公开(公告)号：US6062852A

公开(公告)日：2000-05-16

申请号：US60422

申请日：1998-04-14

申请人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： H01L21/683 ,  F27D5/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： H01L21/67109 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68742

摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.

摘要翻译： 基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。 支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。 当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

公开(公告)号：US5829087A

公开(公告)日：1998-11-03

申请号：US529832

申请日：1995-09-18

申请人： Joichi Nishimura ,  Tadashi Sasaki ,  Masami Ohtani

发明人： Joichi Nishimura ,  Tadashi Sasaki ,  Masami Ohtani

IPC分类号： A46B13/04 ,  H01L21/304

CPC分类号： H01L21/67046

摘要： A cleaning brush is fixed to a cleaner support that is mounted to a rotary element for vertical movement with respect thereto. The rotary element is rotatably supported by a forward portion of a support arm that is pivotable about a vertical axis at the rear of the support arm. A closed space defined by a bellows is connected to air piping having a pressure gauge and a regulator. The regulator is operable in response to variations of pressure resulting from engagement of the cleaning brush with a substrate, to control pressure within said bellows whereby the latter expands and contracts to raise or lower the cleaner support relative to the substrate as required to maintain the pressure in a predetermined range. The aforesaid construction responds fast enough to allow the cleaning brush to follow warping of the substrate with facility, and by so doing clean an entire substrate surface uniformly.

摘要翻译： 清洁刷被固定到安装到旋转元件上用于相对于其垂直移动的清洁器支撑件。 旋转元件由支撑臂的前部可旋转地支撑，支撑臂的前部可在支撑臂的后部围绕垂直轴线枢转。 由波纹管限定的封闭空间连接到具有压力计和调节器的空气管道。 调节器可响应于清洁刷与衬底的接合而产生的压力的变化而操作，以控制所述波纹管内的压力，从而当所述波纹管膨胀并收缩时，根据需要使清洁器支撑件相对于基板升高或降低以维持压力 在预定范围内。 上述结构足够快地响应于清洁刷使设备跟随基板翘曲，并且通过这样清洁整个基板表面均匀。

公开(公告)号：US5785068A

公开(公告)日：1998-07-28

申请号：US646131

申请日：1996-05-17

申请人： Tadashi Sasaki ,  Masami Ohtani

发明人： Tadashi Sasaki ,  Masami Ohtani

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/67051 ,  B08B3/02 ,  Y10S134/902

摘要： A substrate spin cleaning apparatus includes a nozzle attached through a first and second support brackets to support shaft that is rotatable about a vertical axis. The nozzle delivers a cleaning liquid to the surface of a spinning substrate in a pin-point mode and under high pressure, while moving a liquid application point on the substrate surface between the substrate spin center and peripheral edge of the substrate. The first support bracket defines an arcuate slot extending within a plane including the spin center and a tip of the nozzle and along an imaginary circle about the spin center. The nozzle is attached to the second support bracket connected to the first support bracket which in turn is through the arcuate slot, to deliver the cleaning liquid to the spin center. The application point is movable through the spin center regardless of the inclination angle of the nozzle relative to the substrate surface. The nozzle inclination angle relative to the substrate surface is readily variable in accordance with the thickness or type of layer formed on the substrate surface, or the type of contaminant to be removed therefrom.

摘要翻译： 基板旋转清洁装置包括通过第一和第二支撑托架附接到可绕垂直轴线旋转的支撑轴的喷嘴。 喷嘴在针尖模式和高压下将清洁液体输送到纺丝基材的表面，同时在衬底旋转中心和衬底的周边边缘之间的衬底表面上移动液体施加点。 第一支撑托架限定了在包括旋转中心和喷嘴的尖端以及围绕旋转中心的假想圆的平面内延伸的弓形槽。 喷嘴连接到连接到第一支撑托架的第二支撑托架，第二支撑托架又穿过弓形槽，以将清洁液体输送到旋转中心。 无论喷嘴相对于基板表面的倾斜角度如何，应用点都可通过自旋中心移动。 相对于基板表面的喷嘴倾斜角度根据在基板表面上形成的层的厚度或类型或要从其移除的污染物的类型而容易变化。

公开(公告)号：US5765072A

公开(公告)日：1998-06-09

申请号：US803618

申请日：1997-02-21

申请人： Masami Ohtani ,  Yoshiteru Fukutomi

发明人： Masami Ohtani ,  Yoshiteru Fukutomi

IPC分类号： B05C11/08 ,  B05C11/10 ,  G03D3/06 ,  H01L21/027 ,  G03D3/02

CPC分类号： G03D3/06

摘要： A substrate treating apparatus includes a substrate treating station for performing a predetermined treatment of substrates by supplying a predetermined treating solution to the substrates, and at least one treating solution supply mechanism for supplying the treating solution in a forced feed under gas pressure to the substrate treating station. The solution supply mechanism has a treating solution storage tank, a pressurizing mechanism, a pressure release mechanism and a valve for selectively allowing and stopping supply of the treating solution. The storage tank begins to be pressurized a predetermined time before the treating solution is supplied to a first substrate in a lot including a plurality of substrates to be treated successively with the same solution. Pressure is released from the storage tank based on a time at which the treating solution is stopped being supplied to a last substrate in the lot or at a predetermined slightly later time. Such control is effected lot by lot. Gas dissolution in the treating solution is reduced without using an expensive gas which would result in high running cost.

摘要翻译： 基板处理装置包括：基板处理台，用于通过向基板供给预定的处理溶液来进行基板的预定处理;以及至少一个处理溶液供给机构，用于将处理液在气体压力下供给至基板处理 站。 溶液供给机构具有处理液储存罐，加压机构，压力释放机构和用于选择性地允许和停止处理溶液供应的阀。 储存罐在预定时间开始加压，然后将处理溶液以相同的溶液依次供给到包括多个待处理基板的批次中的第一基板。 基于停止处理液的时间，从储罐释放压力，供给到批次中的最后一个基板或预定的稍后时间。 这种控制是按批次进行的。 在处理溶液中的气体溶解减少，而不使用昂贵的气体，这将导致高的运行成本。

公开(公告)号：US5146535A

公开(公告)日：1992-09-08

申请号：US685208

申请日：1991-04-15

申请人： Hisao Anzai ,  Isao Sasaki ,  Kozi Nishida ,  Hideaki Makino ,  Masami Ohtani ,  Katsuhiko Shimada

发明人： Hisao Anzai ,  Isao Sasaki ,  Kozi Nishida ,  Hideaki Makino ,  Masami Ohtani ,  Katsuhiko Shimada

IPC分类号： G02B6/00 ,  B29C47/00 ,  C08F8/32 ,  C08F8/48

CPC分类号： C08F8/48 ,  B29C47/00 ,  B29C47/0009 ,  C08F2800/20

摘要： A light-transmitting plastic fiber comprising, as a core component, a methacrylimide group-containing polymer prepared by polymerizing methyl methacrylate in the absence of a chain transfer agent and then imidizing the methyl methacrylate polymer thus prepared, and another polymer as a sheath component.

摘要翻译： 一种透光塑料纤维，其包含作为核心组分的通过在不存在链转移剂的情况下聚合甲基丙烯酸甲酯然后将由此制备的甲基丙烯酸甲酯聚合物酰亚胺化制备的含甲基丙烯酰亚胺基团的聚合物，以及作为鞘组分的另一种聚合物。

公开(公告)号：US4940778A

公开(公告)日：1990-07-10

申请号：US220617

申请日：1988-07-18

申请人： Hisao Anzai ,  Kozi Nishida ,  Isao Sasaki ,  Hideaki Makino ,  Masami Ohtani

发明人： Hisao Anzai ,  Kozi Nishida ,  Isao Sasaki ,  Hideaki Makino ,  Masami Ohtani

IPC分类号： B41J2/045 ,  B41J2/055 ,  B41J2/14 ,  C08F8/00 ,  C08F8/48 ,  C08F20/52 ,  C08L33/24 ,  H04N1/23

CPC分类号： C08F8/48 ,  C08F8/00

摘要： A methacrylimide group-containing polymer having improved moldability as well as good heat resistance and transparency is prepared by heat treating a methacrylimide group-containing polymer having imide ring structural units of the formula: ##STR1## wherein R represents a hydrogen, an alkyl, cycloalkyl, aryl, alkaryl, aralkyl or allyl group 1 to 20 carbon atoms, at a temperature of 190 to 350 C. in the presence of a tertiary amine of the formula: ##STR2## wherein R.sub.1, R.sub.2 and R.sub.3 independently represent an alkyl, aryl, aralkyl or alkaryl group having 1 to 20 carbon atoms, and two of R.sub.1, R.sub.2 and R.sub.3 may be linked to form a ring together with the nitrogen atom.

摘要翻译： 通过热处理具有下式的酰亚胺环结构单元的甲基丙烯酰亚胺基聚合物制备具有改进的成型性以及良好的耐热性和透明性的含甲基丙烯酰亚胺基的聚合物：其中R表示氢，烷基，环烷基 ，芳基，烷芳基，芳烷基或具有1至20个碳原子的烯丙基，在190-350℃的温度下，在下式的叔胺存在下，其中R 1，R 2和R 3独立地表示烷基，芳基， 具有1至20个碳原子的芳烷基或烷芳基，并且R 1，R 2和R 3中的两个可以与氮原子一起形成环。

公开(公告)号：US4923054A

公开(公告)日：1990-05-08

申请号：US275525

申请日：1988-11-22

申请人： Masami Ohtani ,  Masami Nishida

发明人： Masami Ohtani ,  Masami Nishida

IPC分类号： B65G1/02 ,  B65G1/00 ,  B65G1/07 ,  B65G47/91 ,  B65H1/28 ,  B65H3/00 ,  B65H31/24 ,  H01L21/00 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/67778 ,  H01L21/67775 ,  H01L21/68707 ,  Y10S414/137 ,  Y10S414/141

摘要： An apparatus for storing and transferring a wafer. The apparatus includes a wafer transfer portion having a path through which a wafer can be transferred; structure for storing the wafer, the structure for storing the wafer being removably attached to the wafer transfer portion; a first elevator for elevating and lowering the wafer transfer portion and the storing structure to a predetermined level; a holder for temporarily holding the wafer in the wafer transfer portion; and a second elevator for elevating and lowering the wafer holder, the second elevator being separate and independent from the first elevator. Since the wafer storing structure and the wafer transfer portion are elevated and lowered by different elevators, the wafer can be transported while the wafer transfer portion is stationary. Thus, the apparatus has a simplified construction and replacement of the storing structure can be automated.

摘要翻译： 一种用于存储和转移晶片的装置。 该装置包括具有可以转移晶片的路径的晶片传送部分; 用于存储晶片的结构，用于存储晶片的结构，其可移除地附接到晶片传送部分; 第一电梯，用于将所述晶片转印部分和所述存储结构升高和降低到预定水平; 用于将晶片临时保持在晶片转移部分中的保持器; 以及用于升降所述晶片保持器的第二电梯，所述第二电梯与所述第一电梯分离并独立。 由于晶片存储结构和晶片传送部分被不同的电梯升高和降低，所以晶片可以在晶片传送部分静止的同时传输。 因此，该装置具有简化的结构，可以自动地更换存储结构。

公开(公告)号：US20080212049A1

公开(公告)日：2008-09-04

申请号：US12031673

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus is arranged adjacent to an exposure device and includes a processing section, a transfer section configured to carry the substrate into and out of the processing section, and an interface configured to receive and transfer the substrate between the processing section and the exposure device. The processing section includes a first processing unit having a photosensitive film formation region, a thermal processing region having a first thermal processing unit, and a first transport region having a first transport unit. The photosensitive film formation region is arranged opposite the thermal processing region with the first transport region interposed therebetween. The processing section also includes a second processing unit having a first development region, a second development region, and a second transport region having a second transport unit. The first development region is arranged opposite to the second development region with the second transport region interposed therebetween.

摘要翻译： 衬底处理设备被布置成与曝光设备相邻，并且包括处理部分，被配置为将衬底输入和移出处理部分的传送部分以及被配置为在处理部分和曝光之间接收和传送衬底的接口 设备。 处理部分包括具有感光成膜区域的第一处理单元，具有第一热处理单元的热处理区域和具有第一输送单元的第一输送区域。 感光性膜形成区域与热处理区域相对配置，其间插入有第一输送区域。 处理部分还包括具有第一显影区域，第二显影区域和具有第二输送单元的第二输送区域的第二处理单元。 第一显影区域与第二显影区域相对布置，其间插入第二输送区域。

公开(公告)号：US06286525B1

公开(公告)日：2001-09-11

申请号：US09071683

申请日：1998-05-01

申请人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

发明人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

IPC分类号： B08B300

CPC分类号： H01L21/67051 ,  B08B1/04 ,  B08B3/00 ,  H01L21/67046 ,  Y10S134/902

摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.

摘要翻译： 多个相同类型的清洁装置连接到一个支撑臂。 清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。 因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。 可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。 在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

公开(公告)号：US6048400A

公开(公告)日：2000-04-11

申请号：US912699

申请日：1997-08-18

申请人： Masami Ohtani

发明人： Masami Ohtani

IPC分类号： G03F7/16 ,  B01F5/04 ,  B01F5/06 ,  B01F13/10 ,  B01F15/00 ,  B05C11/08 ,  B05C11/10 ,  H01L21/027 ,  B05C5/00

CPC分类号： B01F15/00207 ,  B01F15/00246 ,  B01F15/00344 ,  B01F5/0403 ,  B01F5/0614 ,  B05C11/08 ,  B05C11/1007 ,  B05C11/1036 ,  B01F13/1025

摘要： A substrate processing apparatus has a simple structure in which the number of nozzles is reduced. In a mixer part, photoresist which is supplied from a photoresist supply through a lower arm portion of the nozzle arm is mixed with solvent which is supplied from a solvent supply through a pipe. Following this mixing, the photoresist and the solvent flow through an upper arm portion and are ejected from a nozzle toward a substrate. In the nozzle arm, a viscometer is disposed to the upper arm portion. The viscometer measures a viscosity of photoresist solution which is obtained by mixing in the mixer part. In accordance with the measurement from the viscometer, the quantity of solvent supplied from the solvent supply is controlled, thereby obtaining a photoresist solution having a desired viscosity.

摘要翻译： 基板处理装置具有减少喷嘴数量的简单结构。 在混合器部分中，通过喷嘴臂的下臂部分从光致抗蚀剂供应源供应的光致抗蚀剂与从溶剂供应通过管道供应的溶剂混合。 在该混合之后，光致抗蚀剂和溶剂流过上臂部分并从喷嘴朝向基底喷射。 在喷嘴臂中，将粘度计设置在上臂部。 粘度计测量在混合器部分中混合获得的光致抗蚀剂溶液的粘度。 根据粘度计的测定，控制从溶剂供给量供给的溶剂量，得到具有所需粘度的光致抗蚀剂溶液。