公开(公告)号：US08090187B2

公开(公告)日：2012-01-03

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US20120076396A1

公开(公告)日：2012-03-29

申请号：US13312460

申请日：2011-12-06

申请人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method and apparatus are provided for sequentially imaging plural chips formed on a substrate to be inspected to and obtaining inspection images and reference images, calculating a position gap between the inspection images and the reference images using a recipe created in advance by using another substrate of the same kind or type as the substrate, the recipe including information for determining which pattern sections are to be selected and discarded, aligning the inspection images and the reference images using information of the position gap from the calculating step, and comparing the inspection images with the reference images aligned by the aligning step and extracting a defect candidate.

摘要翻译： 提供了一种图案检查方法和装置，用于将形成在要检查的基板上的多个芯片顺序地成像并获得检查图像和参考图像，使用预先通过使用另一个来创建的食谱来计算检查图像与参考图像之间的位置间隙 与基板相同种类或类型的基板，所述配方包括用于确定要选择和丢弃哪些图案部分的信息，使用来自计算步骤的位置间隙的信息对准检查图像和参考图像，并且将检查 具有通过对准步骤对齐的参考图像并提取缺陷候选的图像。

公开(公告)号：US20100172570A1

公开(公告)日：2010-07-08

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US07711178B2

公开(公告)日：2010-05-04

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US20080031511A1

公开(公告)日：2008-02-07

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US08915403B2

公开(公告)日：2014-12-23

申请号：US13515084

申请日：2010-12-02

申请人： Shinichi Inaba ,  Susumu Fujinami ,  Hiroshi Goto

发明人： Shinichi Inaba ,  Susumu Fujinami ,  Hiroshi Goto

IPC分类号： B65D37/00 ,  G01F11/08 ,  B65D1/32 ,  B65D1/02

CPC分类号： B65D1/32 ,  B65D1/0223 ,  B65D2501/0036 ,  B65D2501/0081 ,  G01F11/082

摘要： A fixed-amount discharge squeeze container (10) which discharges a specific amount of content liquid from a discharge port by squeeze deformation of a container body (11) includes a squeeze-deformable plastic-made container body (11) and a squeeze operating portion (14) to perform squeeze operation is arranged at a barrel portion (13) of the container body (11). The squeeze operating portion (14) has a cross-sectional shape formed with a compression face portion (16) having a mountain-like section including a pair of inclined face portions (15) arranged along two faces intersecting obtusely and a compression support portion (18) having an arc-shaped section which is jointed integrally with foot parts (19b) of the compression face portion (16) respectively via an edge line portion (17). The compression face portion (16) is restricted so as not to be flipped into a valley-like shape after the inclined face portions (15) deforms until force to expand the distance between the bilateral foot parts (19b) vanishes.

摘要翻译： 通过容器主体（11）的挤压变形从排出口排出特定量的内容液的固定排出挤压容器（10）包括可挤压变形的塑料制容器体（11）和挤压操作部 （14）设置在容器主体（11）的筒部（13）处。 挤压操作部分（14）具有横截面形状，其形成有具有山形部分的压缩面部分（16），该部分包括一对倾斜面部分（15），两个倾斜面部分沿着两个相互交叉的表面和压缩支承部分 18），其具有经由边缘线部分（17）分别与所述压缩面部分（16）的脚部（19b）整体接合的弧形部分。 压缩面部（16）被限制为在倾斜面部（15）变形之后不会翻转成谷状形状，直到两侧脚部（19b）之间的距离扩大的力消失。

公开(公告)号：US08857962B2

公开(公告)日：2014-10-14

申请号：US12863542

申请日：2009-01-16

申请人： Hiroshi Goto ,  Hisashi Habashi ,  Kiyofumi Nagai

发明人： Hiroshi Goto ,  Hisashi Habashi ,  Kiyofumi Nagai

IPC分类号： B41J2/01 ,  B41M5/00 ,  C09D11/54 ,  C09D11/00 ,  B41J2/21 ,  C09D11/322 ,  B41J11/00

CPC分类号： B41M5/0017 ,  B41J2/2107 ,  B41J11/0015 ,  B41M5/0011 ,  B41M5/0035 ,  C09D11/005 ,  C09D11/322 ,  C09D11/54

摘要： An image forming method of the present invention including applying a pretreatment liquid to a recording medium, and discharging an inkjet recording ink dropwise according to an image signal to form an image on the recording medium on which the pretreatment liquid has been applied, wherein the recording medium is regular paper which has no coat layer, the pretreatment liquid contains a cationic polymer compound, a surfactant A, water and a water-soluble organic acid, and the inkjet recording ink contains a water-dispersible colorant, a water-soluble organic solvent, a surfactant B, a penetrating agent and water, and wherein the pretreatment liquid has a static surface tension of 20 mN/m to 30 mN/m.

摘要翻译： 本发明的图像形成方法包括将预处理液体施加到记录介质上，并根据图像信号逐滴喷射喷墨记录墨水，以在其上施加有预处理液体的记录介质上形成图像，其中记录 介质是没有涂层的普通纸，预处理液含有阳离子高分子化合物，表面活性剂A，水和水溶性有机酸，喷墨记录油墨含有水分散性着色剂，水溶性有机溶剂 表面活性剂B，渗透剂和水，其中预处理液体具有20mN / m至30mN / m的静态表面张力。

公开(公告)号：US08814340B2

公开(公告)日：2014-08-26

申请号：US13388074

申请日：2010-08-10

申请人： Hiroshi Goto

发明人： Hiroshi Goto

IPC分类号： B41J2/01 ,  B41M5/00 ,  B41J2/21 ,  B41M7/00 ,  C09D11/00

CPC分类号： B41M5/0017 ,  B41J2/2107 ,  B41M7/0018 ,  C09D11/322 ,  C09D11/38 ,  C09D11/54 ,  Y10T428/24901

摘要： An image forming method including: applying a pre-treatment liquid onto a coating layer provided on at least one surface of a support of a recording medium, jetting an inkjet ink onto the coating layer, onto which the pre-treatment liquid has been applied, so as to form an image, and applying or jetting a post-treatment liquid onto the coating layer, onto which the inkjet ink has been jetted, so as to form a transparent protective layer on the coating layer, wherein the inkjet ink contains the water-dispersible colorant, a water-soluble organic solvent, a surfactant, a penetrant and water, and wherein an amount of pure water transferred into the recording medium, provided with the coating layer, measured at a contact time of 100 ms with a dynamic scanning liquid absorptometer is 1 ml/m2 to 10 ml/m2, and the pre-treatment liquid contains a water-soluble aliphatic organic acid.

摘要翻译： 一种图像形成方法，包括：将预处理液体施加到设置在记录介质的支撑体的至少一个表面上的涂层上，将喷墨油墨喷射到涂覆有预处理液体的涂层上， 以便形成图像，并且将后处理液体施加或喷射到已经喷射了喷墨油墨的涂层上，以在涂层上形成透明保护层，其中喷墨油墨含有水 可分散着色剂，水溶性有机溶剂，表面活性剂，渗透剂和水，并且其中转移到记录介质中的设置有涂层的纯水量在100ms的接触时间下用动态扫描 液体吸收计为1ml / m 2至10ml / m 2，预处理液含有水溶性脂肪族有机酸。

公开(公告)号：US08703618B2

公开(公告)日：2014-04-22

申请号：US13555728

申请日：2012-07-23

申请人： Hiroshi Goto ,  Hiroshi Okuyama ,  Mitsunori Kokubo ,  Kentaro Ishibashi

发明人： Hiroshi Goto ,  Hiroshi Okuyama ,  Mitsunori Kokubo ,  Kentaro Ishibashi

IPC分类号： H01L21/311

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A micropattern is joined to a substrate (W1) by: a first group of covering step and micropattern forming step by etching in a transfer step; and a second group of covering step and micropattern forming step by etching in the transfer step.

摘要翻译： 通过以下步骤将微图案连接到基板（W1）：通过在转印步骤中蚀刻的第一组覆盖步骤和微图案形成步骤; 以及在转印步骤中通过蚀刻的第二组覆盖步骤和微图案形成步骤。

公开(公告)号：US20130341183A1

公开(公告)日：2013-12-26

申请号：US14002768

申请日：2012-03-01

申请人： Hiroshi Goto ,  Yuki Iwasaki

发明人： Hiroshi Goto ,  Yuki Iwasaki

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  C04B35/453 ,  C04B35/457 ,  C04B2235/3217 ,  C04B2235/3244 ,  C04B2235/3251 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3293 ,  C23C14/08 ,  C23C14/086 ,  H01L21/02554 ,  H01L21/02565 ,  H01L21/02631

摘要： Provided are an oxide sintered body and a sputtering target that are ideal for the production of an oxide semiconductor film for a display device. The oxide sintered body and sputtering target that are provided have both high conductivity and high relative density, are capable of forming an oxide semiconductor film having a high carrier mobility, and in particular, have excellent direct-current discharge stability in that long-term, stable discharge is possible, even when used by the direct-current sputtering method. The oxide sintered body of the invention is an oxide sintered body obtained by mixing and sintering zinc oxide, tin oxide, and an oxide of at least one metal (M metal) selected from the group consisting of Al, Hf, Ni, Si, Ga, In, and Ta. When the in-plane specific resistance and the specific resistance in the direction of depth are approximated by Gaussian distribution, the distribution coefficient σ of the specific resistance is 0.02 or less.

摘要翻译： 提供了一种氧化物烧结体和溅射靶，其对于制造用于显示装置的氧化物半导体膜是理想的。 所提供的氧化物烧结体和溅射靶都具有高导电性和高相对密度，能够形成具有高载流子迁移率的氧化物半导体膜，并且特别地，在长期内具有优异的直流放电稳定性， 即使通过直流溅射法使用也能够稳定地进行放电。 本发明的氧化物烧结体是通过将氧化锌，氧化锡和至少一种选自Al，Hf，Ni，Si，Ga的金属（M金属）的氧化物混合并烧结而得到的氧化物烧结体 ，In和Ta。 当面内电阻率和深度方向的电阻率由高斯分布近似时，电阻率的分布系数σ为0.02以下。