公开(公告)号：US4860374A

公开(公告)日：1989-08-22

申请号：US218503

申请日：1988-07-06

申请人： Seiro Murakami ,  Akikazu Tanimoto ,  Susumu Makinouchi ,  Hidemi Kawai ,  Masaichi Murakami

发明人： Seiro Murakami ,  Akikazu Tanimoto ,  Susumu Makinouchi ,  Hidemi Kawai ,  Masaichi Murakami

IPC分类号： G03F9/00 ,  G06K9/46

CPC分类号： G03F9/70 ,  G06K9/4609

摘要： An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.

摘要翻译： 用于检测形成在衬底中的与光掩模图案对准的参考图案或标记的位置的装置执行以下功能：扫描具有至少两个边缘的参考图案，并产生与扫描图案对应的时间序列图案信号 ; 提取在包括图案的预定扫描范围内图案信号的波形具有与图案的边缘相对应的形状的所有扫描位置; 根据由每对定义的两个扫描位置之间的图案信号满足预定波形条件的程度，从多个提取的扫描位置的所有可能的对中选择一对; 并且将所选择的对的两个扫描位置之间的间隔被划分成两个间​​隔预定比例的预定位置作为图案位置。

公开(公告)号：US4702606A

公开(公告)日：1987-10-27

申请号：US737434

申请日：1985-05-24

申请人： Toshio Matsuura ,  Seiro Murakami ,  Yuji Imai ,  Kazuya Ohta ,  Akikazu Tanimoto

发明人： Toshio Matsuura ,  Seiro Murakami ,  Yuji Imai ,  Kazuya Ohta ,  Akikazu Tanimoto

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7049 ,  G03F7/70358

摘要： An alignment system includes an element bearing a plurality of patterns on the surface thereof, the plurality of patterns being arranged in a predetermined direction, a stage for holding the element, scanning means for scanning the plurality of patterns of the element held by the stage in the predetermined direction and making position signals indicative of the positions of the plurality of patterns in the predetermined direction on the element, and operation means for operating and putting out a signal indicative of a position which is in a predetermined relation with the positions of the plurality of patterns in the predetermined direction, on the basis of the position signals.

摘要翻译： 对准系统包括在其表面上具有多个图案的元件，多个图案沿预定方向布置，用于保持元件的台架，用于扫描由台架保持的元件的多个图案的扫描装置 所述预定方向和指示所述多个图案在所述元件上的所述预定方向上的位置的位置信号，以及操作装置，用于操作和输出指示与所述多个位置相关的预定关系的位置的信号 的图案在预定方向上，基于位置信号。

公开(公告)号：US06894763B2

公开(公告)日：2005-05-17

申请号：US10424815

申请日：2003-04-29

申请人： Seiro Murakami ,  Takaharu Miura ,  Akikazu Tanimoto ,  Yutaka Ichihara ,  Hideo Mizutani

发明人： Seiro Murakami ,  Takaharu Miura ,  Akikazu Tanimoto ,  Yutaka Ichihara ,  Hideo Mizutani

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/54 ,  G03B27/62 ,  G01N21/86

CPC分类号： G03F7/7005 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70808

摘要： A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

摘要翻译： 在掩模台RS 1上的掩模和掩模上的掩模的状态下，同步移动掩模载台RS 1和基板载台WS 1，并且掩模载台RS 2和基板载台RS 2同步移动 分别用来自照明光学系统IOP1，IOP2的照明光束照射舞台RS 2。 通过使掩模载台RS 1和掩模载台RS 2相互相反的方向移动，可以抵消由于级的移动导致的基板上的反作用力，以抑制曝光装置的振动。 通过在曝光操作中同时进行基板台WS 3，WS 4的对准操作，能够提高通过量。

公开(公告)号：US4677301A

公开(公告)日：1987-06-30

申请号：US681843

申请日：1984-12-14

申请人： Akikazu Tanimoto ,  Toshio Matsuura ,  Seiro Murakami ,  Makoto Uehara ,  Kyoichi Suwa

发明人： Akikazu Tanimoto ,  Toshio Matsuura ,  Seiro Murakami ,  Makoto Uehara ,  Kyoichi Suwa

IPC分类号： G03B27/53 ,  B65G1/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01N21/86 ,  H01J3/14

CPC分类号： G03F9/70

摘要： A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.

摘要翻译： 位置对准装置以高精度和高精度对准感光基片和掩模（投影图象）。 该装置具有用于将掩模或掩模版上的图案图像投影到感光基板上的投影光学系统，用于检测投影图案图像和晶片的二维未对准的检测器，以及用于沿正交x轴移动晶片的装置， 和y轴方向，并且用于在由x轴方向和y轴方向限定的平面内沿着旋转方向旋转晶片，以消除所述未对准，其中所述检测器具有第一检测装置，其具有用于检测至少一个 晶片沿着x轴方向通过投影透镜偏移，以及第二检测装置，其具有与投影透镜分离的光学系统，并用于至少检测晶片沿旋转方向的不对准。

公开(公告)号：US4639604A

公开(公告)日：1987-01-27

申请号：US851293

申请日：1986-04-04

申请人： Seiro Murakami ,  Muneki Hamajima

发明人： Seiro Murakami ,  Muneki Hamajima

IPC分类号： G01B11/02 ,  G01N21/86 ,  G01V9/04

CPC分类号： G01B11/02

摘要： Disclosed is a system for the signal processing of pattern profile information detected by optically or electronically scanning a pattern on an object such as a semiconductor wafer or a mask. The system includes a pattern information detector responsive to the scanning to generate an electric detection signal of a time series corresponding to the pattern along the scanning direction, position detecting means for generating a position signal discriminative for example of the direction of scanning each time the scanning advances a predetermined unit amount, and sampling extract means responsive to the position signals to successively sample the detection signal and obtain digital data of the pattern excluding any overlapping data of the pattern sampled at the same positions whereby even if the scanning involves minute oscillations of the scanning speed, the resulting noise in the detection signal is eliminated and an accurate pattern information signal corresponding to the absolute positions is extracted.

摘要翻译： 公开了一种用于通过光学或电子扫描诸如半导体晶片或掩模等物体上的图案检测的图案图案信息的信号处理的系统。 该系统包括响应于扫描的图形信息检测器，以产生对应于沿着扫描方向的图案的时间序列的电检测信号，位置检测装置，用于在每次扫描时产生例如扫描方向的位置信号，例如扫描方向 前进预定单位量，以及响应于位置信号的采样提取装置连续采样检测信号，并获得除了在相同位置采样的模式的任何重叠数据之外的模式的数字数据，由此即使扫描涉及微波振荡 扫描速度，消除了检测信号中产生的噪声，并且提取了与绝对位置相对应的精确图案信息信号。