a housing, a tray suitable for carrying the optical disc, and a panel. The housing has a first opening, and the panel is disposed at the first opening. The tray is disposed in the housing. The tray has a blocking plate. The blocking plate is disposed on a front edge of the tray, and multiple protrusions are disposed on an upper edge of the blocking plate. Furthermore, the panel has a second opening, and the second opening has multiple notches corresponding to the protrusions. The tray is suitable for exiting out of the housing through the second opening, and the protrusions are suitable for passing through the notches.

    Abstract translation: 提供适于读取光盘中的数据的光盘驱动器。 光盘驱动器包括壳体,适于承载光盘的托盘和面板。 壳体具有第一开口,并且面板设置在第一开口处。 托盘设置在壳体中。 托盘具有阻挡板。 阻挡板设置在托盘的前边缘上,并且多个突起设置在阻挡板的上边缘上。 此外,面板具有第二开口,并且第二开口具有对应于突起的多个凹口。 托盘适于通过第二开口离开壳体,并且突起适于穿过凹口。

    Dual damascene process
    15.
    发明授权
    Dual damascene process 有权
    双镶嵌工艺

    公开(公告)号:US07364836B2

    公开(公告)日:2008-04-29

    申请号:US11193901

    申请日:2005-07-29

    CPC classification number: H01L21/0276 G03F7/095 H01L21/31144 H01L21/76811

    Abstract: A method of photoresist processing includes forming a first photoresist layer over composite layers of dielectric insulation and a top insulating layer and patterning a via hole pattern in the first photoresist layer by exposing to radiation of a first sensitivity. A second photoresist layer is formed over via patterned and the first photoresist layer. A trench line pattern is formed in the second photoresist layer by exposing to radiation of a second sensitivity. The layers are then etched and the trench line and via hole openings are filled with metal.

    Abstract translation: 光致抗蚀剂处理的方法包括在介电绝缘层和顶部绝缘层的复合层上形成第一光致抗蚀剂层,并通过暴露于第一灵敏度的辐射来在第一光致抗蚀剂层中图形化通孔图案。 通过图案化和第一光致抗蚀剂层形成第二光致抗蚀剂层。 通过暴露于第二灵敏度的辐射,在第二光致抗蚀剂层中形成沟槽图案。 然后蚀刻这些层,并且沟槽线和通孔开口被金属填充。

    Photomask cleaning using vacuum ultraviolet (VUV) light cleaning
    16.
    发明申请
    Photomask cleaning using vacuum ultraviolet (VUV) light cleaning 审中-公开
    使用真空紫外线(VUV)清洁光掩模

    公开(公告)号:US20070012335A1

    公开(公告)日:2007-01-18

    申请号:US11184703

    申请日:2005-07-18

    CPC classification number: B08B7/0035 B08B3/08 B08B7/0042 B08B7/0071 G03F1/82

    Abstract: A multi-step cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical clean and the two-step cleaning procedure reduces phase-shift loss and increases transmission. In another embodiment, the first step may use other means to form a molybdenum oxide on the Mo-containing surface. In another embodiment, the multi-step cleaning operation provides a wet chemical clean such as SC1 or SPM or both, followed by a further chemical or physical treatment such as ozone, baking or electrically ionized water.

    Abstract translation: 多步清洁程序可以清洗相移光掩模和其他光掩模和含Mo表面。 在一个实施方案中,由Xe 2激子准分子激光器产生的真空紫外线(VUV)光将氧气转化为在第一清洁操作中使用的臭氧。 VUV /臭氧清洁后可以进行湿式SC1化学清洗,两步清洗程序可以减少相移损失并增加透光率。 在另一个实施方案中,第一步可以使用其它方法在含Mo表面上形成氧化钼。 在另一个实施方案中,多步骤清洁操作提供湿化学清洁例如SC1或SPM或两者,随后进一步进行化学或物理处理,例如臭氧,烘烤或电离水。

    Dual damascene process
    17.
    发明申请
    Dual damascene process 有权
    双镶嵌工艺

    公开(公告)号:US20050277277A1

    公开(公告)日:2005-12-15

    申请号:US11193901

    申请日:2005-07-29

    CPC classification number: H01L21/0276 G03F7/095 H01L21/31144 H01L21/76811

    Abstract: A method of photoresist processing includes forming a first photoresist layer over composite layers of dielectric insulation and a top insulating layer and patterning a via hole pattern in the first photoresist layer by exposing to radiation of a first sensitivity. A second photoresist layer is formed over via patterned and the first photoresist layer. A trench line pattern is formed in the second photoresist layer by exposing to radiation of a second sensitivity. The layers are then etched and the trench line and via hole openings are filled with metal.

    Abstract translation: 光致抗蚀剂处理的方法包括在电介质绝缘层和顶部绝缘层的复合层上形成第一光致抗蚀剂层,并通过暴露于第一灵敏度的辐射来在第一光致抗蚀剂层中图形化通孔图案。 通过图案化和第一光致抗蚀剂层形成第二光致抗蚀剂层。 通过暴露于第二灵敏度的辐射,在第二光致抗蚀剂层中形成沟槽图案。 然后蚀刻这些层,并且沟槽线和通孔开口被金属填充。

    LED display frame structure
    19.
    发明授权
    LED display frame structure 有权
    LED显示框架结构

    公开(公告)号:US08398288B1

    公开(公告)日:2013-03-19

    申请号:US13438076

    申请日:2012-04-03

    Applicant: Chih-Cheng Lin

    Inventor: Chih-Cheng Lin

    Abstract: An LED display frame structure includes a light guide plate and a heat dissipation frame. The heat dissipation frame is mounted around the periphery of the light guide plate. At least one side of the light guide plate is provided with an LED strip and a 7-like heat dissipation plate. The back of the LED strip is provided with a two-sided adhesive strip to be attached to a groove of the 7-like heat dissipation plate. The 7-like heat dissipation plate has a cover plate next to the groove. The cover plate is attached to an adhesive strip of the light guide plate. The present invention can be assembled conveniently and quickly.

    Abstract translation: LED显示框架结构包括导光板和散热框架。 散热框架围绕导光板的周边安装。 导光板的至少一侧设置有LED条和7形散热板。 LED条的背部设置有两面粘合带,以附接到7状散热板的凹槽。 7形散热板具有靠近槽的盖板。 盖板附接到导光板的粘合带。 本发明可以方便快捷地组装。

    Antenna module and an electronic device having the antenna module
    20.
    发明授权
    Antenna module and an electronic device having the antenna module 有权
    天线模块和具有天线模块的电子设备

    公开(公告)号:US08085205B2

    公开(公告)日:2011-12-27

    申请号:US12453013

    申请日:2009-04-28

    CPC classification number: H01Q1/2291 H01Q9/0421

    Abstract: An antenna module for wireless signal transmission of an electronic device is disclosed. The antenna module comprises an antenna body and a fixing part. The antenna body comprises a radiating element, a grounding element, a connecting element, and a feeding point. The radiating element has a first radiating area and a second radiating area. The connecting element has a first end and a second end. The first end is connected with the first radiating area of the radiating element and the second end is connected with the grounding element. The feeding point is disposed on the radiating element and is used to feed a signal. The fixing part comprises a main body and a first clip portion. The main body is used to match the shape of the antenna body. The first clip portion is used to clip and fix the antenna body.

    Abstract translation: 公开了一种用于电子设备的无线信号传输的天线模块。 天线模块包括天线体和固定部分。 天线体包括辐射元件,接地元件,连接元件和馈电点。 辐射元件具有第一辐射区域和第二辐射区域。 连接元件具有第一端和第二端。 第一端与辐射元件的第一辐射区域连接,第二端与接地元件连接。 馈电点设置在辐射元件上,用于馈送信号。 固定部分包括主体和第一夹子部分。 主体用于匹配天线体的形状。 第一夹子部分用于夹持和固定天线体。

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