公开(公告)号：US20070197146A1

公开(公告)日：2007-08-23

申请号：US11682257

申请日：2007-03-05

申请人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

发明人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

IPC分类号： B24B29/00 ,  B24B5/00 ,  B24B21/00

CPC分类号： B24B37/32

摘要： A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have thick and thin subportions to increase the flexibility of the lower ring.

摘要翻译： 描述了具有下环和上环的两部分保持环。 在化学机械抛光期间，下环接触抛光表面。 下环的上表面和下表面具有厚而薄的子部分，以增加下环的柔性。

公开(公告)号：US20070082589A1

公开(公告)日：2007-04-12

申请号：US11245867

申请日：2005-10-06

申请人： Steven Zuniga ,  Hung Chen ,  Thomas Brezoczky ,  Steven Mear

发明人： Steven Zuniga ,  Hung Chen ,  Thomas Brezoczky ,  Steven Mear

IPC分类号： B24B29/00

CPC分类号： B24B37/30 ,  B24B49/16

摘要： A system for chemical mechanical polishing having a carrier head with pressurizeable chambers that can be configured into pressure zones is described. The system includes a carrier head with a membrane for contacting a substrate during polishing. Pressurizeable chambers behind the membrane are in communication with pressure inputs. The pressure inputs can each supply a different pressure to the pressurizeable chambers. Some of the pressurizeable chambers can be in communication with more than one pressure input. Zones of pressure can be arranged, where each zone includes one or more pressurizeable chambers. The zones can be configurable by altering the pressurizeable chambers that make up each zone.

摘要翻译： 描述了一种用于化学机械抛光的系统，该系统具有可被构造成压力区的具有可加压室的载体头。 该系统包括具有用于在抛光期间接触基底的膜的载体头部。 膜后面的可加压室与压力输入连通。 压力输入可以为可加压室提供不同的压力。 一些可加压室可以与多于一个的压力输入连通。 可以布置压力区域，其中每个区域包括一个或多个可加压室。 这些区域可以通过改变构成每个区域的可加压室来配置。

公开(公告)号：US20060154580A1

公开(公告)日：2006-07-13

申请号：US11321006

申请日：2005-12-28

申请人： Hung Chen ,  Jeonghoon Oh ,  Steven Zuniga

发明人： Hung Chen ,  Jeonghoon Oh ,  Steven Zuniga

IPC分类号： B24B29/00

CPC分类号： B24B37/30

摘要： A flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus has a central portion with an outer surface providing a substrate receiving surface, a perimeter portion for connecting the central portion to a base of the carrier head, and at least one flap extending from an inner surface of the central portion. The flap includes a laterally extending first section and a vertically extending second section connecting the laterally extending first section to the central portion.

摘要翻译： 用于与基底化学机械抛光装置的载体头一起使用的柔性膜具有中心部分，其外表面提供基底接收表面，周边部分用于将中心部分连接到载体头部的基部，以及至少一个 翼片从中心部分的内表面延伸。 翼片包括横向延伸的第一部分和将横向延伸的第一部分连接到中心部分的垂直延伸的第二部分。

公开(公告)号：US20060125813A1

公开(公告)日：2006-06-15

申请号：US11317176

申请日：2005-12-23

申请人： Sz Chen ,  Long Chen ,  Hung Chen ,  Tsau Hsieh

发明人： Sz Chen ,  Long Chen ,  Hung Chen ,  Tsau Hsieh

IPC分类号： G09G5/00

CPC分类号： G09G3/3648 ,  G09G3/3688 ,  G09G2310/061 ,  G09G2320/0252 ,  G09G2320/0261

摘要： An active matrix LCD (200) includes: a plurality of scanning lines (23) that are parallel to each other and that each extend along a first direction; a plurality of signal lines (24) that are parallel to each other and that each extend along a second direction orthogonal to the first direction; a plurality of thin film transistors (TFTs) each provided in the vicinity of a respective point of intersection of the scanning lines and the signal lines; a plurality of scanning line driving circuits (21) for providing a plurality of scanning signal groups to the scanning lines, each scanning signal group including an image scanning signal and a black-inserting scanning signal; a plurality of signal line driving circuits (22) for providing gradation voltage data to the signal lines; and a black-inserting circuit (28) for providing black-inserting signals corresponding to black image data to the signal lines.

摘要翻译： 有源矩阵LCD（200）包括：多条扫描线（23），它们彼此平行并且分别沿第一方向延伸; 多个信号线（24），其彼此平行并且各自沿着与所述第一方向正交的第二方向延伸; 多个薄膜晶体管（TFT），其分别设置在扫描线和信号线的相应交点附近; 多个扫描线驱动电路（21），用于向扫描线提供多个扫描信号组，每个扫描信号组包括图像扫描信号和黑插入扫描信号; 多个用于向信号线提供灰度电压数据的信号线驱动电路（22）; 以及用于向信号线提供与黑色图像数据相对应的黑插入信号的黑插入电路（28）。

公开(公告)号：US20060001492A1

公开(公告)日：2006-01-05

申请号：US10882215

申请日：2004-07-02

申请人： Sheng Chang ,  Jia Chen ,  Cherng Liu ,  Hung Chen ,  Shu Tang ,  Albert Chen

发明人： Sheng Chang ,  Jia Chen ,  Cherng Liu ,  Hung Chen ,  Shu Tang ,  Albert Chen

IPC分类号： H03F3/191

CPC分类号： H03F3/191 ,  H03F2200/147 ,  H03F2200/222 ,  H03F2200/372

摘要： The present invention discloses a bandpass amplifier having gain and bandpass performance. The bandpass amplifier includes an input match unit for matching the gain of the amplifier and having a first filter response; a first bias unit electrically connected to the input match unit for driving the first terminal of the amplifier and having a first high pass filter response; a gain stage electrically connected to the first bias unit for providing the flat gain of the amplifier; a second bias unit electrically connected to the gain stage for driving the second terminal of the amplifier and having a second high pass filter response; and an output match unit electrically connected to the second bias unit for matching the gain of the amplifier and having a second filter response.

摘要翻译： 本发明公开了具有增益和带通性能的带通放大器。 带通放大器包括用于匹配放大器的增益并具有第一滤波器响应的输入匹配单元; 电连接到输入匹配单元的第一偏置单元，用于驱动放大器的第一端并具有第一高通滤波器响应; 增益级，电连接到第一偏置单元，用于提供放大器的平坦增益; 电连接到增益级的第二偏置单元，用于驱动放大器的第二端并具有第二高通滤波器响应; 以及输出匹配单元，电连接到第二偏置单元，用于匹配放大器的增益并具有第二滤波器响应。

公开(公告)号：US20050117657A1

公开(公告)日：2005-06-02

申请号：US10724742

申请日：2003-12-02

申请人： Hung Chen

发明人： Hung Chen

IPC分类号： H04K1/10 ,  H04L1/20 ,  H04L25/02

CPC分类号： H04L1/20 ,  H04L25/025

摘要： A channel noise estimating method and apparatus applied to a multi-carrier system are disclosed, where data symbols received by a receiving unit are applied to reconstruct the original transmitted data symbols. The reconstructing process is performed by either a soft decision or a hard decision technique to simulate the original transmitted data symbols. These simulated transmitted data symbols in company with the received data symbols are further applied to calculate the channel noise based on an LMS algorithm.

摘要翻译： 公开了一种应用于多载波系统的信道噪声估计方法和装置，其中应用由接收单元接收的数据符号以重构原始发送的数据符号。 重建过程通过软判决或硬判决技术来执行，以模拟原始发送的数据符号。 这些仿真发送的数据符号与接收到的数据符号一起进一步应用于基于LMS算法来计算信道噪声。

公开(公告)号：US06540594B2

公开(公告)日：2003-04-01

申请号：US10071745

申请日：2002-02-08

申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

IPC分类号： B24B500

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

公开(公告)号：US06277009B1

公开(公告)日：2001-08-21

申请号：US09478943

申请日：2000-01-06

申请人： Hung Chen ,  Steven M. Zuniga

发明人： Hung Chen ,  Steven M. Zuniga

IPC分类号： B24B722

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head includes a compliant backing member with a plurality of cells which contact an upper surface of the flexible membrane to improve vacuum-chucking of the substrate.

摘要翻译： 用于化学机械抛光装置的载体头包括柔性膜，其下表面提供基板接收表面。 承载头包括具有多个单元的柔性背衬构件，所述多个单元接触柔性膜的上表面以改善基板的真空吸附。

公开(公告)号：US20130283556A1

公开(公告)日：2013-10-31

申请号：US13456796

申请日：2012-04-26

申请人： Hui Chen ,  Hung Chen ,  Jim Atkinson ,  David D. Huo

发明人： Hui Chen ,  Hung Chen ,  Jim Atkinson ,  David D. Huo

IPC分类号： A46B15/00 ,  A46D3/04 ,  A46B9/08

CPC分类号： A46B3/005 ,  A46B13/001 ,  H01L21/02096

摘要： In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush having a body of open-cell foam including an interior surface, a sleeve received in contact with the scrubber brush, the sleeve including peripherally-spaced, longitudinal walls and reinforcing segments interconnecting adjacent ones of the longitudinal walls and forming elongated pockets along the length, the sleeve having raised ribs extending along the length, and a mandrel having recesses formed on an outer surface, the mandrel being coupled to the sleeve by receiving the raised ribs within the recesses. Scrubber brush subassemblies, high stiffness mandrels, and methods of assembly are provided, as are numerous other aspects.

摘要翻译： 在一个方面，提供了洗涤器刷组件。 洗涤器刷组件包括洗涤器刷，其具有包括内表面的开孔泡沫体，与洗涤器刷接触的套筒，套筒包括周向间隔开的纵向壁和将邻近的纵向壁相互连接的加强段 以及沿所述长度形成细长的袋，所述套筒具有沿所述长度延伸的凸肋，以及具有形成在外表面上的凹部的心轴，所述心轴通过容纳所述凹部内的所述凸肋而联接到所述套筒。 提供了洗涤刷组件，高刚度心轴和组装方法，以及许多其它方面。

公开(公告)号：US20130122782A1

公开(公告)日：2013-05-16

申请号：US13459071

申请日：2012-04-27

申请人： Shou-Sung Chang ,  Hung Chen ,  Lakshmanan Karuppiah ,  Paul D. Butterfield ,  Erik S. Rondum

发明人： Shou-Sung Chang ,  Hung Chen ,  Lakshmanan Karuppiah ,  Paul D. Butterfield ,  Erik S. Rondum

IPC分类号： B24B49/16

CPC分类号： B24B37/013 ,  B24B49/16

摘要： Methods, apparatus, and systems for polishing a substrate are provided. The invention includes an upper platen; a torque/strain measurement instrument coupled to the upper platen; and a lower platen coupled to the torque/strain measurement instrument and adapted to drive the upper platen to rotate through the torque/strain measurement instrument. In other embodiments, the invention includes an upper carriage; a side force measurement instrument coupled to the upper carriage; and a lower carriage coupled to the side force measurement instrument and adapted to support a polishing head. Numerous additional aspects are disclosed.

摘要翻译： 提供了用于抛光衬底的方法，装置和系统。 本发明包括上压板; 耦合到上压板的扭矩/应变测量仪器; 以及耦合到扭矩/应变测量仪器并适于驱动上压板旋转通过扭矩/应变测量仪器的下压板。 在其他实施例中，本发明包括一个上部托架; 耦合到上部托架的侧向力测量仪器; 以及耦合到所述侧向力测量仪器并适于支撑抛光头的下托架。 公开了许多附加方面。