公开(公告)号：US5818217A

公开(公告)日：1998-10-06

申请号：US222392

申请日：1994-04-04

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66 ,  G01R31/305

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for-controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US06515296B1

公开(公告)日：2003-02-04

申请号：US09570538

申请日：2000-05-12

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G01N2300

CPC分类号： G01N23/225

摘要： In an operation of a pattern dimension measuring system comprising a stage, an electron gun part, electron lens systems for scanning electron beam on a sample and having a MOL mechanism thereto, a secondary electron detector for detecting secondary electrons and so forth emitted from the sample, and a host computer having a pattern dimension measuring part, the stage is moved at a constant velocity, the coordinates of the stage is measured by a laser interferometer in real time, the variation in working distance of the electron beam is measured in real time by the optical lever system from a focal length measuring part to be fed back to a stage control part and an objective lens. When a pattern serving as an object to be measured reaches a region capable of scanning, the electron beam is scanned in the best focus while moving the scanning start position of the electron beam in synchronism with the constant velocity movement of the stage, so that the SEM image thereof is acquired.

摘要翻译： 在包括阶段，电子枪部分，用于在样品上扫描电子束并具有MOL机制的电子透镜系统的图案尺寸测量系统的操作中，用于检测从样品发射的二次电子等的二次电子检测器 和具有图形尺寸测量部件的主机，以等速移动平台，通过激光干涉仪实时测量舞台的坐标，实时测量电子束的工作距离的变化 通过光学杆系统从焦距测量部分反馈到舞台控制部分和物镜。 当作为被测量物体的图案到达能够扫描的区域时，电子束以最佳聚焦扫描，同时与舞台的等速运动同步地移动电子束的扫描开始位置， 获取其SEM图像。

公开(公告)号：US5315119A

公开(公告)日：1994-05-24

申请号：US983229

申请日：1992-11-19

申请人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

发明人： Fumio Komatsu ,  Katsuya Okumura ,  Motosuke Miyoshi

IPC分类号： G21K5/04 ,  H01J37/02 ,  H01J37/147 ,  H01J37/302 ,  H01L21/66

CPC分类号： H01J37/3026 ,  H01J37/026

摘要： To prevent electric charge up from being accumulated on the plane scanned by an electron beam and further to improve the S/N ratio, an electron beam irradiating apparatus comprising: position information signal outputting section for outputting position information signals, in sequence to designate positions at which an electron beam is irradiated on a plane scanned by the electron beam, so as to designate the irradiation positions at random; and irradiation controller for controlling the electron beam to irradiate the electron beam at the irradiation positions in response to the outputted position information signals. Further, to integrate an photoelectric signal over a sufficient time interval within the period of the pixel clock signal, the electric signal detecting circuit comprises a plurality of sample hold circuits and a selecting circuit for selecting and activating the sample hold circuits in sequence.

摘要翻译： 为了防止电荷积累在由电子束扫描的平面上并进一步提高S / N比，电子束照射装置包括：位置信息信号输出部分，用于输出位置信息信号，以依次指定位置信息信号 电子束照射在由电子束扫描的平面上，以便随机地指定照射位置; 以及照射控制器，用于响应于输出的位置信息信号，控制电子束在照射位置照射电子束。 此外，为了在像素时钟信号的周期内在足够的时间间隔内积分光电信号，电信号检测电路包括多个采样保持电路和用于依次选择和激活采样保持电路的选择电路。

公开(公告)号：US4807159A

公开(公告)日：1989-02-21

申请号：US897429

申请日：1986-08-18

申请人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Motosuke Miyoshi ,  Katsuya Okumura

IPC分类号： G21K5/04 ,  G01R31/26 ,  G01R31/305 ,  H01J37/04 ,  H01J37/28 ,  H01L21/027 ,  G01N23/00 ,  G21K1/08

CPC分类号： G01R31/305

摘要： Before detecting the surface state of specific patterns a sample by means of an electron beam tester system, patterns formed in a specified surface area of the sample, are detected by deflecting an electron beam by a deflection coil. Data representing current supplied to the deflection coil, data representing the position of the sample during the pattern-detecting operation, and image signals representing the patterns found in the specified surface area, are stored in a memory. While the specific patterns of a sample are being detected, the electron beam is used to perform a second pattern-detecting operation. Data representing current supplied to the deflection coil during the second pattern-detecting operation, such data representing the position of the sample, and image signals provided by the second pattern-detecting operation representing the patterns formed in the specified surface area, afe compared with those data items already stored in the memory. From the difference between the compared two sets of data items, any drift in the electron beam is calculated. In accordance with the drift thus calculated, the deflection coil is energized to deflec the electron beam such that the beam is applied onto the desired portion of the sample.

摘要翻译： 在通过电子束测试仪系统检测特定图案的表面状态之前，通过偏转线圈偏转电子束来检测在样品的规定表面积中形成的图案。 表示提供给偏转线圈的电流的数据，表示图案检测操作期间的样品的位置的数据和表示在指定表面积中发现的图案的图像信号被存储在存储器中。 当正在检测样品的特定图案时，电子束用于执行第二图案检测操作。 表示在第二图案检测操作期间提供给偏转线圈的电流的数据，表示样品位置的数据和表示在指定表面积中形成的图案的第二图案检测操作提供的图像信号 已存储在存储器中的数据项。 根据比较的两组数据项之间的差异，计算电子束中的任何漂移。 根据如此计算的漂移，偏转线圈被通电以使电子束分离，使得光束被施加到样品的期望部分上。

公开(公告)号：US4910398A

公开(公告)日：1990-03-20

申请号：US257862

申请日：1988-10-14

申请人： Fumio Komatsu ,  Katsuya Okumura

发明人： Fumio Komatsu ,  Katsuya Okumura

IPC分类号： H01J37/22 ,  G01B11/24 ,  G01B15/00 ,  G01B15/04 ,  G03F7/20 ,  H01J37/244

CPC分类号： G03F7/70483 ,  G01B11/24 ,  G01B15/04

摘要： This method is a method of measuring a taper angle, a thickness or a depth of a semiconductor integrated circuit pattern. Electron beam, light beam or the like is irradiated to a semiconductor integrated circuit pattern provided on a reference plane, thus to form a projected image. The projected image forms a predetermined angle with respect to a reference line set with respect to the reference plane. Then, lengths in a direction of the reference line of the projected images of symmetrical side walls of the pattern are measured to calculate from the ratio of those lengths and angle that the side walls and the reference plane form.

公开(公告)号：US09034467B2

公开(公告)日：2015-05-19

申请号：US13192694

申请日：2011-07-28

申请人： Masamitsu Itoh ,  Katsuya Okumura ,  Taro Inada ,  Jun Watanabe

发明人： Masamitsu Itoh ,  Katsuya Okumura ,  Taro Inada ,  Jun Watanabe

IPC分类号： B32B7/12 ,  B08B7/00 ,  G03F7/20

CPC分类号： B08B7/0028 ,  B05D3/0254 ,  B05D5/00 ,  G03F7/707 ,  G03F7/70925 ,  Y10T428/28 ,  Y10T428/2848

摘要： According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.

摘要翻译： 根据一个实施例，用于清洁EUV曝光装置的光罩卡盘的掩模版卡盘清洁器包括具有要携带到EUV曝光装置的掩模版卡盘的形状的基板，以及形成在其中一个主表面上的粘合剂 基质。

公开(公告)号：US20130313429A1

公开(公告)日：2013-11-28

申请号：US13954425

申请日：2013-07-30

申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

IPC分类号： H01J37/26

CPC分类号： H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

公开(公告)号：US08324726B2

公开(公告)日：2012-12-04

申请号：US11351338

申请日：2006-02-10

申请人： Katsuya Okumura ,  Yoshikazu Takahashi ,  Kazunori Takenouchi

发明人： Katsuya Okumura ,  Yoshikazu Takahashi ,  Kazunori Takenouchi

IPC分类号： H01L23/34

CPC分类号： H01L23/49811 ,  H01L23/49827 ,  H01L24/37 ,  H01L24/40 ,  H01L24/45 ,  H01L24/48 ,  H01L25/0655 ,  H01L25/072 ,  H01L2224/37147 ,  H01L2224/40095 ,  H01L2224/40139 ,  H01L2224/40225 ,  H01L2224/45015 ,  H01L2224/45124 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/83801 ,  H01L2224/84801 ,  H01L2924/00014 ,  H01L2924/01002 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01068 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/351 ,  H05K1/115 ,  H01L2924/00 ,  H01L2924/00015 ,  H01L2224/05599

摘要： A semiconductor device that improves the heat cycle resistance and power cycle resistance of a power module. An electrode member in which copper posts are formed in a plurality of perforations cut in a support made of a ceramic material is soldered onto a side of an IGBT where an emitter electrode is formed. By soldering the copper posts onto the electrode, heat generated in the IGBT is transferred to the electrode member and is radiated. In addition, even if a material of which the IGBT is made and copper differ in thermal expansivity, stress on a soldered interface is reduced and distortion is reduced. This suppresses the appearance of a crack. As a result, the heat cycle resistance and power cycle resistance of a power module can be improved.

摘要翻译： 一种改善功率模块的热循环电阻和功率循环电阻的半导体器件。 在由陶瓷材料制成的支撑体上切割的多个穿孔中形成铜柱的电极部件被焊接到形成有发射极的IGBT的一侧。 通过将铜柱焊接到电极上，在IGBT中产生的热量转移到电极部件并被辐射。 此外，即使制造IGBT的材料和铜的热膨胀性不同，焊接界面上的应力降低，并且变形减小。 这样可以抑制裂纹的出现。 结果，可以提高功率模块的耐热循环电阻和功率循环电阻。

公开(公告)号：US08283755B2

公开(公告)日：2012-10-09

申请号：US13067180

申请日：2011-05-13

申请人： Nobuo Hayasaka ,  Katsuya Okumura ,  Keiichi Sasaki ,  Mie Matsuo

发明人： Nobuo Hayasaka ,  Katsuya Okumura ,  Keiichi Sasaki ,  Mie Matsuo

IPC分类号： H01L29/40

CPC分类号： H01L23/642 ,  H01L21/76898 ,  H01L23/367 ,  H01L23/481 ,  H01L25/0655 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13025 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06572 ,  H01L2225/06589 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/01046 ,  H01L2924/01057 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/10253 ,  H01L2924/13091 ,  H01L2924/15174 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/1532 ,  H01L2924/15331 ,  H01L2924/00

摘要： A multichip semiconductor device is disclosed in which chips are stacked each of which comprises a semiconductor substrate formed on top with circuit components and an interlayer insulating film formed on the top of the semiconductor substrate. At least one of the chips has a connect plug of a metal formed in a through hole that passes through the semiconductor substrate and the interlayer insulating film. The chip with the connect plug is electrically connected with another chip by that connect plug.

摘要翻译： 公开了一种多芯片半导体器件，其中堆叠芯片，每个芯片包括形成在顶部的半导体衬底和电路部件，以及形成在半导体衬底的顶部上的层间绝缘膜。 至少一个芯片具有穿过半导体衬底和层间绝缘膜的通孔中形成的金属的连接插头。 具有连接插头的芯片通过该连接插头与另一个芯片电连接。

公开(公告)号：US08247289B2

公开(公告)日：2012-08-21

申请号：US11508141

申请日：2006-08-23

申请人： Yoshiki Yamanishi ,  Muneo Harada ,  Takahiro Kitano ,  Tatsuzo Kawaguchi ,  Yoshihiro Hirota ,  Kinji Yamada ,  Tomotaka Shinoda ,  Katsuya Okumura ,  Shuichi Kawano

发明人： Yoshiki Yamanishi ,  Muneo Harada ,  Takahiro Kitano ,  Tatsuzo Kawaguchi ,  Yoshihiro Hirota ,  Kinji Yamada ,  Tomotaka Shinoda ,  Katsuya Okumura ,  Shuichi Kawano

IPC分类号： H01L21/8242 ,  H01L21/20 ,  H01L21/00

CPC分类号： H01L23/50 ,  H01G4/228 ,  H01G4/33 ,  H01L23/481 ,  H01L24/81 ,  H01L2224/81801 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01056 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/30105 ,  H05K1/162 ,  H05K3/002 ,  H05K2201/09509 ,  H05K2201/096 ,  H05K2201/10378

摘要： A capacitor having a high quality and a manufacturing method of the same are provided.A capacitor has a lower electrode formed on an oxide film, a dielectric layer formed on the lower electrode, an upper electrode formed so as to face the lower electrode with the dielectric layer between, and an upper electrode formed so as to cover the upper electrode, an opening portion of the upper electrode and an opening portion of the dielectric layer. By forming the upper electrode on the dielectric layer, it is possible to pattern the dielectric layer by using the upper electrode as a mask, and provide a capacitor having a high-quality dielectric layer by preventing impurity diffusion into the dielectric layer. By forming the upper electrode on the dielectric layer, it is possible to prevent the dielectric layer from being exposed to etching liquid, liquid developer, etc.

摘要翻译： 提供了具有高质量的电容器及其制造方法。 电容器具有形成在氧化膜上的下电极，形成在下电极上的电介质层，形成为与电极之间介电层相对的下电极的上电极和形成为覆盖上电极的上电极 ，上电极的开口部分和电介质层的开口部分。 通过在电介质层上形成上电极，可以通过使用上电极作为掩模对电介质层进行图案化，并且通过防止杂质扩散到电介质层中来提供具有高质量电介质层的电容器。 通过在电介质层上形成上部电极，可以防止电介质层暴露于蚀刻液体，液体显影剂等