Electrophotosensitive materials for migration imaging processes
    14.
    发明授权
    Electrophotosensitive materials for migration imaging processes 失效
    用于迁移成像过程的电光敏材料

    公开(公告)号:US4175956A

    公开(公告)日:1979-11-27

    申请号:US876795

    申请日:1978-02-10

    IPC分类号: C09B23/01 C09B57/00 G03G17/04

    摘要: Electrophotosensitive materials having the structure ##STR1## is disclosed wherein R.sub.1 and R.sub.2, which may be the same or different, represent a monovalent or divalent substituted or unsubstituted 5 to 13 member heterocyclic nucleus or a substituted or unsubstituted 5 to 10 member saturated or unsaturated carbocyclic nucleus and said hetero atom is selected from the group consisting of O and N;R.sub.3 represents H, alkyl, aryl, or cyano and carboxyesters;m represents 0 or 1;n represents 0, 1, 2 or 3; andsaid substituted R.sub.1 and R.sub.2 substituents are selected from the group consisting of alkyl, hydroxy, phenyl, oxo, benzyl, carbamoyl, acetamido, nitro, piperidinyl, halo, and substituted amino.

    摘要翻译: 公开了具有结构 I的电光敏材料,其中可以相同或不同的R 1和R 2表示一价或二价的取代或未取代的5至13元杂环核或取代或未取代的5至10元饱和或 不饱和碳环和所述杂原子选自O和N; R3表示H,烷基,芳基或氰基,羧基酯; m表示0或1; n表示0,1,2或3; 并且所述取代的R 1和R 2取代基选自烷基,羟基,苯基,氧代,苄基,氨基甲酰基,乙酰氨基,硝基,哌啶基,卤素和取代的氨基。