公开(公告)号：US06189482B1

公开(公告)日：2001-02-20

申请号：US08799415

申请日：1997-02-12

申请人： Jun Zhao ,  Lee Luo ,  Xiao Liang Jin ,  Jia-Xiang Wang ,  Talex Sajoto ,  Stefan Wolff ,  Leonid Selyutin ,  Ashok Sinha

发明人： Jun Zhao ,  Lee Luo ,  Xiao Liang Jin ,  Jia-Xiang Wang ,  Talex Sajoto ,  Stefan Wolff ,  Leonid Selyutin ,  Ashok Sinha

IPC分类号： C23C1600

CPC分类号： H01J37/3244 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/4586 ,  C23C16/52 ,  H01J37/32082 ,  H01J2237/2001 ,  H01J2237/3321

摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 Å/minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400° C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.

摘要翻译： 本发明提供了用于从四氯化钛源在半导体衬底上以200埃/分钟的速率沉积钛膜的系统，方法和装置。 根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。 热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。 沉积系统包括限流器环和其它特征，其允许15升/分钟的流速通过室，具有最小的背侧沉积并且最小化在室底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和 调味料。 沉积和清洁过程也是本发明的进一步的实施方案。

公开(公告)号：US6120609A

公开(公告)日：2000-09-19

申请号：US892612

申请日：1997-07-14

申请人： Leonid Selyutin ,  Talex Sajoto ,  Jun Zhao

发明人： Leonid Selyutin ,  Talex Sajoto ,  Jun Zhao

IPC分类号： C23C16/458 ,  H01L21/68 ,  H01L21/687 ,  C23C16/00

CPC分类号： C23C16/4583 ,  H01L21/68 ,  H01L21/68742 ,  H01L21/68792

摘要： An improved lift mechanism includes a configuration having two sections of bellows welded to a central flange. The central flange provides support for a precisely aligned lift pin support structure. The efficient utilization of space provides space for an enlarged stem while minimizing the interaction between pieces within the processing chamber. Outside the vacuum limits of the processing chamber, a catch arrangement is provided as part of a linkage that allows a single vertical drive to be utilized to manipulate both the vertical motion of lift pins and vertical motion of the pedestal supporting a substrate in a processing chamber. In one configuration a unitized lift mechanism can be replaced as a unit. Particular orientations for utilizing a lift pin support plate with ceramic inserts is disclosed to reduce particle generation within the processing chamber.

摘要翻译： 改进的提升机构包括具有焊接到中心凸缘的波纹管的两个部分的构造。 中心凸缘为精确对齐的提升销支撑结构提供支撑。 空间的有效利用为扩大的茎提供空间，同时最小化处理室内的碎片之间的相互作用。 在处理室的真空限制之外，提供了捕捉装置作为连杆的一部分，其允许使用单个垂直驱动来操纵提升销的垂直运动和支撑基板的基座在处理室中的垂直运动 。 在一个配置中，可以将单元升降机构替换为一个单元。 公开了用于利用具有陶瓷插入件的提升销支撑板的特定取向，以减少处理室内的颗粒产生。

公开(公告)号：US06464795B1

公开(公告)日：2002-10-15

申请号：US09563573

申请日：2000-05-03

申请人： Semyon Sherstinsky ,  Calvin Augason ,  Leonel A. Zuniga ,  Jun Zhao ,  Talex Sajoto ,  Leonid Selyutin ,  Joseph Yudovsky ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Tai T. Ngo ,  Arnold Kholodenko

发明人： Semyon Sherstinsky ,  Calvin Augason ,  Leonel A. Zuniga ,  Jun Zhao ,  Talex Sajoto ,  Leonid Selyutin ,  Joseph Yudovsky ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Tai T. Ngo ,  Arnold Kholodenko

IPC分类号： G23C1600

CPC分类号： C23C16/45521 ,  C23C16/4586 ,  H01L21/67109 ,  H01L21/6838 ,  H01L21/68785

摘要： A support member for supporting a substrate in a process chamber, the support member having a substrate support surface with one or more isolated recessed areas. A vacuum channel and a gas channel are formed in the support member along a common plane and are coupled to a vacuum source and gas source respectively. The gas channel comprises two or more concentrically disposed annular gas channels encompassing the vacuum channel. The vacuum channel is coupled to the support surface, and in particular to the one or more recessed areas, by a plurality of conduits. A portion of the conduits is disposed diametrically exterior to at least one of the annular gas channels and communicates with the vacuum channel via bypass channels.

摘要翻译： 一种用于在处理室中支撑衬底的支撑构件，所述支撑构件具有具有一个或多个隔离的凹陷区域的衬底支撑表面。 真空通道和气体通道沿着公共平面形成在支撑构件中，并且分别耦合到真空源和气体源。 气体通道包括包围真空通道的两个或更多个同心设置的环形气体通道。 真空通道由多个管道联接到支撑表面，特别是连接到一个或多个凹陷区域。 导管的一部分沿直径设置在至少一个环形气体通道的外部，并通过旁通通道与真空通道连通。

公开(公告)号：US6035101A

公开(公告)日：2000-03-07

申请号：US56703

申请日：1998-03-26

申请人： Talex Sajoto ,  Leonid Selyutin ,  Jun Zhao ,  Stefan Wolff

发明人： Talex Sajoto ,  Leonid Selyutin ,  Jun Zhao ,  Stefan Wolff

IPC分类号： H05B3/68 ,  C23C16/458 ,  C23C16/46 ,  C23C16/509 ,  H01L21/00 ,  H01L21/285 ,  H01L21/31 ,  C23C16/00 ,  F27B5/14 ,  F28F7/00 ,  H01L21/68

CPC分类号： C23C16/463 ,  C23C16/4586 ,  C23C16/46 ,  C23C16/5096 ,  H01L21/67109

摘要： The present invention provides systems, methods and apparatus for heating substrates in a processing chamber to temperatures up to at least 700.degree. C. In accordance with an embodiment of the invention a heater assembly with an inner core of high thermal conductivity is encased in a shell of lower thermal conductivity, creating a nearly isothermal interface between the core and shell. The inner core is brazed to the shell, promoting thermal transfer, and acts as a thermal short between opposing surfaces of the shell. The heater assembly is designed to minimize thermal stresses arising from the difference in the thermal expansion coefficients of the various components of the multi-layered heater assembly. In one embodiment of the invention, two independently-powered heating elements are arranged concentrically to each other to create a dual zone heater. A thermal gap in the inner core between the inner and outer heating elements de-couples the zones and provides a more controllable temperature profile at the surface of the heater, including excellent temperature uniformity. In one embodiment, an RF isolator is placed between a heater and a support shaft, allowing the heater to be powered as an electrode in a plasma process.

摘要翻译： 本发明提供了用于将处理室中的衬底加热至至少700℃的温度的系统，方法和设备。根据本发明的实施例，具有高导热性的内芯的加热器组件被包封在壳体 具有较低的导热性，从而在芯和壳之间产生接近等温的界面。 内芯被钎焊到壳体上，促进热传递，并且作为壳体的相对表面之间的热短路。 加热器组件被设计成最小化由多层加热器组件的各种部件的热膨胀系数的差异引起的热应力。 在本发明的一个实施例中，两个独立供电的加热元件彼此同心地布置以产生双区加热器。 内部加热元件和外部加热元件之间的内部芯片的热间隙使这些区域脱耦并在加热器表面提供更可控的温度分布，包括优异的温度均匀性。 在一个实施例中，RF隔离器被放置在加热器和支撑轴之间，允许加热器在等离子体工艺中作为电极供电。

公开(公告)号：US5951776A

公开(公告)日：1999-09-14

申请号：US738240

申请日：1996-10-25

申请人： Leonid Selyutin ,  Jun Zhao

发明人： Leonid Selyutin ,  Jun Zhao

IPC分类号： C23C16/458 ,  H01L21/68 ,  H01L21/687 ,  C23C16/00 ,  B65G29/00 ,  B65G47/00 ,  B66B9/02

CPC分类号： H01L21/68742 ,  C23C16/4583 ,  H01L21/68 ,  H01L21/68792

摘要： A particular configuration of a compact self-aligning lift mechanism is provided for lifting the stem of a pedestal in a processing chamber while minimizing process anomalies due to geometric misalignment and binding of moving pieces. The force associated with supporting a stem in a processing chamber is routed through a first arm through a base portion of a carrier bracket where it engages a linear bearing such that the truck and track of the linear bearing absorb all forces riot aligned with the bearing. A second arm extending from the base portion, for example through a set of slots adjacent to the bearing track support member, is attached to a lift mechanism which can oppose the force from the pedestal stem such that the displacements of the first and second arms are predictable based on the force on that arm. A compliant nut is used so that the drive screw can be somewhat misaligned with the linear bearing track without causing binding, misalignment, or non-repeatability of substrate positioning during processing.

摘要翻译： 提供了一种紧凑的自对准提升机构的特定构造，用于在处理室中提升基座的杆，同时最小化由于几何未对准和移动件的结合所造成的过程异常。 与处理室中支撑杆相关联的力通过第一臂穿过承载架的基部，其中它与直线轴承接合，使得直线轴承的卡车和轨道吸收与轴承对准的所有力。 从基部延伸的第二臂，例如通过邻近轴承轨道支撑构件的一组槽，附接到提升机构，该提升机构可以抵抗来自基座杆的力，使得第一和第二臂的位移为 基于该手臂的力量可预测。 使用柔性螺母，使得驱动螺杆可以与线性轴承轨道稍微不对准，而不会在加工期间引起基板定位的结合，未对准或不可重复性。