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    Inspection Apparatus and Associated Method and Monitoring and Control System
    12.
    发明申请
    Inspection Apparatus and Associated Method and Monitoring and Control System 审中-公开
    检验仪器及相关方法及监控系统

    公开(公告)号：US20110231167A1

    公开(公告)日：2011-09-22

    申请号：US13047185

    申请日：2011-03-14

    申请人： Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

    发明人： Hugo Augustinus Joseph CRAMER ,  Patricius Aloysius Jacobus Tinnemans

    IPC分类号： G06F17/10 ,  G03B27/54

    CPC分类号： G03B27/52 ,  G03F7/70625 ,  G03F7/70641

    摘要： A method, a lithographic apparatus, and a computer-readable medium provide a model of a metrology tool to determine a measurement error and/or covariance of particular parameters, such as the critical dimension and the sidewall angle, of a number of targets, such as gratings. The model can include at least one measurement error source. The method can include using a metrology tool to measure each target and using the model to determine the measurement error of the measured parameters of the particular target when measured by said metrology tool. The value of the measured parameter along with the corresponding measurement error is then determined in the metrology tool output for each particular target, and can be used in exposure focus and dose control in a lithographic process.

    摘要翻译： 方法，光刻设备和计算机可读介质提供计量工具的模型，以确定多个目标的特定参数（例如临界尺寸和侧壁角）的测量误差和/或协方差，例如 作为光栅。 该模型可以包含至少一个测量误差源。 该方法可以包括使用计量工具来测量每个目标并且使用该模型来确定由所述计量工具测量时特定目标的测量参数的测量误差。 然后在每个特定目标的计量工具输出中确定测量参数的值以及相应的测量误差，并可用于光刻过程中的曝光聚焦和剂量控制。

    Uniform background radiation in maskless lithography
    13.
    发明授权
    Uniform background radiation in maskless lithography 有权
    无掩模光刻中的均匀背景辐射

    公开(公告)号：US08009270B2

    公开(公告)日：2011-08-30

    申请号：US11689926

    申请日：2007-03-22

    申请人： Paul Antoon Cyriel Desmedt ,  Patricius Aloysius Jacobus Tinnemans ,  Minne Cuperus

    发明人： Paul Antoon Cyriel Desmedt ,  Patricius Aloysius Jacobus Tinnemans ,  Minne Cuperus

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70475 ,  G03F7/70283 ,  G03F7/70291

    摘要： A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.

    摘要翻译： 一种器件制造方法，包括将图案应用于独立可控元件的多个阵列，使得它们调制辐射束，并将经调制的辐射束投影到衬底上。 应用于独立可控元件的阵列的图案被布置成使得预定数量的背景辐射被包括在调制的辐射束中。 背景辐射的预定量对于阵列上的不同位置是不同的。

    Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD
    16.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 有权
    利用FPD的多字典压缩方法的平版印刷设备和器件制造方法

    公开(公告)号：US07826672B2

    公开(公告)日：2010-11-02

    申请号：US12554083

    申请日：2009-09-04

    申请人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    发明人： Lambertus Gerardus Maria Kessels ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    IPC分类号： G06K9/46 ,  H04N1/32 ,  H03M7/00

    CPC分类号： G03F7/70291 ,  G03F7/70508

    摘要： A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.

    摘要翻译： 提供一种包括具有发射部分的设备，存储器和字典解压缩器的系统。 具有发射部分的装置被配置为产生图案化的束。 存储器被配置为存储要由图案化的波束在表面上形成的包括两组重复图案特征的所请求的剂量图案的压缩表示。 字典解压缩器至少部分地解压缩压缩表示。 字典解压缩器包括第一字典存储器，其被配置为存储对应于两组重复图案特征的第一组的图案数据，以及第二字典存储器，其被配置为存储对应于两组重复图案特征的第二组的图案数据。 第一组中的重复图案特征具有与第二组中的重复图案特征相比具有一个或多个不同的特征。 还提供了相关方法。

    Lithographic apparatus and device manufacturing method utilizing data filtering
    18.
    发明授权
    Lithographic apparatus and device manufacturing method utilizing data filtering 有权
    利用数据滤波的平版印刷设备和器件制造方法

    公开(公告)号：US07403265B2

    公开(公告)日：2008-07-22

    申请号：US11093259

    申请日：2005-03-30

    申请人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    发明人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32

    CPC分类号： G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    摘要： An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.

    摘要翻译： 使用装置和方法在基板上形成图案。 包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 在各种示例中，还可以使用用于图案锐化，图像对数斜率控制和/或CD偏置的滤波器。

    Control system for pattern generator in maskless lithography
    19.
    发明申请
    Control system for pattern generator in maskless lithography 审中-公开
    无掩模光刻中图案发生器的控制系统

    公开(公告)号：US20080002174A1

    公开(公告)日：2008-01-03

    申请号：US11478298

    申请日：2006-06-30

    申请人： Patricius Aloysius Jacobus Tinnemans

    发明人： Patricius Aloysius Jacobus Tinnemans

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70291

    摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, and a control system. The illumination system is configured to condition a radiation beam. The array of individually controllable elements is capable of modulating the cross-section of the radiation beam. The projection system is configured to project the modulated radiation beam onto a target portion of a substrate. The control system is arranged to send control signals, which control the array of individually controllable elements, such that a desired pattern is projected onto the substrate. The control system calculates the control signals using a bandwidth limited base function or a combination of more than one bandwidth limited base functions.

    摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统和控制系统。 照明系统被配置为调节辐射束。 独立可控元件的阵列能够调制辐射束的横截面。 投影系统被配置为将调制的辐射束投影到基板的目标部分上。 控制系统被布置成发送控制信号，其控制单独可控元件的阵列，使得期望的图案投影到基板上。 控制系统使用带宽限制的基本功能或多于一个带宽限制的基本功能的组合来计算控制信号。

    Lithographic apparatus and method
    20.
    发明申请
    Lithographic apparatus and method 有权
    平版印刷设备和方法

    公开(公告)号：US20070296942A1

    公开(公告)日：2007-12-27

    申请号：US11471727

    申请日：2006-06-21

    申请人： Patricius Aloysius Jacobus Tinnemans

    发明人： Patricius Aloysius Jacobus Tinnemans

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70433 ,  G03F7/70291 ,  G03F7/705 ,  G03F9/7026

    摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, and a control system. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The control system calculates a pattern that is to be formed on the array of individually controllable elements. The calculation includes an adjustment of the pattern, such that its focal plane is shifted in response to a measured separation between the target portion of the substrate and a focal plane of the projection system.

    摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，投影系统和控制系统。 照明系统调节辐射束。 独立可控元件的阵列调制辐射束的横截面。 投影系统将调制的辐射束投影到基板的目标部分上。 控制系统计算要在单独可控元件的阵列上形成的图案。 该计算包括对图案的调整，使得其焦平面响应于基板的目标部分和投影系统的焦平面之间的测量间隔而偏移。