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公开(公告)号：US06916592B2
公开(公告)日：2005-07-12
申请号：US10395268
申请日：2003-03-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： C07C309/67 , G03F7/004 , G03F7/039 , C08F12/30 , C08F114/18 , G03F7/30 , G03F7/38
CPC分类号： C07C309/67 , C07C2603/68 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.
摘要翻译： 包含其中引入氟化磺酸盐或氟化砜的基础聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的透明度，对比度和粘附性，并且适用于光刻微处理。
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公开(公告)号：US06872514B2
公开(公告)日：2005-03-29
申请号：US10395256
申请日：2003-03-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.
摘要翻译： 包含其中引入氟化磺酸盐或氟化砜的基础聚合物的抗蚀剂组合物对于300nm以下的高能辐射敏感，具有优异的透明度，对比度和粘附性，并且适用于光刻微处理。
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公开(公告)号：US07169869B2
公开(公告)日：2007-01-30
申请号：US11179606
申请日：2005-07-13
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： C08F12/30
CPC分类号： C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译： 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性，底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性，并且适用于光刻微处理。
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公开(公告)号：US20050267275A1
公开(公告)日：2005-12-01
申请号：US11179606
申请日：2005-07-13
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： C08F28/02 , C08F212/14 , C08F220/12 , C08F232/00 , G03F7/004 , G03F7/039 , H01L21/027 , C08F12/30
CPC分类号： C08F28/02 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.
摘要翻译： 包含具有氟化亲水基团的乙烯基磺酸酯单元作为基础树脂的聚合物的抗蚀剂组合物具有优异的透明性，底物粘合性和显影剂渗透性以及耐等离子体耐蚀刻性，并且适用于光刻微处理。
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公开(公告)号：US06824955B2
公开(公告)日：2004-11-30
申请号：US10328007
申请日：2002-12-26
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： G03C1492
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprising a copolymer of an acrylic ester monomer containing fluorine at &agr;-position with a norbornene derivative containing oxygen or sulfur within the norbornene ring as a base resin is sensitive to high-nergy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
摘要翻译： 包含α位上含氟的丙烯酸酯单体与在降冰片烯环内含有氧或硫的降冰片烯衍生物作为基础树脂的共聚物的抗蚀剂组合物对于200nm以下的高能量辐射敏感，具有优异的灵敏度，透明度和 干蚀刻电阻，适用于光刻微处理。
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公开(公告)号：US06603037B2
公开(公告)日：2003-08-05
申请号：US10305085
申请日：2002-11-27
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： C07C6962
CPC分类号： G03F7/0397 , C07C67/10 , C07C69/653 , C07C2601/14 , C07C2602/28 , C07C2602/42 , C07C2603/74 , C07C2603/86 , C08F20/28
摘要： Acrylic esters containing fluorine at &agr;-position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and substrate adhesion and are used to formulate chemically amplified resist compositions for lithographic microfabrication.
摘要翻译： 在α-位上含有氟并具有引入其酯侧链的烷氧基甲基的丙烯酸酯是新颖的。 从丙烯酸酯获得的聚合物在透明度，酸消除和底物粘附性方面得到改进，并且用于制备用于光刻微细加工的化学放大抗蚀剂组合物。
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公开(公告)号：US06864037B2
公开(公告)日：2005-03-08
申请号：US10178237
申请日：2002-06-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
CPC分类号： G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： A copolymer of an acrylic monomer having at least one C6-20 alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
摘要翻译： 具有至少一个C6-20脂环结构的丙烯酸单体与降冰片烯衍生物或具有六氟醇侧基的苯乙烯单体的共聚物对VUV辐射是高度透明的，并且耐等离子体蚀刻。 使用聚合物作为基础树脂的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，透明度和耐干蚀刻性，并且适用于光刻微处理。
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公开(公告)号：US06790586B2
公开(公告)日：2004-09-14
申请号：US09947504
申请日：2001-09-07
申请人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7038
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/108
摘要： A resist composition comprising (A) a polymer comprising recurring units having an alicyclic hydrocarbon backbone to which a carboxylate moiety capable of generating carboxylic acid when decomposed under acidic conditions is attached through a C1-C20 alkylene spacer, (B) a photoacid generator, and (C) an organic solvent is sensitive to high-energy radiation, and has excellent sensitivity and resolution at a wavelength below 180 nm, and good plasma etching resistance. Because these features of the inventive resist composition enable its use particularly as a resist at the exposure wavelength of a F2 excimer laser, a finely defined pattern can easily be formed, making the resist ideal as a micropatterning material in VLSI fabrication.
摘要翻译： 一种抗蚀剂组合物，其包含（A）包含具有脂环族烃主链的重复单元的聚合物，当在酸性条件下分解时，能够产生羧酸的羧酸酯部分通过C1-C20亚烷基间隔基，（B）光致酸产生剂和 （C）有机溶剂对高能辐射敏感，并且在低于180nm的波长下具有优异的灵敏度和分辨率，以及良好的等离子体耐蚀刻性。 由于本发明抗蚀剂组合物的这些特征使得其能够特别用作F2准分子激光器的曝光波长处的抗蚀剂，因此可以容易地形成精细限定的图案，使得抗蚀剂在VLSI制造中理想为微图案材料。
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公开(公告)号：US06511787B2
公开(公告)日：2003-01-28
申请号：US09947764
申请日：2001-09-07
申请人： Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
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公开(公告)号：US07005228B2
公开(公告)日：2006-02-28
申请号：US10178638
申请日：2002-06-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A ternary copolymer comprising units of α-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of α-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
摘要翻译： 包含其上取代有酸不稳定基团的α-三氟甲基丙烯酸羧酸酯单元的三元共聚物，其上取代有粘合剂基团的α-三氟甲基丙烯酸羧酸酯单元和具有六氟醇垂饰的苯乙烯单元对VUV辐射是高度透明的并且耐等离子体蚀刻。 使用聚合物作为基础树脂的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，并且适用于光刻微处理。
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