公开(公告)号：US5479535A

公开(公告)日：1995-12-26

申请号：US266096

申请日：1994-06-27

申请人： Fumio Komatsu

发明人： Fumio Komatsu

IPC分类号： G01B11/24 ,  G06T1/00 ,  G06T5/00 ,  G06T7/60 ,  G06T9/20 ,  G06K9/48

CPC分类号： G06T7/0083 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/30148

摘要： A method of extracting a feature of an image, includes: a first step of performing a logarithmic conversion process for each pixel of an image taken by an electron microscope to carry out non-linear image enhancement; a second step of performing an N(N is a predetermined value) valued process for each pixel of the image underwent the logarithmic conversion process, threshold values for the N valued process being obtained by dividing the whole range of gray levels of the pixels by N, and gray level of the pixel being one of N constant gray level values by the N valued process; a third step of performing a partial differentiatial process in X- and Y-directions for each pixel of the image obtained by the second step, to make "0" the gray levels of pixels within the same area divided by the N valued process and make only the boundary between different areas divided by the N valued process to have a certain gray level; and a fourth step of detecting the boundary and extracting a feature of said image.

摘要翻译： 提取图像特征的方法包括：对由电子显微镜拍摄的图像的每个像素执行对数转换处理以执行非线性图像增强的第一步骤; 对图像的每个像素执行N（N是预定值）值处理的第二步骤是通过将像素的灰度级的全部范围除以N而获得的N值处理的阈值 并且通过N值处理，像素的灰度级为N个恒定灰度值之一; 对于通过第二步骤获得的图像的每个像素对X和Y方向执行部分微分处理的第三步骤，使相同区域内的像素的灰度级别除以N值处理，使“0”成为“0” 只有不同区域之间的边界除以N值过程才具有一定的灰度级; 以及检测所述边界并提取所述图像的特征的第四步骤。

公开(公告)号：US06363167B1

公开(公告)日：2002-03-26

申请号：US09260500

申请日：1999-03-02

申请人： Yumiko Miyano ,  Fumio Komatsu

发明人： Yumiko Miyano ,  Fumio Komatsu

IPC分类号： G06K900

CPC分类号： G06T7/62 ,  G06T2207/30148

摘要： A method for measuring a size of fine pattern wherein sizes of a plurality of fine patterns are measured using a scanning electron microscope is disclosed. The measuring method comprises the following procedures of obtaining a secondary electron image while scanning an electron beam on a fine pattern, determining whether or not the secondary electron image thus obtained meets a shape judgment criterion which has been set in advance, and, when the criterion is met as a result of determination processing, measuring a size of the fine pattern but, when the criterion is not met as a result of determination processing, moving to a next measurement area without measuring a size of the fine pattern.

摘要翻译： 公开了一种使用扫描电子显微镜测量多个精细图案的尺寸的精细图案尺寸的方法。 该测量方法包括在精细图案上扫描电子束时获得二次电子图像的步骤，确定如此获得的二次电子图像是否符合预先设定的形状判断标准，并且当标准 作为确定处理的结果，测量精细图案的尺寸，但是当作为确定处理的结果不满足标准时，移动到下一个测量区域而不测量精细图案的尺寸。

公开(公告)号：US6111981A

公开(公告)日：2000-08-29

申请号：US130522

申请日：1998-08-07

申请人： Koji Tsubusaki ,  Hiroshi Motoki ,  Fumio Komatsu

发明人： Koji Tsubusaki ,  Hiroshi Motoki ,  Fumio Komatsu

IPC分类号： G01B11/24 ,  G03F1/84 ,  G03F1/86 ,  G06K9/00 ,  G06T1/00 ,  G06T5/00 ,  G06T5/20 ,  G06T7/60

CPC分类号： G06T7/0081 ,  G06K9/0014 ,  G06K2209/19 ,  G06T2207/10061 ,  G06T2207/30148

摘要： Analog image data a SEM are converted into digital data, and are processed by a spatial filtering processing, histogram processing, threshold value setting, three-valued image data processing, noise reduction and the like. Area of a pattern in the three-valued image data is calculated by a labelling and calculation processing, and a pattern is sequentially detected by comparing the area of the pattern with a reference area value. The comparison and detection of the same or similar patterns repeated in the SEM image are performed by using the area of the pattern, and are not performed by a shape of the pattern, thereby resulting a precise detection at high speed by using a microprocessor. Since it is possible to perform a pattern recognition from the area value even though the pattern does not have a characteristic, it is possible to precisely detect and recognize a pattern image in high speed.

摘要翻译： 模拟图像数据，SEM被转换为数字数据，并通过空间滤波处理，直方图处理，阈值设置，三值图像数据处理，降噪等处理。 通过标记和计算处理计算三值图像数据中的图案的面积，并且通过将图案的面积与参考面积值进行比较来顺序地检测图案。 通过使用图案的区域来进行SEM图像中重复的相同或相似图案的比较和检测，并且不通过图案的形状进行，从而通过使用微处理器高速精确地检测。 由于即使图案不具有特征，也可以从区域值执行图案识别，因此可以高速精确地检测和识别图案图像。

公开(公告)号：US5528648A

公开(公告)日：1996-06-18

申请号：US348929

申请日：1994-11-25

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： The fluorescent X-ray generated by elements when an X-ray is total reflected from a substrate surface is detected by a fluorescent X-ray detecting circuit; the fluorescent X-ray peak generated by the substrate element and the fluorescent X-ray peaks generated by contaminative elements are separated by a peak separating circuit; an integral intensity I.sub.0 of the fluorescent X-ray peak generated by the substrate element and integral intensities I of the fluorescent X-ray peaks generated by the contaminative elements are calculated by an integral intensity calculating circuit, respectively; and contaminative element concentrations N=N.sub.0 .multidot.(.eta..sub.0 / I.sub.0).multidot.(I / .eta.) (where N.sub.0 denotes the surface concentration of the substrate; .eta..sub.0 denotes the fluorescent yield of the substrate; and .eta. denotes the fluorescent yield of the contaminative elements) are calculated by a contaminative element concentration calculating circuit on the basis of the calculated integral intensities I.sub.0 and I. The contaminative elements can be analyzed non-destructively without use of any analytical curves, so that it is possible to save much labor required to prepare the analytical curves.

摘要翻译： 通过荧光X射线检测电路检测由X射线从基板表面全反射时由元件产生的荧光X射线; 由衬底元件产生的荧光X射线峰值和由污染元素产生的荧光X射线峰值由峰值分离电路分离; 通过积分强度计算电路分别计算由衬底元件产生的荧光X射线峰值和由污染元素产生的荧光X射线峰值的积分强度I的积分强度I0; 和污染元素浓度N = N0x（eta0 / I0）x（I / eta）（其中N0表示底物的表面浓度; eta 0表示底物的荧光产率; eta表示污染元素的荧光产率 ）通过污染元素浓度计算电路基于计算的积分强度I0和I计算。污染元素可以非破坏性地分析，而不使用任何分析曲线，使得可以节省准备所需的大量劳力 分析曲线。

公开(公告)号：US5490194A

公开(公告)日：1996-02-06

申请号：US348928

申请日：1994-11-25

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： In the method and apparatus for analyzing contaminative element concentrations, a fluorescent X-ray generated by elements when an X-ray is total reflected from the surface of a substrate is detected by a fluorescent X-ray detector; a peak of the fluorescent X-ray generated by a substrate element and peaks of the fluorescent X-ray generated by other contaminative elements are separated from the detected fluorescent X-ray waveform by a peak separating circuit; and the concentrations of the detected contaminative elements are calculated on the basis of the separated peaks by a calculating circuit. In the peak detection, in particular, the peaks of the contaminative elements to be analyzed are detected from the waveform. When other peaks are present within a predetermed number of channels (energy eV) before and after each detected peak, the channel numbers and the signal intensities between the respective peaks are extracted. Further, the a true peak is determined after obtaining the evaluation values of the respective peaks, so that it is possible to separate peaks from the fluorescent X-ray waveform accurately, even if each peak is split in the observed waveform.

摘要翻译： 在用于分析污染元素浓度的方法和装置中，通过荧光X射线检测器检测当从基板的表面全反射X射线时由元件产生的荧光X射线; 由基板元件产生的荧光X射线的峰值和由其他污染元素产生的荧光X射线的峰值通过峰值分离电路与检测到的荧光X射线波形分离; 并且通过计算电路基于分离的峰值计算检测到的污染元素的浓度。 在峰值检测中，特别地，从波形检测要分析的污染元素的峰值。 当在每个检测到的峰之前和之后的预定数量的通道（能量eV）内存在其它峰时，提取各峰之间的通道数和信号强度。 此外，在获得各个峰值的评估值之后确定真正的峰值，使得即使每个峰值在观察波形中分裂，也可以精确地从荧光X射线波形分离峰值。

公开(公告)号：US5430786A

公开(公告)日：1995-07-04

申请号：US161270

申请日：1993-12-03

申请人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

发明人： Fumio Komatsu ,  Kunihiro Miyazaki ,  Ayako Shimazaki

IPC分类号： G01N23/223 ,  G01N23/225

CPC分类号： G01N23/223 ,  G01N2223/076

摘要： Element identification and concentration calculation can be conducted with precision by correcting waveform distortion caused by the energy resolution of a detection system. A smoothing process is effected on a measured waveform of fluorescent X-rays obtained from an object to be measured. A device function of the detection system is obtained for each analytic element, based on the energy resolution of the detection system for a fluorescent X-ray energy value of each analytic element. A deconvolution process is effected on the measured waveform thus smoothed, by using the device functions of the detection system. Analytic elements are identified and concentrations of the analytic elements are obtained from the waveform data after the deconvolution process. The measured waveform is compensated for absorption in a beryllium window prior to smoothing.

摘要翻译： 可以通过校正由检测系统的能量分辨率引起的波形失真来精确地进行元件识别和浓度计算。 对从测量对象获得的荧光X射线的测量波形进行平滑处理。 基于每个分析元件的荧光X射线能量值的检测系统的能量分辨率，为每个分析元件获得检测系统的器件功能。 通过使用检测系统的设备功能，对所测量的波形进行去卷积处理。 识别分析元素，并且在去卷积处理之后从波形数据获得分析元素的浓度。 在平滑之前，测量的波形被补偿在铍窗口中的吸收。

公开(公告)号：US4910398A

公开(公告)日：1990-03-20

申请号：US257862

申请日：1988-10-14

申请人： Fumio Komatsu ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Katsuya Okumura

IPC分类号： H01J37/22 ,  G01B11/24 ,  G01B15/00 ,  G01B15/04 ,  G03F7/20 ,  H01J37/244

CPC分类号： G03F7/70483 ,  G01B11/24 ,  G01B15/04

摘要： This method is a method of measuring a taper angle, a thickness or a depth of a semiconductor integrated circuit pattern. Electron beam, light beam or the like is irradiated to a semiconductor integrated circuit pattern provided on a reference plane, thus to form a projected image. The projected image forms a predetermined angle with respect to a reference line set with respect to the reference plane. Then, lengths in a direction of the reference line of the projected images of symmetrical side walls of the pattern are measured to calculate from the ratio of those lengths and angle that the side walls and the reference plane form.

公开(公告)号：US06187488B1

公开(公告)日：2001-02-13

申请号：US09527526

申请日：2000-03-16

申请人： Kei Hayasaki ,  Shinichi Ito ,  Fumio Komatsu

发明人： Kei Hayasaki ,  Shinichi Ito ,  Fumio Komatsu

IPC分类号： G03F900

CPC分类号： G03F7/70616 ,  G03F7/70625

摘要： A pattern estimating method, wherein during exposure for forming the device pattern, a latent image of a monitor pattern which has the same pitch as an L/S pattern as the device pattern and has a narrower line width than the L/S pattern is formed in a mark area, after developing the device pattern, probing light is applied from a monitor head to the monitor pattern, and under the conditions for preventing generation of diffracted light of first-order or more, the intensity of zero-order light reflected from the monitor pattern is detected, so that the size of the device pattern is estimated on the basis of the prestored relationship between the device pattern size and the zero-order diffracted light intensity.

摘要翻译： 一种模式估计方法，其中在用于形成装置图案的曝光期间形成具有与L / S图案相同的间距作为装置图案并且具有比L / S图案窄的线宽的监视器图案的潜像 在标记区域中，在显影装置图案之后，将探测光从监视器头施加到监视器图案，并且在用于防止产生一级以上的衍射光的条件下，从零反射的零级光的强度 检测监视器图案，从而基于设备图案尺寸和零级衍射光强度之间的预先存储的关系来估计设备图案的尺寸。

公开(公告)号：US5818217A

公开(公告)日：1998-10-06

申请号：US222392

申请日：1994-04-04

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66 ,  G01R31/305

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for-controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US5811803A

公开(公告)日：1998-09-22

申请号：US915399

申请日：1997-08-20

申请人： Fumio Komatsu ,  Hiroshi Motoki

发明人： Fumio Komatsu ,  Hiroshi Motoki

IPC分类号： G01B15/00 ,  G01B15/08 ,  H01J37/18 ,  H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/164 ,  H01J2237/2605 ,  H01J2237/2817

摘要： An electron microscope comprises: a electron optical column 5 for allowing an electron beam aligned and focused by a lens 2, 3, 4 to pass therethrough; a specimen chamber 8 for receiving therein a sample 7 which is irradiated with the electron beam passing through the electron optical column; and a separating thin film 6, mounted so as to close an opening of the electron optical column on the side of the specimen chamber, for separating the electron optical column from the specimen chamber in a vacuum level.

摘要翻译： 电子显微镜包括：电子光学柱5，用于允许由透镜2,3,4对准和聚焦的电子束通过; 样本室8，用于在其中接收照射了通过电子光学柱的电子束的样品7; 以及分离薄膜6，安装成封闭电子光学柱在试样室一侧的开口，用于在真空度下将电子光学柱与试样室分离。