Measurement of properties of thin films on sidewalls
    13.
    发明授权
    Measurement of properties of thin films on sidewalls 有权
    测量侧壁薄膜的性能

    公开(公告)号:US07483513B2

    公开(公告)日:2009-01-27

    申请号:US11487433

    申请日:2006-07-17

    IPC分类号: G01N23/20

    CPC分类号: G01N23/20

    摘要: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

    摘要翻译: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上,并以反射模式接收从表面散射的X射线,以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

    Measurement of critical dimensions using X-ray diffraction in reflection mode
    14.
    发明授权
    Measurement of critical dimensions using X-ray diffraction in reflection mode 有权
    在反射模式下使用X射线衍射测量临界尺寸

    公开(公告)号:US07110491B2

    公开(公告)日:2006-09-19

    申请号:US11018352

    申请日:2004-12-22

    IPC分类号: G01N23/20

    CPC分类号: G01N23/20

    摘要: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

    摘要翻译: 用于样品的X射线分析的方法包括引导X射线束照射到样品表面上的周期性特征的区域上,并以反射模式接收从表面散射的X射线,以便 检测散射X射线中的衍射光谱作为方位角的函数。 分析衍射光谱以确定特征的尺寸。

    X-ray reflectometer
    16.
    发明授权

    公开(公告)号:US06512814B2

    公开(公告)日:2003-01-28

    申请号:US09833902

    申请日:2001-04-12

    IPC分类号: G01T136

    CPC分类号: G01T1/36

    摘要: Reflectometry apparatus includes a radiation source, adapted to irradiate a sample with radiation over a range of angles relative to a surface of the sample, and a detector assembly, positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal responsive thereto. A shutter is adjustably positionable to intercept the radiation, the shutter having a blocking position, in which it blocks the radiation in a lower portion of the range of angles, thereby allowing the reflected radiation to reach the array substantially only in a higher portion of the range, and a clear position, in which the radiation in the lower portion of the range reaches the array substantially without blockage.

    X-ray microanalyzer for thin films
    17.
    发明授权
    X-ray microanalyzer for thin films 有权
    用于薄膜的X射线微量分析仪

    公开(公告)号:US06381303B1

    公开(公告)日:2002-04-30

    申请号:US09408894

    申请日:1999-09-29

    IPC分类号: G01N23223

    CPC分类号: G01N23/20

    摘要: Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.

    摘要翻译: 用于样品的X射线微量分析的装置包括X射线源,其在样品的表面上照射尺寸小于500μm的斑点。 第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线,其响应于照射。 第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。 处理电路响应于由此捕获的X射线,从第一和第二X射线检测器接收相应的信号,并组合分析信号以确定样品在斑点区域内的表面层的性质。

    Overlay metrology using X-rays
    18.
    发明授权
    Overlay metrology using X-rays 有权
    使用X射线覆盖测量

    公开(公告)号:US07481579B2

    公开(公告)日:2009-01-27

    申请号:US11389490

    申请日:2006-03-27

    IPC分类号: G01D18/00

    CPC分类号: G03F7/70633

    摘要: A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.

    摘要翻译: 一种检查方法包括将X射线束引导到包含分别在第一和第二薄膜层上形成的第一和第二特征的样品的区域上,该第一和第二特征覆盖在样品的表面上。 检测和分析从第一和第二特征衍射的X射线的图案,以评估第一和第二特征的对准。

    Overlay metrology using X-rays
    19.
    发明申请
    Overlay metrology using X-rays 有权
    使用X射线覆盖测量

    公开(公告)号:US20070224518A1

    公开(公告)日:2007-09-27

    申请号:US11389490

    申请日:2006-03-27

    IPC分类号: G03F1/00

    CPC分类号: G03F7/70633

    摘要: A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.

    摘要翻译: 一种检查方法包括将X射线束引导到包含分别在第一和第二薄膜层上形成的第一和第二特征的样品的区域上,该第一和第二特征覆盖在样品的表面上。 检测和分析从第一和第二特征衍射的X射线的图案,以评估第一和第二特征的对准。

    Detection of dishing and tilting using X-ray fluorescence
    20.
    发明授权
    Detection of dishing and tilting using X-ray fluorescence 有权
    使用X射线荧光检测凹陷和倾斜

    公开(公告)号:US07245695B2

    公开(公告)日:2007-07-17

    申请号:US11103071

    申请日:2005-04-11

    IPC分类号: G01N23/223

    CPC分类号: G01N23/223 G01N2223/076

    摘要: A method for testing a material applied to a surface of a sample includes directing an excitation beam, having a known beam-width and intensity cross-section, onto a region of the sample. An intensity of X-ray fluorescence emitted from the region responsively to the excitation beam is measured. A distribution of the material within the region is estimated, responsively to the measured intensity of the X-ray fluorescence and to the intensity cross-section of the excitation beam, with a spatial resolution that is finer than the beam-width.

    摘要翻译: 用于测试施加到样品表面的材料的方法包括将具有已知束宽度和强度横截面的激发束引导到样品的区域上。 测量从响应于激发光束的区域发射的X射线荧光的强度。 响应于X射线荧光的测量强度和激发光束的强度横截面,估计区域内材料的分布,其空间分辨率比光束宽度更精细。