Phase shift photomask, phase shift photomask blank, and process for
fabricating them
    1.
    发明授权
    Phase shift photomask, phase shift photomask blank, and process for fabricating them 失效
    相移光掩模,相移光掩模坯料及其制造工艺

    公开(公告)号:US5702847A

    公开(公告)日:1997-12-30

    申请号:US453079

    申请日:1995-05-30

    IPC分类号: G03F1/00 G03F9/00

    摘要: The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of forming phase shift layer 23 all over the surface of one side of transparent substrate 21, and immersing only the peripheral region of substrate 21 in etching solution 25 to etch away the peripheral region of phase shift layer 23, whereby phase shift layer 27 is confined within an area smaller than that of substrate 21.

    摘要翻译: 本发明涉及一种相移光掩模,其中通过相对简单的程序除去相移层的外围区域部分,并且没有或很少缺陷,并且便宜,其空白和其制造方法。 该方法包括在透明基板21的整个表面的整个表面上形成相移层23,并且仅将基板21的周边区域浸入蚀刻溶液25中以蚀刻掉相移层23的周边区域,由此相位 位移层27被限制在比衬底21的面积小的区域内。

    Halftone phase shift photomask comprising a single layer of halftone
light blocking and phase shifting
    2.
    发明授权
    Halftone phase shift photomask comprising a single layer of halftone light blocking and phase shifting 失效
    半色调相移光掩模包括单层半色调遮光和相移

    公开(公告)号:US5604060A

    公开(公告)日:1997-02-18

    申请号:US357350

    申请日:1994-12-16

    IPC分类号: G03F1/32 G03F9/00

    CPC分类号: G03F1/32

    摘要: The invention provides a halftone phase shift photomask that is of much more simplified structure and so can be fabricated much more easily, which comprises a transparent substrate 10 and a single halftone light-blocking and phase shift layer 11 that is formed on the surface thereof according to a predetermined pattern and is made up of a material of homogeneous composition, characterized in that:said single halftone light-blocking and phase shift layer has a film thickness d that is virtually equal to a value defined byd=.lambda./{2(n-1)}where .lambda. is the wavelength at which the photomask is used, and n is the index of refraction of the single layer, or that is an odd-numbered multiple of said value, and has a transmittance lying substantially in the range of 5 to 30%. The layer 11 may be made up of any of CrO.sub.x, CrN.sub.x, CrO.sub.x N.sub.y and CrO.sub.x N.sub.y C.sub.z.

    摘要翻译: 本发明提供了一种半色调相移光掩模,其结构非常简化,因此可以更容易地制造,其包括透明基板10和在其表面上形成的单个半色调光阻挡和相移层11,根据 由均匀组成的材料构成,其特征在于:所述单个半色调遮光和相移层的膜厚d实质上等于由d =λ/ {2( n-1)}其中λ是使用光掩模的波长,n是单层的折射率,或者是所述值的奇数倍,并且具有基本上在该范围内的透射率 为5〜30%。 层11可以由CrO x,CrN x,CrO x N y和CrO x N y C z中的任一种构成。

    Phase shift layer-containing photomask, and its production and correction
    3.
    发明授权
    Phase shift layer-containing photomask, and its production and correction 失效
    含相移层的光掩模及其生产和校正

    公开(公告)号:US5614336A

    公开(公告)日:1997-03-25

    申请号:US337136

    申请日:1994-11-10

    IPC分类号: G03F1/00 G03F9/00

    摘要: The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well.For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coated spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.

    摘要翻译: 本发明特别涉及一种用于生产含相移层的光掩模的方法,其可以通过减少或限制数量的步骤产生相移光掩模,以减少或限制移相器图案缺陷或其它缺陷的发生,并以较低的成本 好。 例如,使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料,以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过电子束曝光硬件等发出的能量束,直接在涂覆的旋涂玻璃层上绘制图案,在用能量束进行图案绘制之后,用溶剂对基板进行显影,以洗涤过量的自旋 - 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后,烘烤后显影衬底以形成移相器图案。

    Phase shift layer-containing photomask, and its production and correction
    4.
    发明授权
    Phase shift layer-containing photomask, and its production and correction 失效
    含相移层的光掩模及其生产和校正

    公开(公告)号:US5688617A

    公开(公告)日:1997-11-18

    申请号:US644856

    申请日:1996-05-09

    IPC分类号: G03F1/00 G03F9/00

    摘要: The present invention relates particularly to a process for producing phase shift layer-containing photomasks, which can produce phase shift photomasks through a reduced or limited number of steps to reduce or limit the incidence of phase shifter pattern deficiencies or other defects and at lower costs as well. For instance, a photomask blank of the structure that a substrate is provided thereon with an electrically conductive layer and a light-shielding thin film in this order is used to coat a starting material for spin-on-glass uniformly on a light-shielding pattern formed thereon. A pattern is directly drawn on the coaxed-spin-on-glass layer with energy beams emanating from electron beam exposure hardware, etc., and the substrate is developed with a solvent after pattern drawing with energy beams to wash off an excessive spin-on-glass portion other than the spin-on-glass layer irradiated with the ionizing radiations. Finally, the post-development substrate is baked to form a phase shifter pattern.

    摘要翻译: 本发明特别涉及一种用于生产含相移层的光掩模的方法,其可以通过减少或限制数量的步骤产生相移光掩模,以减少或限制移相器图案缺陷或其它缺陷的发生,并以较低的成本 好。 例如,使用具有依次设置有导电层和遮光薄膜的基板的结构的光掩模坯料,以均匀地在遮光图案上涂布旋涂玻璃原料 形成在其上。 通过从电子束曝光硬件等发出的能量束,在哄骗的旋涂玻璃层上直接绘制图案,并且在用能量束进行图案绘制之后,用溶剂对基板进行显影,以洗涤过度旋转 除了用电离辐射照射的旋涂玻璃层以外的玻璃部分。 最后,烘烤后显影衬底以形成移相器图案。

    Glare-proofing optical laminate
    5.
    发明授权
    Glare-proofing optical laminate 有权
    防眩光学层压板

    公开(公告)号:US08999463B2

    公开(公告)日:2015-04-07

    申请号:US11817818

    申请日:2006-03-29

    IPC分类号: C09K19/00 G02B5/02 G02B5/30

    摘要: An anti-dazzling laminate made of an optical laminate including a light transparent base material and an anti-dazzling layer having a concavoconvex shape provided on the material. The laminate simultaneously satisfies formulae: 0≦G100≦15 (I), 0.1≦Hs≦5.0 (II), 0.3≦Rz≦1.8 (III) wherein G100 represents a scintillation value which is a standard deviation of a variation in brightness distribution at a resolution of 100 ppi measured on the surface of the laminate; Hs represents the surface haze value of the laminate; and Rz represents the average roughness of the concavoconvex shape of the anti-dazzling layer.

    摘要翻译: 由光学层压制品制成的防光泽层压材料,该层压材料包括透明基材和具有凹凸形状的抗眩光层。 层压板同时满足公式:0≦̸ G100≦̸ 15(I),0.1≦̸ Hs≦̸ 5.0(II),0.3≦̸ Rz≦̸ 1.8(III)其中G100表示​​闪烁值,其是亮度变化的标准偏差 在层压板的表面上测量的分辨率为100ppi的分布; Hs表示层压板的表面雾度值; Rz表示防炫目层的凹凸形状的平均粗糙度。

    Method for producing optically active fluorine-containing carbonyl-ene product
    9.
    发明授权
    Method for producing optically active fluorine-containing carbonyl-ene product 有权
    光学活性含氟羰基产物的制备方法

    公开(公告)号:US08278479B2

    公开(公告)日:2012-10-02

    申请号:US12519959

    申请日:2007-12-18

    IPC分类号: C07C69/732

    摘要: An optically active, fluorine-containing carbonyl-ene product is produced by reacting a fluorine-containing α-ketoester with an alkene in the presence of a transition metal complex having an optically active ligand. There are Mode 1 of conducting this reaction in the absence of reaction solvent, Mode 2 of conducting this reaction in a solvent that is low in relative dielectric constant, and Mode 3 of conducting this reaction in a halogenated hydrocarbon-series solvent. In each of these three modes, it is possible to produce the optically active, fluorine-containing carbonyl-ene product with low cost.

    摘要翻译: 通过在具有光学活性配体的过渡金属络合物的存在下使含氟α-酮酯与烯烃反应来制备光学活性的含氟羰基产物。 在没有反应溶剂的情况下进行该反应的方式1,在相对介电常数低的溶剂中进行该反应的方式2,以及在卤代烃系溶剂中进行该反应的方式3。 在这三种模式中的每一种中,可以以低成本制造光学活性的含氟羰基产物。

    OPTICAL MULTILAYER BODY, POLARIZATION PLATE USING SAME, AND IMAGE DISPLAY
    10.
    发明申请
    OPTICAL MULTILAYER BODY, POLARIZATION PLATE USING SAME, AND IMAGE DISPLAY 有权
    光学多层体,使用相同的偏光板和图像显示

    公开(公告)号:US20120002397A1

    公开(公告)日:2012-01-05

    申请号:US13230961

    申请日:2011-09-13

    IPC分类号: G09F13/04 G02B5/02 G02B5/30

    摘要: An optical laminate is provided which has anti-dazzling properties and can realize excellent glare preventive properties and black reproducibility (gradation rendering of black at low brightness). The optical laminate includes a light transparent base material and an anti-dazzling layer or a light diffusion layer provided on the light transparent base material, wherein the outermost surface of the anti-dazzling layer or light diffusion layer has a concavoconvex surface. The anti-dazzling layer satisfies the requirements that Sm is not less than 100 μm and not more than 600 μm, θa is not less than 0.1 degree and not more than 1.2 degrees, and Rz is more than 0.2 μm and not more than 1 μm, wherein Sm represents the average spacing of concavoconvexes in the anti-dazzling layer, θa represents the average inclination angle of the concavoconvexes, and Rz represents the average roughness of the concavoconvexes.

    摘要翻译: 提供具有防炫目性能并且可以实现优异的防眩性和黑色再现性(低亮度下的黑色的渐变渲染)的光学层叠体。 光学层叠体包括透光基材和防透光层或设置在透光基材上的光漫射层,其中抗炫目层或光扩散层的最外表面具有凹凸表面。 抗眩光层满足Sm为100μm以上且600μm以下的要求,a为0.1度以上1.2以下,Rz为0.2μm以上, 1μm,其中Sm表示抗眩光层中的凹凸的平均间距,a表示凹凸的平均倾斜角,Rz表示凹凸的平均粗糙度。