公开(公告)号：US20160054658A1

公开(公告)日：2016-02-25

申请号：US14918949

申请日：2015-10-21

Applicant: FUJIFILM CORPORATION

Inventor： Masahiro YOSHIDOME ,  Tsukasa YAMANAKA

IPC: G03F7/32 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/20 ,  G03F7/2041

Abstract: Provided is a pattern forming method including a step of applying a solvent (S) onto a substrate, a step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate, on which the solvent (S) has been applied, to form an actinic ray-sensitive or radiation-sensitive film, a step of exposing the actinic ray-sensitive or radiation-sensitive film, and a step of developing the exposed actinic ray-sensitive or radiation-sensitive film with a developing liquid containing an organic solvent to form a negative-type pattern.

Abstract translation: 提供了一种图案形成方法，包括将溶剂（S）施加到基板上的步骤，将光化学敏感或辐射敏感性树脂组合物施加到其上施加了溶剂（S）的基材上的步骤， 以形成光化射线敏感或辐射敏感膜，暴露光化射线敏感或辐射敏感膜的步骤，以及用显影液显影暴露的光化射线敏感或辐射敏感膜的步骤，所述显影液含有 有机溶剂形成负型图案。

公开(公告)号：US20150140482A1

公开(公告)日：2015-05-21

申请号：US14606161

申请日：2015-01-27

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Naoya IGUCHI ,  Ryosuke UEBA ,  Kei YAMAMOTO

IPC: G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/70466

Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

Abstract translation: 图案形成方法包括：（a）使用光化射线敏感性或辐射敏感性树脂组合物（I）在基材上形成第一膜，所述树脂组合物（I）含有在含有有机溶剂的显影剂中的溶解度由于极性增加而降低 酸的作用 （b）曝光第一片; （c）使用包含有机溶剂的显影剂显影所述暴露的第一膜以形成第一负图案; （e）使用包含其中含有有机溶剂的显影剂中的溶解度由于酸的作用引起极性增加的树脂的光化射线敏感性或辐射敏感性树脂组合物（II）在基材上形成第二膜; （f）使第二膜曝光; 和（g）使用包含有机溶剂的显影剂显影所暴露的第二膜，以依次形成第二负图案。