Abstract:
A method for making reverse osmosis permeate water and mineral water from deep seawater includes the steps of: a) sand-filtering or ultra-filtering the deep seawater; b) conducting a first nano-filtering step to nano-filter the deep seawater after the step a) to obtain first nano-filtration permeate water and first nano-filtration concentrated water; c) filtering the first nano-filtration permeate water using a reverse osmosis apparatus to obtain reverse osmosis permeate water and reverse osmosis concentrated water; and d) treating the first nano-filtration concentrated water by electrodialysis to obtain anion-rich water, cation-rich water, and mineral water.
Abstract:
In the manufacture of a semiconductor, a DBARC layer is deposited upon a wafer to prevent reflection. A photo resist layer is deposited upon the DBARC layer and the wafer is selectively exposed to irradiation. The irradiation generates photo acid (H+ ions) in the exposed areas of the photo resist and DBARC. In order to provide better resolution in the DBARC for micro-features, an electric field is generated vertically through the coated wafer before or during post exposure baking (PEB) to create a uniform vertical distribution of H+ ions though the DBARC. The coated wafer is then developed to remove either the unexposed portions, or exposed portion of the DBARC. The cavities formed by the developer have side walls that are substantially vertical as a result of the uniform vertical distribution of the H+ ions.
Abstract:
An optical disk drive includes a disk-carrying tray, a shielding member and buffer member disposed at adjoining position of the disk-carrying tray and the shielding member to absorb impact of broken pieces in case of breakup of an optical disk during the reading and writing operations.
Abstract:
An optical disc drive suitable for reading a data in an optical disc is provided. The optical disc drive includes a housing, a tray suitable for carrying the optical disc, and a panel. The housing has a first opening, and the panel is disposed at the first opening. The tray is disposed in the housing. The tray has a blocking plate. The blocking plate is disposed on a front edge of the tray, and multiple protrusions are disposed on an upper edge of the blocking plate. Furthermore, the panel has a second opening, and the second opening has multiple notches corresponding to the protrusions. The tray is suitable for exiting out of the housing through the second opening, and the protrusions are suitable for passing through the notches.
Abstract:
A method of photoresist processing includes forming a first photoresist layer over composite layers of dielectric insulation and a top insulating layer and patterning a via hole pattern in the first photoresist layer by exposing to radiation of a first sensitivity. A second photoresist layer is formed over via patterned and the first photoresist layer. A trench line pattern is formed in the second photoresist layer by exposing to radiation of a second sensitivity. The layers are then etched and the trench line and via hole openings are filled with metal.
Abstract:
A multi-step cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical clean and the two-step cleaning procedure reduces phase-shift loss and increases transmission. In another embodiment, the first step may use other means to form a molybdenum oxide on the Mo-containing surface. In another embodiment, the multi-step cleaning operation provides a wet chemical clean such as SC1 or SPM or both, followed by a further chemical or physical treatment such as ozone, baking or electrically ionized water.
Abstract:
A method of photoresist processing includes forming a first photoresist layer over composite layers of dielectric insulation and a top insulating layer and patterning a via hole pattern in the first photoresist layer by exposing to radiation of a first sensitivity. A second photoresist layer is formed over via patterned and the first photoresist layer. A trench line pattern is formed in the second photoresist layer by exposing to radiation of a second sensitivity. The layers are then etched and the trench line and via hole openings are filled with metal.
Abstract:
An LED display frame structure includes a light guide plate and a heat dissipation frame. The heat dissipation frame is mounted around the periphery of the light guide plate. At least one side of the light guide plate is provided with an LED strip and a 7-like heat dissipation plate. The back of the LED strip is provided with a two-sided adhesive strip to be attached to a groove of the 7-like heat dissipation plate. The 7-like heat dissipation plate has a cover plate next to the groove. The cover plate is attached to an adhesive strip of the light guide plate. The present invention can be assembled conveniently and quickly.
Abstract:
An antenna module for wireless signal transmission of an electronic device is disclosed. The antenna module comprises an antenna body and a fixing part. The antenna body comprises a radiating element, a grounding element, a connecting element, and a feeding point. The radiating element has a first radiating area and a second radiating area. The connecting element has a first end and a second end. The first end is connected with the first radiating area of the radiating element and the second end is connected with the grounding element. The feeding point is disposed on the radiating element and is used to feed a signal. The fixing part comprises a main body and a first clip portion. The main body is used to match the shape of the antenna body. The first clip portion is used to clip and fix the antenna body.