-
公开(公告)号：US06291130B1
公开(公告)日：2001-09-18
申请号：US09361568
申请日：1999-07-27
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III)
摘要翻译： 一种正型光敏组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物和（B-1）具有通过酸作用分解的基团的树脂，以增加在碱性显影中的溶解度 溶液，含有式（I），（II）和（III）表示的至少一种结构，
-
公开(公告)号：US5945250A
公开(公告)日：1999-08-31
申请号：US868932
申请日：1997-06-04
申请人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
发明人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
CPC分类号： G03F7/0045 , Y10S430/107 , Y10S430/115 , Y10S430/118 , Y10S430/12 , Y10S430/122
摘要： A photosensitive composition containing a sulfonium or iodonium salt resin having a specific repeating structural units has good solubility in solvents and high photosensitivity, are capable of giving an excellent resist pattern, and change little with time after exposure.
摘要翻译： 含有具有特定重复结构单元的锍盐或碘鎓盐树脂的光敏组合物在溶剂中具有良好的溶解性和高光敏性，能够得到优异的抗蚀剂图案，并且在曝光后随时间变化很小。
-
公开(公告)号：US06777160B2
公开(公告)日：2004-08-17
申请号：US10093411
申请日：2002-03-11
申请人： Kenichiro Sato , Kunihiko Kodama
发明人： Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.
摘要翻译： 一种正性抗蚀剂组合物，其包含（A）具有脂族环状烃基的特定树脂，并且通过酸的作用在碱性显影液中的溶解速度提高，（B）通过照射产生酸的特定化合物 的光化射线或辐射。 该组合物的分辨能力和曝光余量优异，并且可以适用于使用远紫外线，特别是ArF准分子激光束的微光制造。
-
公开(公告)号：US06692884B2
公开(公告)日：2004-02-17
申请号：US10116137
申请日：2002-04-05
申请人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.
摘要翻译： 正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物 或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。
-
公开(公告)号：US06596458B1
公开(公告)日：2003-07-22
申请号：US09563436
申请日：2000-05-03
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111
摘要： Disclosed is a positive-working photoresist composition having reduced development defects, and excellent in resist pattern profiles and in the resolving power of contact holes, which comprises (i) a compound generating an acid by irradiation of active light or radiation, and (ii) a resin containing repeating units of at least one kind selected from the group consisting of (a) repeating units having alkali-soluble groups each protected with at least one group selected from the group consisting of groups containing alicyclic hydrocarbon structures represented by specific general formulas (pI) to (pVI), (b) repeating units represented by specific general formula (II) and (c) repeating units represented by specific general formulas (III-a) to (III-d), and decomposed by the action of an acid to increase the solubility of the resin into an alkali.
摘要翻译： 公开了具有减少的显影缺陷，抗蚀剂图案轮廓和接触孔分辨能力优异的正性光致抗蚀剂组合物，其包括（i）通过活性光或辐射的照射产生酸的化合物，和（ii） 含有重复单元的树脂，所述重复单元选自（a）具有碱溶性基团的重复单元，各自被至少一个选自由特定通式表示的脂环族烃结构的基团所选择的基团保护的基团 pI）至（pVI），（b）由特定通式（II）表示的重复单元和（c）由特定通式（III-a）至（III-d）表示的重复单元，并通过 酸以增加树脂在碱中的溶解度。
-
公开(公告)号：US06544715B2
公开(公告)日：2003-04-08
申请号：US09492848
申请日：2000-01-27
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03C173
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition for far ultraviolet ray exposure improved in standard developing solution suitability, good in defocus latitude depended on line pitch of a resist pattern formed and excellent in sensitivity to a light source of shorter wavelength, which comprises (i) a compound capable of generating an acid by irradiation of actinic light or radiation; and (ii) a resin containing (a) repeating units each having an alkali-soluble group protected with at least one specific group containing an alicyclic hydrocarbon structure, (b) repeating units having, for example, lactone rings, and (c) repeating units derived from (meth)acrylic acid, the content of the repeating units of (c) being from 5 mol % to 18 mol % based on the total repeating units of the resin, and the resin being decomposable by action of an acid to increase its solubility in an alkali solution.
-
公开(公告)号：US06506535B1
公开(公告)日：2003-01-14
申请号：US09698221
申请日：2000-10-30
IPC分类号： G03C172
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is a positive working photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (B) an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), (C) at least one solvent capable of dissolving the components (A) and (B), (D) an organic basic compound and (E) at least one surfactant selected from fluorine-containing surfactants, silicon-containing surfactants and nonionic surfactants:
摘要翻译： 公开了一种正性光致抗蚀剂组合物，其包含至少含有由下式（I）表示的重复单元和至少一种由下式（IIa）或（IIb）表示的重复单元的酸可分解聚合物，并且还公开 是一种正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物，（B）至少含有由下式（I）表示的重复单元的酸可分解聚合物和至少 由下式（IIa）或（IIb）表示的一个重复单元，（C）至少一种能够溶解组分（A）和（B）的溶剂，（D）有机碱性化合物和（E） 一种选自含氟表面活性剂，含硅表面活性剂和非离子表面活性剂的表面活性剂：
-
公开(公告)号：US06410204B1
公开(公告)日：2002-06-25
申请号：US09669907
申请日：2000-09-27
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： A positive photoresist composition comprising (A) a compound which generates a sulfonic acid having naphthalene structure by the irradiation with actinic rays of a wavelength of 220 nm or less or radiation, and (B) a resin whose solubility in an alkali developing solution increases by the action of an acid is disclosed.
摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）通过用波长为220nm以下的光化射线照射或辐射而产生具有萘结构的磺酸的化合物，和（B）在碱性显影溶液中的溶解度增加的树脂 公开了酸的作用。
-
公开(公告)号：US6150068A
公开(公告)日：2000-11-21
申请号：US911165
申请日：1997-08-14
申请人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/30 , H01L21/027 , B03F7/004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/121
摘要： A photosensitive resin composition for far-ultraviolet exposure of from 170 to 220 nm, which comprises an N-hydroxymaleinimide-type sulfonate photo acid generator having a specific structure and a resin having a substituent capable of increasing the solubility to an alkali developer by an acid, and a pattern forming method using the photosensitive resin composition. The photosensitive resin composition has a high transparency to light having a wavelength of from 170 to 220 nm and is excellent in the photocomposition property and the acid generating efficiency.
摘要翻译： 一种用于远紫外线暴露于170至220nm的感光树脂组合物，其包含具有特定结构的N-羟基马来酰亚胺型磺酸盐光致酸产生剂和具有能够通过酸增加对碱性显影剂的溶解度的取代基的树脂 ，以及使用感光性树脂组合物的图案形成方法。 感光性树脂组合物对波长为170〜220nm的光具有高透明性，并且光致变色性和酸产生效率优异。
-
公开(公告)号：US5629128A
公开(公告)日：1997-05-13
申请号：US531081
申请日：1995-09-20
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.
摘要翻译： 描述了一种正型光致抗蚀剂组合物，其包含由下式（I）表示的多羟基化合物的碱溶性树脂和1,2-萘醌 - 二叠氮基-5-（和/或-4-）磺酸盐：
（I）其中R 1至R 11相同或不同，并且各自表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或环烷基，条件是R 1至R 11中的至少一个 R11为环烷基; A表示-CH（R 12） - ，其中R 12表示氢原子或烷基; m表示2或3。
-
-
-
-
-
-
-
-
-
搜索结果
163 条记录 (耗时 0.036 秒)
