公开(公告)号：US08275190B2

公开(公告)日：2012-09-25

申请号：US13214420

申请日：2011-08-22

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the defect detection process performed by the defect detection unit is performed asynchronously with an image acquisition process that is performed by the image acquisition unit.

摘要翻译： 一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理，其中由缺陷检测单元执行的缺陷检测处理与图像获取处理异步地执行， 由图像获取单元执行。

公开(公告)号：US08005292B2

公开(公告)日：2011-08-23

申请号：US12876699

申请日：2010-09-07

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： An apparatus for inspecting pattern defects, the apparatus including: an image acquisition unit which acquires an image of a specimen and stores the acquired image in an image memory; a defect candidate extraction unit which performs a defect candidate extraction process by using the acquired image, which is read from the image memory; and a defect detection unit which performs a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect detection unit is performed off-line asynchronously with an image acquisition process that is performed by the image acquisition unit.

摘要翻译： 一种用于检查图案缺陷的装置，所述装置包括：图像获取单元，其获取样本的图像并将所获取的图像存储在图像存储器中; 缺陷候选提取单元，其通过使用从图像存储器读取的所获取的图像来执行缺陷候选提取处理; 以及缺陷检测单元，其执行基于包含由缺陷候选提取单元提取的缺陷候选的部分图像的缺陷检测处理和缺陷分类处理，其中由缺陷检测单元执行的处理异步执行 具有由图像获取单元执行的图像获取处理。

公开(公告)号：US07903249B2

公开(公告)日：2011-03-08

申请号：US12366003

申请日：2009-02-05

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/55

CPC分类号： G01N21/95684 ,  G01N2021/9513

摘要： An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.

摘要翻译： 用于检查缺陷的装置和方法包括：照射器，用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器，用于形成从样本反射的光的图像， 至少通过反射物镜的照明器的光，用图像传感器检测由成像器形成的光的图像的检测器，以及用于处理从检测器输出的信号以检测缺陷的图像处理器 在标本上。 图像传感器是反面照射型图像传感器。

公开(公告)号：US07792352B2

公开(公告)日：2010-09-07

申请号：US12123160

申请日：2008-05-19

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： An apparatus for inspecting pattern defects, the apparatus including: a defect candidate extraction unit configured to perform a defect candidate extraction process by comparing a detected image signal with a reference image signal; and a defect detection unit configured to perform a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect candidate extraction unit and/or the defect detection unit are performed asynchronously with an image acquisition process.

摘要翻译： 一种用于检查图案缺陷的装置，所述装置包括：缺陷候选提取单元，被配置为通过将检测到的图像信号与参考图像信号进行比较来执行缺陷候选提取处理; 以及缺陷检测单元，被配置为基于包含由缺陷候选提取单元提取的缺陷候选的部分图像执行缺陷检测处理和缺陷分类处理，其中由缺陷候选提取单元执行的处理和/或 缺陷检测单元与图像获取处理异步地执行。

公开(公告)号：US07711178B2

公开(公告)日：2010-05-04

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US20090169093A1

公开(公告)日：2009-07-02

申请号：US12393848

申请日：2009-02-26

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.

公开(公告)号：US07333677B2

公开(公告)日：2008-02-19

申请号：US11586203

申请日：2006-10-24

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/32

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/32 ,  G06T2207/30148

摘要： The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divided into multiple regions. An offset is calculated for each pair of sub-images. Out of these multiple offsets, only the offsets with high reliability are used to determine an offset for the entire image. This allows high-precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images. Also, detection sensitivity is adjusted as necessary by monitoring alignment precision.

摘要翻译： 本发明提供了一种用于检查的高精度对准方法，装置和代码，其将检查图像与参考图像进行比较，并从其差异中检测缺陷。 在一个实施例中，检查图像和参考图像被分成多个区域。 为每对子图像计算偏移量。 在这些多个偏移量中，仅使用具有高可靠性的偏移量来确定整个图像的偏移。 这允许对图案密度或形状几乎或不依赖的高精度对准，图像之间的亮度差异以及各个图像内的不均匀亮度。 此外，通过监视对准精度，根据需要调整检测灵敏度。

公开(公告)号：US07020350B2

公开(公告)日：2006-03-28

申请号：US09802687

申请日：2001-03-08

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/32

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/32 ,  G06T2207/30148

摘要： The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divided into multiple regions. An offset is calculated for each pair of regions. Out of these multiple offsets, only the offsets with high reliability are used to determine an offset for the entire image. This allows high-precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images. Also, detection sensitivity is adjusted as necessary by monitoring alignment precision.

摘要翻译： 本发明提供了一种用于检查的高精度对准方法，装置和代码，其将检查图像与参考图像进行比较，并从其差异中检测缺陷。 在一个实施例中，检查图像和参考图像被分成多个区域。 计算每对区域的偏移量。 在这些多个偏移量中，仅使用具有高可靠性的偏移量来确定整个图像的偏移。 这允许对图案密度或形状几乎或不依赖的高精度对准，图像之间的亮度差异以及各个图像内的不均匀亮度。 此外，通过监视对准精度，根据需要调整检测灵敏度。

公开(公告)号：US20050033538A1

公开(公告)日：2005-02-10

申请号：US10936501

申请日：2004-09-09

申请人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

发明人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01B11/30 ,  G01N21/956 ,  H01L21/66 ,  G06F19/00

CPC分类号： G01N21/95607

摘要： The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of work which constitutes an electronic device such as a semiconductor integrated circuit, and relates to a system therefor. On the basis of the result of comparison between defect information which is the result of inspection by an inspection tool and layout data stored in an auxiliary storage device, or on the basis of the result of reinspection by comparison between a defect and a wiring pattern as a background by an inspection processing operation unit, an object to be reviewed is selected using review conditions stored in the auxiliary storage device.

摘要翻译： 本发明涉及一种用于优先分析在检查构成诸如半导体集成电路之类的电子设备的工件中的颗粒和图案缺陷时引起电气故障的可能性高的缺陷的工具， 一个系统。 基于作为检查工具的检查结果的缺陷信息与存储在辅助存储装置中的布局数据之间的比较的结果，或者基于通过比较缺陷和布线图案之间的重新检查的结果， 通过检查处理操作单元的背景，使用存储在辅助存储装置中的检查条件来选择要检查的对象。

公开(公告)号：US20110182496A1

公开(公告)日：2011-07-28

申请号：US13058223

申请日：2009-07-13

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01R31/311 ,  G06T7/001 ,  G06T2207/30121 ,  G06T2207/30148

摘要： A defect inspection method for inspecting a defect(s) on an object to be inspected, within a step for determining parameter includes: a step for extracting a defect candidate on the object to be inspected with using said discriminant function with determining an arbitrary parameter; and a step for automatically renewing the parameter of said discriminant function, upon basis of teaching of defect information relating to the defect candidate, which is extracted in the step for extracting the defect candidate.

摘要翻译： 在确定参数的步骤中，检查待检查对象的缺陷的缺陷检查方法包括：通过使用所述判别函数确定任意参数来提取待检查对象的缺陷候选的步骤; 以及基于在提取缺陷候选的步骤中提取的与缺陷候选相关的缺陷信息的教导，自动更新所述判别函数的参数的步骤。