公开(公告)号：US11752687B2

公开(公告)日：2023-09-12

申请号：US16548412

申请日：2019-08-22

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Hyung Min Kim ,  Ki Joo Pahk ,  Byung Chul Lee ,  Inchan Youn

IPC: B29C64/106 ,  B29C64/393 ,  B33Y50/02 ,  B33Y30/00 ,  B33Y10/00 ,  B29C64/291 ,  B29C64/282

CPC classification number: B29C64/106 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B29C64/282 ,  B29C64/291

Abstract: According to an embodiment of the present disclosure, there is provided a completely new type of 3-dimensional (3D) printing method for producing an object by focusing ultrasound onto material that changes in state by stimulation to solidify it into a desired shape. The method for 3D printing according to an embodiment includes providing material which changes in state by stimulation, setting a target focal point in the material, focusing ultrasound onto the target focal point using at least one ultrasound transducer, and applying stimulation to the material using the focused ultrasound to induce a change in state of the material. According to the embodiments, it is possible to control the precision of the output by controlling the frequency of the ultrasound transducer or the size of the target focal point on system.

公开(公告)号：US20230145077A1

公开(公告)日：2023-05-11

申请号：US17961995

申请日：2022-10-07

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Seung Hyub BAEK ,  Hyung-Jin CHOI ,  Sung Hoon HUR ,  Ji-Soo JANG ,  Jung Ho YOON ,  Seong Keun KIM ,  Hyun Cheol SONG ,  Chong Yun KANG ,  Ji-Won CHOI ,  Jin Sang KIM ,  Byung Chul Lee

IPC: C30B33/02 ,  H01L41/319 ,  C30B29/22 ,  C30B23/02

CPC classification number: C30B33/02 ,  H01L41/319 ,  C30B29/22 ,  C30B23/025 ,  H01L41/1871

Abstract: Disclosed is a method of manufacturing an epitaxy oxide thin film of enhanced crystalline quality, and an epitaxy oxide thin film manufactured thereby according to the present invention. With respect to the manufacturing method of the epitaxy oxide thin film, which epitaxially grows an orientation film with an oxide capable of being oriented to (001), (110), and (111) on a single crystal Si substrate, because time required for raising a temperature of the orientation film up to an annealing temperature at room temperature is extremely minimized, thermal stress arising from the large difference in thermal expansion coefficients between the substrate and the orientation film is controlled, so crystalline quality of the epitaxy oxide thin film can be enhanced. Moreover, various epitaxial functional oxides are integrated into the thin film of enhanced crystalline quality so that a novel electronic device can be embodied.

公开(公告)号：US11524182B2

公开(公告)日：2022-12-13

申请号：US16276396

申请日：2019-02-14

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Byung Chul Lee ,  Hyung Min Kim ,  Ki Joo Pahk

IPC: A61N7/02 ,  A61N7/00

Abstract: Disclosed herein is a non-invasive treatment system using intermedium, and an exemplary treatment system is configured to output high-intensity focused ultrasound to remove bone tissue, inject an acoustically-transparent medium into a part where the bone tissue is removed to generate an intermedium, and output therapeutic ultrasound that passes through the intermedium. Accordingly, the bone tissue is removed in a non-invasive way using high-intensity focused ultrasound, and the intermedium is generated at the bone tissue removed site, to increase the penetration of therapeutic ultrasound or generate ultrasound itself, thereby improving an ultrasound treatment effect while minimizing the side effect (for example, infection of dura mater) of invasive surgery methods.

公开(公告)号：US11491352B2

公开(公告)日：2022-11-08

申请号：US16431543

申请日：2019-06-04

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Ki Joo Pahk ,  Hyung Min Kim ,  Byung Chul Lee ,  Inchan Youn

IPC: A61N7/00 ,  A61B8/00 ,  A61B8/08 ,  A61N7/02

Abstract: A high-low intensity focused ultrasound treatment apparatus according to the present disclosure includes a plurality of ultrasound sources, and a controller to control a center frequency and intensity of focused ultrasound outputted from the ultrasound sources, wherein each of the ultrasound sources includes a first ultrasound transducer to output low-intensity focused ultrasound to detect a lesion, and a second ultrasound transducer to output high-intensity focused ultrasound to ablate or remove the detected lesion. The low-intensity focused ultrasound outputted from the first transducer may be used to detect a lesion in a patient's brain by applying a stimulus to the brain, and at the same time, investigating a response, and the high-intensity focused ultrasound outputted from the second transducer may be used to ablate or remove the detected lesion by applying a thermal or mechanical stimulus to the lesion.