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20 条记录 (耗时 0.028 秒)

    Wire-cut electrical discharge machine with electric shock preventer
    12.
    发明授权
    Wire-cut electrical discharge machine with electric shock preventer 失效
    线切割放电机带防电击器

    公开(公告)号：US4880957A

    公开(公告)日：1989-11-14

    申请号：US298606

    申请日：1988-11-29

    申请人： Toshiyuki Aso ,  Hiroshi Hosoda

    发明人： Toshiyuki Aso ,  Hiroshi Hosoda

    IPC分类号： B23H7/02 ,  B23H11/00

    CPC分类号： B23H7/02

    摘要： A wire-cut electrical discharge machine having a device for preventing an accident due to an electrical shock, wherein a guide roller (34a) disposed just before a collection box (38) for collecting a used electrode wire (30) passed through an electrospark machining area (36) is attached to a base plate (56) made of a conductive material, the base plate being fixed to a machine body (26) through an insulating plate (58), and a current leaking to the base plate caused by a disturbance of the running of the electrode wire is led to a safety circuit (50) through a lead wire (52), and a current leakage signal is output whereby an electric power supply of a electric power source (51) is rapidly stopped to prevent an accident due to an electric shock.

    Positive photoresist compositions and multilayer resist materials using the same
    14.
    发明授权
    Positive photoresist compositions and multilayer resist materials using the same 失效
    正型光致抗蚀剂组合物和使用其的多层抗蚀剂材料

    公开(公告)号：US5728504A

    公开(公告)日：1998-03-17

    申请号：US652389

    申请日：1996-05-23

    申请人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    发明人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    IPC分类号： G03F7/11 ,  G03F7/022 ,  G03F7/26 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II): --SO.sub.2 --R.sup.5 (II) where R.sup.5 is a substituted or unsubstituted alkyl group, an alkenyl group or a substituted or unsubstituted aryl group, thereby forming a mixed ester, and a multilayer resist material in which a positive photoresist layer formed of said positive photoresist composition is provided on an anti-reflective coating over a substrate are capable of forming high-resolution resist patterns with good cross-sectional profiles and permit a wider margin of exposure and better depth-of-focus characteristics.

    摘要翻译： 一种正性光致抗蚀剂组合物，其包含（A）碱溶性树脂和（B）包含至少一种由以下通式（I）表示的化合物的光敏性组分：其中R 1，R 2和R 3是 各自独立地为氢原子，具有1-3个碳原子的烷基或具有1-3个碳原子的烷氧基; R4是氢原子或具有1-3个碳原子的烷基; a，b和c为1-3的整数; l，m和n是1-3的整数，其中存在的羟基的至少一部分与醌二叠氮磺酸和具有下式（II）表示的基团的磺酸酯化：-SO 2 -R 5 （II）其中R5是取代或未取代的烷基，烯基或取代或未取代的芳基，从而形成混合酯，以及多层抗蚀剂材料，其中由所述正性光致抗蚀剂组合物形成的正性光致抗蚀剂层设置在 衬底上的抗反射涂层能够形成具有良好横截面轮廓的高分辨率抗蚀剂图案，并允许更宽的曝光余量和更好的聚焦深度特性。

    Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
    15.
    发明授权
    Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound 失效
    含有三苯甲烷化合物的1,2-萘醌二叠氮化物酯化产物的正性感光性树脂组合物

    公开(公告)号：US5401605A

    公开(公告)日：1995-03-28

    申请号：US282772

    申请日：1994-07-29

    申请人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    发明人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.

    摘要翻译： 提出了在光刻图案工作中适合作为光致抗蚀剂的正性感光性树脂组合物，用于制造例如具有优异的储存稳定性的半导体器件，并且能够给出具有优异的图像对比度的图案化抗蚀剂层， 线图形的横截面轮廓和耐热性以及令人满意的高光敏性和大的聚焦纬度。 该组合物与作为成膜剂的碱溶性酚醛清漆树脂的混合物包含作为其中两个羟基苯基各自具有环己基基团的特定三（羟基苯基）甲烷化合物的酯化产物的光敏剂 在指定位置与至少一个萘醌-1,2-二叠氮基磺酰基作为酯化基。

    Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
    17.
    发明授权
    Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound 失效
    含有环己基取代的三苯基甲烷化合物的正性醌二叠氮化物光致抗蚀剂组合物

    公开(公告)号：US5501936A

    公开(公告)日：1996-03-26

    申请号：US362857

    申请日：1994-12-23

    申请人： Hiroshi Hosoda ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    发明人： Hiroshi Hosoda ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/0226

    摘要： An improved positive-working photoresist composition useful in the fine patterning work of a resist layer is proposed which is capable of giving a patterned resist layer having excellent resolution, heat resistance and orthogonality of the cross sectional profile of a line pattern with a high sensitivity to actinic rays and a wide range of the focusing depth. The photoresist composition comprises, as a uniform mixture in the form of a solution, (a) an alkali-soluble novolac resin, (b) a naphthoquinone-1,2-diazido group-containing compound as a photosensitizing ingredient and (c) a specific phenolic triphenyl methane compound substituted by cyclohexyl groups on two of the phenyl groups, such as bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenyl methane or bis(3-cyclohexyl-6-hydroxy-4-methylphenyl)-3,4-dihydroxyphenyl methane, in a specified amount.

    摘要翻译： 提出了可用于抗蚀剂层的精细图案化工作的改进的正性光致抗蚀剂组合物，其能够提供具有高灵敏度的线图案的横截面轮廓的优异分辨率，耐热性和正交性的图案化抗蚀剂层 光化射线和广泛的聚焦深度。 光致抗蚀剂组合物包含作为溶液形式的均匀混合物，（a）碱溶性酚醛清漆树脂，（b）含萘醌-1,2-二叠氮基化合物作为光敏成分，（c） 在两个苯基上的环己基取代的特异性酚类三苯基甲烷化合物，例如双（3-环己基-4-羟基-6-甲基苯基）-3,4-二羟基苯基甲烷或双（3-环己基-6-羟基 - 4-甲基苯基）-3,4-二羟基苯基甲烷。

    Fluid level adjusting apparatus in an electric discharge machining tank
    20.
    发明授权
    Fluid level adjusting apparatus in an electric discharge machining tank 失效
    液体水平调节装置在电动排料机

    公开(公告)号：US5223688A

    公开(公告)日：1993-06-29

    申请号：US777527

    申请日：1991-12-05

    申请人： Hiroshi Hosoda ,  Toshiyuki Aso

    发明人： Hiroshi Hosoda ,  Toshiyuki Aso

    IPC分类号： B23H1/10 ,  B23H7/36

    CPC分类号： B23H7/36 ,  B23H1/10 ,  Y10T137/86236

    摘要： A fluid level adjusting apparatus in an electric discharge machining tank includes an exhaust pipe connected to a machining fluid exhaust port of the machining tank, an adjustment pipe having an upper opening end and a lower opening end connected to the exhaust pipe and height adjusting apparatus automatically adjusting the height of the upper opening end of the adjustment pipe so that machining fluid in the electric discharge machining tank is drained out of the machining tank through the upper opening end of the adjustment pipe to maintain the fluid level of the machining fluid at the height of the upper opening end. The height adjusting apparatus includes a driving section for generating a rotating force, a transmission section connected to the driving section for transmitting the rotary driving force, a converting section connected to the transmission section for converting the transmitted rotary driving force into a linear force for adjusting the height of the adjustment pipe upper end and a controlling section for delivering fluid level adjusting command data to the driving section.

    摘要翻译： PCT No.PCT / JP91 / 00454 Sec。 371 1991年12月5日第 102（e）1991年12月5日，PCT提交1990年4月5日PCT公布。 出版物WO91 / 15325 日期：1991年10月17日。放电加工槽中的液位调节装置包括连接到加工槽的加工流体排出口的排气管，具有上开口端和下开口端的调节管， 排气管和高度调节装置自动调节调节管的上开口端的高度，使得放电加工槽中的机加工液通过调节管的上开口端排出加工槽，以保持液位 在上开口端的高度处的加工液。 高度调节装置包括用于产生旋转力的驱动部分，连接到用于传递旋转驱动力的驱动部分的传动部分，连接到传动部分的转换部分，用于将传递的旋转驱动力转换成用于调节的直线力 调节管上端的高度和用于将流量水平调节指令数据输送到驱动部的控制部。