公开(公告)号：US08801943B2

公开(公告)日：2014-08-12

申请号：US13193520

申请日：2011-07-28

申请人： Shiwen Huang ,  Fenglin Liu ,  Qiping Zhong ,  Kyusik Shin ,  Yingjian Chen

发明人： Shiwen Huang ,  Fenglin Liu ,  Qiping Zhong ,  Kyusik Shin ,  Yingjian Chen

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

摘要翻译： 本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。 根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。 本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。 根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。 例如，可以使用较小尺寸的光刻技术。 此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

公开(公告)号：US20120125885A1

公开(公告)日：2012-05-24

申请号：US12954458

申请日：2010-11-24

申请人： YINGJIAN CHEN ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

发明人： YINGJIAN CHEN ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

IPC分类号： G11B21/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/23 ,  G11B5/315 ,  G11B5/3163

摘要： A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

摘要翻译： 垂直写头，其具有围绕屏蔽的保护层和保形侧间隙。 在制造写入头时，前缘屏蔽可以化学机械抛光到基本上均匀的化学机械抛光停止层的水平。 由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止，所以可以用LTE / LES形成完全共形的侧屏蔽。

公开(公告)号：US08470186B2

公开(公告)日：2013-06-25

申请号：US12954458

申请日：2010-11-24

申请人： Yingjian Chen ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

发明人： Yingjian Chen ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/23 ,  G11B5/315 ,  G11B5/3163

摘要： A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

摘要翻译： 垂直写头，其具有围绕屏蔽的保护层和保形侧间隙。 在制造写入头时，前缘屏蔽可以被化学机械抛光到基本上均匀的化学机械抛光停止层的水平。 由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止，所以可以用LTE / LES形成完全共形的侧屏蔽。

公开(公告)号：US08628672B1

公开(公告)日：2014-01-14

申请号：US13535091

申请日：2012-06-27

申请人： Weimin Si ,  Ying Hong ,  Zhigang Bai ,  Yunhe Huang ,  Fenglin Liu ,  Hong Zhang ,  Jikou Zhou ,  Xiaoyu Yang ,  Yuan Yao ,  Iulica Zana ,  Feng Liu ,  Ling Wang

发明人： Weimin Si ,  Ying Hong ,  Zhigang Bai ,  Yunhe Huang ,  Fenglin Liu ,  Hong Zhang ,  Jikou Zhou ,  Xiaoyu Yang ,  Yuan Yao ,  Iulica Zana ,  Feng Liu ,  Ling Wang

IPC分类号： B44C1/22

CPC分类号： G11B5/315 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

摘要： A method for fabricating a magnetic recording transducer having a magnetic writer pole with a short effective throat height is provided. In an embodiment, a writer structure comprising a magnetic writer pole having a trailing bevel and a nonmagnetic stack on the top surface of the writer pole is provided. A dielectric write gap layer comprising alumina is deposited over the trailing bevel section and the nonmagnetic stack; and at least one etch stop layer is deposited over the dielectric write gap layer. A layer of nonmagnetic fill material is deposited over the etch stop layer and to form a nonmagnetic bevel by performing a dry etch process. The etch stop layer(s) are removed from the short throat section; and a trailing shield is deposited over the short throat section, nonmagnetic bevel, and nonmagnetic stack top surface.

摘要翻译： 提供一种制造具有具有短的有效喉部高度的磁性写入极的磁记录换能器的方法。 在一个实施例中，提供了一种写入器结构，其包括在写入器极的顶表面上具有后斜面和非磁性堆叠的磁性写入极。 包含氧化铝的电介质写入间隙层沉积在后斜面部分和非磁性层上; 并且至少一个蚀刻停止层沉积在电介质写间隙层上。 一层非磁性填充材料沉积在蚀刻停止层上并通过执行干法蚀刻工艺形成非磁性斜面。 蚀刻停止层从短喉部分移除; 并且尾部屏蔽层沉积在短喉部分，非磁性斜面和非磁性堆叠顶表面上。

公开(公告)号：US07898773B2

公开(公告)日：2011-03-01

申请号：US11345892

申请日：2006-02-02

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.

摘要翻译： 垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。 侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。 形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。 蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。 然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。 然后在侧屏和极上方形成上屏蔽。

公开(公告)号：US08189295B2

公开(公告)日：2012-05-29

申请号：US13135276

申请日：2011-06-30

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.

摘要翻译： 垂直磁记录（PMR）头具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上方屏蔽。 底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。 底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。 写入间隙层和上屏蔽形成在侧屏蔽和极上。 所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

公开(公告)号：US20110261486A1

公开(公告)日：2011-10-27

申请号：US13135276

申请日：2011-06-30

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

IPC分类号： G11B5/187

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.

摘要翻译： 垂直磁记录（PMR）头具有由分离的一对底侧屏蔽物侧向屏蔽的极尖，并由上屏蔽从上方屏蔽。 底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。 底部屏蔽层和非磁性层形成楔形沟槽，其中极尖已经通过自对准电镀工艺形成。 写入间隙层和上屏蔽形成在侧屏蔽和极上。 所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

公开(公告)号：US07978431B2

公开(公告)日：2011-07-12

申请号：US11809346

申请日：2007-05-31

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Lijie Guan

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. A write gap layer and an upper shield is then formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition.

摘要翻译： 垂直磁记录（PMR）头被制造成具有通过分离的一对底侧屏蔽横向屏蔽的极尖，并由上屏蔽从上面屏蔽。 底侧屏蔽围绕极尖的下部，而极尖的上部被非磁性层包围。 底部屏蔽层和非磁性层形成楔形沟槽，其中极尖通过自对准电镀工艺形成。 楔形形状通过RIE工艺形成，其使用通过由比非磁性材料或屏蔽材料具有较慢蚀刻速率的材料形成的掩模层施加的特定气体。 形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的形成在氧化铝的非磁性层上的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果 。 然后在侧屏和极上方形成写间隙层和上屏蔽。 所得到的结构基本上消除了轨道重写，同时保持良好的轨道定义。

公开(公告)号：US20080253035A1

公开(公告)日：2008-10-16

申请号：US11728910

申请日：2007-03-27

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

IPC分类号： G11B5/33 ,  B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163 ,  G11B5/3169 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T428/1193

摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.

摘要翻译： 描述了用于形成PMR头的写入极的过程。 该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层 围绕这一点。

公开(公告)号：US20070177301A1

公开(公告)日：2007-08-02

申请号：US11345892

申请日：2006-02-02

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

IPC分类号： G11B5/147

CPC分类号： G11B5/3163 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.

摘要翻译： 垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。 侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。 在NiFe的屏蔽层上形成的Ta，Ru / Ta，TaN或Ti的掩蔽层，并使用CH 3 3 OH，CO或NH 3的RIE气体或它们的 组合，产生所需的结果。 蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。 然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。 然后在侧屏和极上方形成上屏蔽。