利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

14 条记录 (耗时 0.026 秒)

    Process Solutions Containing Surfactants
    12.
    发明申请
    Process Solutions Containing Surfactants 审中-公开
    含有表面活性剂的工艺解决方案

    公开(公告)号：US20110171583A1

    公开(公告)日：2011-07-14

    申请号：US12959067

    申请日：2010-12-02

    申请人： Peng Zhang ,  Danielle Megan King Curzi ,  Eugene Joseph Karwacki, JR. ,  Leslie Cox Barber

    发明人： Peng Zhang ,  Danielle Megan King Curzi ,  Eugene Joseph Karwacki, JR. ,  Leslie Cox Barber

    IPC分类号： G03F7/20 ,  G03F7/40

    CPC分类号： G03F7/32 ,  G03F7/0048 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40 ,  G03F7/425

    摘要： Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain embodiments, the process solution may reduce post-development defects such as pattern collapse or line width roughness when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of defects such as pattern collapse and/or line width roughness on a plurality of photoresist coated substrates employing the process solution of the present invention.

    摘要翻译： 使用包含一种或多种表面活性剂的工艺溶液来减少半导体器件制造中的缺陷数量。 在某些实施方案中，当在图案化光致抗蚀剂层的显影期间或之后，当用作冲洗溶液时，所述工艺溶液可以减少显影后缺陷，例如图案塌陷或线宽粗糙度。 还公开了一种使用本发明的工艺溶液来减少多个光致抗蚀剂涂覆的基板上的图案塌陷和/或线宽粗糙度等缺陷的数量的方法。

    Process and System for Providing Acetylene
    13.
    发明申请
    Process and System for Providing Acetylene 有权
    提供乙炔的工艺和体系

    公开(公告)号：US20100069689A1

    公开(公告)日：2010-03-18

    申请号：US12554052

    申请日：2009-09-04

    申请人： Timothy John Maykut ,  Suhas Narayan Ketkar ,  Benjamin James Arthur Inman ,  John Irven ,  Eugene Joseph Karwacki, JR. ,  Neil Alexander Downie

    发明人： Timothy John Maykut ,  Suhas Narayan Ketkar ,  Benjamin James Arthur Inman ,  John Irven ,  Eugene Joseph Karwacki, JR. ,  Neil Alexander Downie

    IPC分类号： C07C11/24 ,  B01D53/14

    CPC分类号： C07C7/09 ,  C07C11/24

    摘要： A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.

    摘要翻译： 用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。 在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流 至-50℃。 并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。