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    Electron scanning microscope and image generation method
    1.
    发明授权
    Electron scanning microscope and image generation method 有权

    公开(公告)号：US09875877B2

    公开(公告)日：2018-01-23

    申请号：US15111907

    申请日：2015-02-10

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Shinsuke Kawanishi ,  Yuusuke Oominami

    IPC: G01N23/00 ,  H01J37/18 ,  H01J37/16 ,  H01J37/28

    CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J37/28 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2605

    Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.

    Diaphragm Mounting Member and Charged Particle Beam Device
    4.
    发明申请
    Diaphragm Mounting Member and Charged Particle Beam Device 有权
    隔膜安装构件和带电粒子束装置

    公开(公告)号：US20160203941A1

    公开(公告)日：2016-07-14

    申请号：US14911681

    申请日：2014-03-10

    Applicant: HITACHI-TECHNOLOGIES CORPORATION

    Inventor： Shinsuke KAWANISHI ,  Yusuke OMINAMI ,  Hiroyuki SUZUKI ,  Masahiko AJIMA

    IPC: H01J37/20 ,  G01M3/02 ,  H01J37/26

    CPC classification number: H01J37/20 ,  G01M3/02 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2802

    Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.

    Abstract translation: 由于对膜片更换所需的成本和工作的便利性等因素的考虑不足，常规装置难以使用。 在本发明中，安装在带电粒子束装置中的隔膜安装构件设置有隔膜装置，该带电粒子束装置通过将分离真空空间和大气压空间的隔膜分离到放置在大气压空间中的样品上的一次带电粒子束， 安装有TEM膜的部分和安装在带电粒子束装置的壳体上的壳体固定部。 隔膜安装部具有用于定位保持隔膜的平台的定位结构。

    Charged particle beam apparatus and sample observation method
    5.
    发明授权
    Charged particle beam apparatus and sample observation method 有权
    带电粒子束装置和样品观察方法

    公开(公告)号：US09362083B2

    公开(公告)日：2016-06-07

    申请号：US14420942

    申请日：2013-07-08

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Hiroyuki Suzuki ,  Kohtaro Hosoya ,  Masanari Furiki

    IPC: H01J37/18 ,  H01J37/26 ,  H01J37/16 ,  H01J37/28 ,  H01J37/20

    CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J37/20 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/1825 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

    Abstract: There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part (300) that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (6), the structure being arranged so that the sample (6) is irradiated with a primary charged particle beam while the sample (6) and the diaphragm (10) are kept out of contact with each other.

    Abstract translation: 提供了具有允许在气体气氛或液体状态下观察样品的功能的带电粒子束装置，该装置旨在使干燥的样品在被引入的液体饱和时被观察，并且防止 带电粒子束由于在膜片和样品之间引入的不需要的液体而被散射。 本发明提供了一种结构，其包括入口 - 出口部分（300），该入口 - 出口部分（300）沿着样品（6）的下侧或侧面的方向引入和排出所需的液体或气体，该结构被布置成使得样品 ）在样品（6）和隔膜（10）彼此不接触的同时用初级带电粒子束照射。

    Charged Particle Beam Apparatus and Sample Observation Method
    7.
    发明申请
    Charged Particle Beam Apparatus and Sample Observation Method 有权
    带电粒子束装置和样品观察方法

    公开(公告)号：US20150221470A1

    公开(公告)日：2015-08-06

    申请号：US14420942

    申请日：2013-07-08

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Hiroyuki Suzuki ,  Kohtaro Hosoya ,  Masanari Furiki

    IPC: H01J37/18 ,  H01J37/26

    CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J37/20 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/1825 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

    Abstract: There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part (300) that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (6), the structure being arranged so that the sample (6) is irradiated with a primary charged particle beam while the sample (6) and the diaphragm (10) are kept out of contact with each other.

    Abstract translation: 提供了具有允许在气体气氛或液体状态下观察样品的功能的带电粒子束装置，该装置旨在使干燥的样品在被引入的液体饱和时被观察，并且防止 带电粒子束由于在膜片和样品之间引入的不需要的液体而被散射。 本发明提供了一种结构，其包括入口 - 出口部分（300），该入口 - 出口部分（300）沿着样品（6）的下侧或侧面的方向引入和排出所需的液体或气体，该结构被布置成使得样品 ）在样品（6）和隔膜（10）彼此不接触的同时用初级带电粒子束照射。

    High pressure charged particle beam system
    9.
    发明授权
    High pressure charged particle beam system 有权
    高压带电粒子束系统

    公开(公告)号：US08921811B2

    公开(公告)日：2014-12-30

    申请号：US12525908

    申请日：2008-02-06

    Applicant: Milos Toth ,  Rae Knowles

    Inventor： Milos Toth ,  William Ralph Knowles

    IPC: G01N23/00 ,  H01J37/305 ,  H01J37/301

    CPC classification number: H01J37/3056 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2605 ,  H01J2237/31732 ,  H01J2237/3174

    Abstract: The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.

    Abstract translation: 本发明包括用于处理的方法和装置，即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量，从而允许气体之间以及处理和成像模式之间的快速引入，耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中，可以控制细胞壁和样品的温度。

    Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
    10.
    发明授权
    Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope 有权
    界面，在非真空环境中观察物体的方法和扫描电子显微镜

    公开(公告)号：US08164057B2

    公开(公告)日：2012-04-24

    申请号：US12446757

    申请日：2007-10-23

    Applicant: Dov Shachal

    Inventor： Dov Shachal

    IPC: G01N23/00

    CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

    Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

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