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11.发明授权Phase shift photomask, phase shift photomask blank, and process for fabricating them 失效相移光掩模，相移光掩模坯料及其制造工艺
公开(公告)号：US5702847A
公开(公告)日：1997-12-30
申请号：US453079
申请日：1995-05-30
摘要： The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of forming phase shift layer 23 all over the surface of one side of transparent substrate 21, and immersing only the peripheral region of substrate 21 in etching solution 25 to etch away the peripheral region of phase shift layer 23, whereby phase shift layer 27 is confined within an area smaller than that of substrate 21.
摘要翻译： 本发明涉及一种相移光掩模，其中通过相对简单的程序除去相移层的外围区域部分，并且没有或很少缺陷，并且便宜，其空白和其制造方法。 该方法包括在透明基板21的整个表面的整个表面上形成相移层23，并且仅将基板21的周边区域浸入蚀刻溶液25中以蚀刻掉相移层23的周边区域，由此相位 位移层27被限制在比衬底21的面积小的区域内。
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公开(公告)号：US4592046A
公开(公告)日：1986-05-27
申请号：US595668
申请日：1984-04-02
CPC分类号： H04Q11/04
摘要： A click tone removing system for a time division switching system which performs switching of speech channels by a highway switch inserted in a highway. When a hook information detector and a dial information detector detect hook information and a dial information, respectively, delivery of a PCM speech sending signal to the highway is prevented by a blocking function for a fixed period of time, so that the highway is controlled to switch the speech channel, thereby removing a click tone generated by dialing. A subscriber's circuit of an exchange, which changes over a speech sending highway and a speech receiving highway by means of a highway switch, is characterized by the provision of an A/D converter for digitizing a speech sending signal to a digitized speech sending signal sent out to the speech sending highway, a D/A converter for converting a digitized speech receiving signal applied from the speech receiving highway into an analog signal, a gate for gating the input signal to the D/A converter, and a control circuit for controlling the gate, so that during real time processing the speech receiving signal highway is interrupted by opening and closing the gate without controling the higway switch.
摘要翻译： 一种用于时分切换系统的点击音消除系统，其通过插入高速公路的高速公路开关来执行语音信道的切换。 当挂钩信息检测器和拨号信息检测器检测到挂钩信息和拨号信息时，分别通过阻塞功能在一段固定的时间段内将PCM语音发送信号发送到高速公路，使得公路被控制到 切换语音通道，从而消除通过拨号产生的点击音。 通过公路交换机在语音发送高速公路和语音接收公路上改变的交换机的用户电路的特征在于，提供用于将语音发送信号数字化到发送的数字化语音发送信号的A / D转换器 用于将从语音接收公路应用的数字化语音接收信号转换成模拟信号的D / A转换器，用于将输入信号选通到D / A转换器的门，以及用于控制的控制电路 门，使得在实时处理期间，通过打开和关闭门而中断语音接收信号高速公路，而不控制高速开关。
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公开(公告)号：US08246900B2
公开(公告)日：2012-08-21
申请号：US12440034
申请日：2007-08-31
申请人： Shigeru Kasai , Hiroyuki Miyashita , Masatake Yoneda , Tomohiro Suzuki , Sumi Tanaka , Masamichi Nomura , Miwa Shimizu
发明人： Shigeru Kasai , Hiroyuki Miyashita , Masatake Yoneda , Tomohiro Suzuki , Sumi Tanaka , Masamichi Nomura , Miwa Shimizu
CPC分类号： H01L21/67115 , H01L21/67109 , H01L31/1864 , Y02E10/50 , Y02P70/521
摘要： Provided is an annealing apparatus, which is free from a problem of reduced light energy efficiency resulted by the reduction of light emission amount due to a heat generation and capable of maintaining stable performance. The apparatus includes: a processing chamber 1 for accommodating a wafer W; heating sources 17a and 17b including LEDs 33 and facing the surface of the wafer W to irradiate light on the wafer W; light-transmitting members 18a and 18b arranged in alignment with the heating sources 17a and 17b to transmit the light emitted from the LEDs 33; cooling members 4a and 4b supporting the light-transmitting members 18a and 18b at opposite side to the processing chamber 1 to make direct contact with the heating sources 17a and 17b and made of a material of high thermal conductivity; and a cooling mechanism for cooling the cooling members 4a and 4b with a coolant.
摘要翻译： 提供一种退火装置，其不会由于发热而导致的发光量的降低而导致光能效率降低的问题，并且能够保持稳定的性能。 该装置包括：用于容纳晶片W的处理室1; 加热源17a和17b包括LED33并面向晶片W的表面以将光照射在晶片W上; 与发热源17a和17b对准布置的透光部件18a和18b，以透射从LED33发出的光; 在与处理室1相反的一侧支撑透光部件18a和18b的冷却部件4a和4b与加热源17a和17b直接接触并由导热性高的材料制成; 以及用冷却剂冷却冷却部件4a，4b的冷却机构。
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公开(公告)号：US20110033175A1
公开(公告)日：2011-02-10
申请号：US12864792
申请日：2009-01-19
IPC分类号： F27D11/12
CPC分类号： H01L21/67109 , H01L21/268 , H01L21/324 , H01L21/67115
摘要： An annealing apparatus includes heating sources 17a and 17b provided to face a wafer W, the heating sources 17a and 17b having LEDs 33 emitting lights to the wafer; light-transmitting members 18a and 18b for transmitting the lights emitted from the LEDs 33; and cooling members 4a and 4b made of aluminum and provided to directly contact with the heating sources 17a and 17b, respectively. The heating sources 17a and 17b include a plurality of LED arrays having supporters 32 made of AlN, each having one surface on which the LEDs 33 are adhered by using a silver paste 56; and other surface on which thermal diffusion members 50 made of copper are adhered by using a solder 57. The LED arrays 34 are fixed to the cooling member 4a(4b) by using screws via a silicon grease.
摘要翻译： 退火装置包括设置成面向晶片W的加热源17a和17b，具有向该晶片发光的LED 33的加热源17a和17b; 用于透射从LED 33发射的光的透光构件18a和18b; 以及由铝制成并分别与加热源17a和17b直接接触的冷却构件4a和4b。 加热源17a和17b包括多个LED阵列，其具有由AlN制成的支撑体32，每个具有一个表面，其上通过使用银膏56粘附LED 33; 和由铜制成的热扩散构件50的其他表面通过使用焊料57粘附在其上。LED阵列34通过使用经由硅油脂的螺钉固定到冷却构件4a（4b）。
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15.发明授权Differential comparator, and pipeline type A/D converter equipped with the same 有权差分比较器和管道型A / D转换器配备相同公开(公告)号：US07817077B2
公开(公告)日：2010-10-19
申请号：US12404835
申请日：2009-03-16
申请人： Hiroyuki Miyashita
发明人： Hiroyuki Miyashita
IPC分类号： H03M1/38
CPC分类号： H03F3/45183 , H03F2203/45702 , H03F2203/45726 , H03K3/356139
摘要： In some examples, a differential comparator includes a differential amplifier configured to output differential output signals, a first switch portion configured to input the differential output signals from the differential amplifier and output the differential output signals from output terminals while alternatively changing over the output terminals, a latch portion configured to update and latch the differential output signals from the output terminals of the first switch portion, and a second switch portion configured to input output signals from the latch portion and output the latched output signals. The first switch portion and the second switch portion are changed over complementarily so that the differential output signals from the differential amplifier are always outputted from the same first and second output terminals of the second switch portion respectively.
摘要翻译： 在一些示例中，差分比较器包括：差分放大器，被配置为输出差分输出信号;第一开关部分，被配置为从差分放大器输入差分输出信号，并且在输出端子交替地切换时输出来自输出端子的差分输出信号， 闩锁部分，被配置为更新并锁存来自第一开关部分的输出端的差分输出信号;以及第二开关部分，被配置为输入来自锁存部分的输出信号并输出锁存的输出信号。 第一开关部分和第二开关部分互补地改变，使得来自差分放大器的差分输出信号总是分别从第二开关部分的相同的第一和第二输出端子输出。
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16.发明授权
公开(公告)号：US5614336A
公开(公告)日：1997-03-25
申请号：US337136
申请日：1994-11-10
摘要： The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well.For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coated spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.
摘要翻译： 本发明特别涉及一种用于生产含相移层的光掩模的方法，其可以通过减少或限制数量的步骤产生相移光掩模，以减少或限制移相器图案缺陷或其它缺陷的发生，并以较低的成本 好。 例如，使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料，以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过电子束曝光硬件等发出的能量束，直接在涂覆的旋涂玻璃层上绘制图案，在用能量束进行图案绘制之后，用溶剂对基板进行显影，以洗涤过量的自旋 - 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后，烘烤后显影衬底以形成移相器图案。
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公开(公告)号：US20070292598A1
公开(公告)日：2007-12-20
申请号：US11667945
申请日：2006-04-04
申请人： Kunihiro Tada , Hiroyuki Miyashita , Isao Gunji
发明人： Kunihiro Tada , Hiroyuki Miyashita , Isao Gunji
IPC分类号： C23C16/46 , H01L21/02 , H01L21/285
CPC分类号： C23C16/46 , C23C16/52 , H01L21/67248 , H01L22/10
摘要： Disclosed is a substrate processing method wherein the infrared absorptance or infrared transmittance of a substrate to be processed is measured in advance, and the substrate is processed according to the measured value while independently controlling temperatures at least in a first region located in the central part of the substrate and in a second region around the first region using temperature control means which are respectively provided for the first region and the second region and can be controlled independently from each other.
摘要翻译： 公开了一种基板处理方法，其中预先测量待处理的基板的红外吸收率或红外线透射率，并且根据测量值对基板进行处理，同时至少在位于中心部分的第一区域中独立地控制温度 基板和在第一区域周围的第二区域中，使用分别设置用于第一区域和第二区域并且可以彼此独立地控制的温度控制装置。
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公开(公告)号：US20070004643A1
公开(公告)日：2007-01-04
申请号：US10582015
申请日：2004-12-08
CPC分类号： C07D213/30 , C07C271/22 , C07C2601/02 , C07C2601/04 , C07C2602/08 , C07D295/215 , C07D307/20 , C07D309/12
摘要： The present invention provides a compound represented by the formula (I): (wherein R1 is a lower alkyl substituted by a lower alkoxy or a heterocyclic group, or a heterocyclic group; R2 is a lower alkyl optionally substituted by a phenyl; and R3 is a lower alkyl optionally substituted by a halogen, a lower alkoxy or a phenyl, or a fused polycyclic hydrocarbon group), which is well absorbed orally, exhibits durability of good blood level and has potent calpain inhibitory activity.
摘要翻译： 本发明提供由式（I）表示的化合物：其中R 1是被低级烷氧基或杂环基或杂环基取代的低级烷基; R 2， / SUP>是任选被苯基取代的低级烷基; R 3是任选被卤素，低级烷氧基或苯基或稠合多环烃基取代的低级烷基，其是 良好的口腔吸收，具有良好的血液水平的耐久性，并具有强大的钙蛋白酶抑制活性。
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公开(公告)号：US5723234A
公开(公告)日：1998-03-03
申请号：US608065
申请日：1996-02-28
IPC分类号： G03F1/32 , G03F1/68 , G03F1/80 , G03F7/36 , H01L21/027 , H01L21/302 , H01L21/3065 , G03F9/00
摘要： A phase shift photomask capable of being produced by dry etching with adequate in-plane uniformity of pattern dimension even if there is a large difference in exposed area ratio between different areas on the mask. In a phase shift photomask having an area provided with a phase shift layer which practically shifts the phase relative to another area, a dummy etching pattern (13) for dry etch rate correction is provided in an area other than a pattern exposure area (9 and 10), or a dummy etching pattern for dry etch rate correction having a size less than the limit of resolution attained by transfer is provided in the pattern exposure area, thereby reducing the etch rate nonuniformity due to the pattern density variation in the process of dry etching the phase shift photomask, and thus providing a phase shift photomask of high accuracy.
摘要翻译： 即使在掩模上的不同区域之间的曝光面积比存在很大差异的情况下，能够通过干蚀刻产生具有足够的图案尺寸的面内均匀性的相移光掩模。 在具有实质上相对于另一区域偏移的相移层的区域的相移光掩模中，在除了图案曝光区域（9和9）之外的区域中提供用于干蚀刻速率校正的伪蚀刻图案（13） 或者在图案曝光区域中提供具有小于通过转印获得的分辨率的分辨率的干蚀刻速率校正的虚拟蚀刻图案，从而降低由于干燥过程中图案密度变化引起的蚀刻速率不均匀性 蚀刻相移光掩模，从而提供高精度的相移光掩模。
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20.发明授权
公开(公告)号：US5688617A
公开(公告)日：1997-11-18
申请号：US644856
申请日：1996-05-09
摘要： The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well. For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coaxed-spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.
摘要翻译： 本发明特别涉及一种用于生产含相移层的光掩模的方法，其可以通过减少或限制数量的步骤产生相移光掩模，以减少或限制移相器图案缺陷或其它缺陷的发生，并以较低的成本 好。 例如，使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料，以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过从电子束曝光硬件等发出的能量束，在哄骗的旋涂玻璃层上直接绘制图案，并且在用能量束进行图案绘制之后，用溶剂对基板进行显影，以洗涤过度旋转 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后，烘烤后显影衬底以形成移相器图案。
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