-
公开(公告)号：US4702606A
公开(公告)日：1987-10-27
申请号：US737434
申请日：1985-05-24
申请人： Toshio Matsuura , Seiro Murakami , Yuji Imai , Kazuya Ohta , Akikazu Tanimoto
发明人： Toshio Matsuura , Seiro Murakami , Yuji Imai , Kazuya Ohta , Akikazu Tanimoto
CPC分类号： G03F9/7049 , G03F7/70358
摘要： An alignment system includes an element bearing a plurality of patterns on the surface thereof, the plurality of patterns being arranged in a predetermined direction, a stage for holding the element, scanning means for scanning the plurality of patterns of the element held by the stage in the predetermined direction and making position signals indicative of the positions of the plurality of patterns in the predetermined direction on the element, and operation means for operating and putting out a signal indicative of a position which is in a predetermined relation with the positions of the plurality of patterns in the predetermined direction, on the basis of the position signals.
摘要翻译： 对准系统包括在其表面上具有多个图案的元件，多个图案沿预定方向布置，用于保持元件的台架，用于扫描由台架保持的元件的多个图案的扫描装置 所述预定方向和指示所述多个图案在所述元件上的所述预定方向上的位置的位置信号，以及操作装置，用于操作和输出指示与所述多个位置相关的预定关系的位置的信号 的图案在预定方向上，基于位置信号。
-
公开(公告)号：US4655598A
公开(公告)日：1987-04-07
申请号：US799262
申请日：1985-11-18
申请人： Seiro Murakami , Toshio Matsuura , Yuji Imai , Kazuya Ohta
发明人： Seiro Murakami , Toshio Matsuura , Yuji Imai , Kazuya Ohta
CPC分类号： G03F9/7076 , G03F9/7049
摘要： Position detecting method and a apparatus detect a position of substrate formed with a diffraction grating mark and a linearly extending stepped edge mark spaced from the diffraction grating. In the method and apparatus, those marks are relatively scanned by light beam, and position of the substrate is detected based on light information generated by both the marks and the scanning position.
摘要翻译： 位置检测方法和装置检测由衍射光栅标记形成的基板的位置和与衍射光栅间隔开的线性延伸的阶梯状边缘标记。 在该方法和装置中，这些标记被光束相对扫描，并且基于由标记和扫描位置产生的光信息来检测基板的位置。
-
公开(公告)号：US4677301A
公开(公告)日：1987-06-30
申请号：US681843
申请日：1984-12-14
CPC分类号： G03F9/70
摘要： A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.
摘要翻译： 位置对准装置以高精度和高精度对准感光基片和掩模（投影图象）。 该装置具有用于将掩模或掩模版上的图案图像投影到感光基板上的投影光学系统，用于检测投影图案图像和晶片的二维未对准的检测器，以及用于沿正交x轴移动晶片的装置， 和y轴方向，并且用于在由x轴方向和y轴方向限定的平面内沿着旋转方向旋转晶片，以消除所述未对准，其中所述检测器具有第一检测装置，其具有用于检测至少一个 晶片沿着x轴方向通过投影透镜偏移，以及第二检测装置，其具有与投影透镜分离的光学系统，并用于至少检测晶片沿旋转方向的不对准。
-
4.发明授权Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same 失效利用能够沿相反方向移动的多个掩模和物体台的曝光装置和方法，以及使用其的装置的制造方法公开(公告)号：US06894763B2
公开(公告)日：2005-05-17
申请号：US10424815
申请日：2003-04-29
CPC分类号： G03F7/7005 , G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F7/70716 , G03F7/70733 , G03F7/70808
摘要： A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.
摘要翻译： 在掩模台RS 1上的掩模和掩模上的掩模的状态下，同步移动掩模载台RS 1和基板载台WS 1，并且掩模载台RS 2和基板载台RS 2同步移动 分别用来自照明光学系统IOP1，IOP2的照明光束照射舞台RS 2。 通过使掩模载台RS 1和掩模载台RS 2相互相反的方向移动，可以抵消由于级的移动导致的基板上的反作用力，以抑制曝光装置的振动。 通过在曝光操作中同时进行基板台WS 3，WS 4的对准操作，能够提高通过量。
-
公开(公告)号：US4860374A
公开(公告)日：1989-08-22
申请号：US218503
申请日：1988-07-06
CPC分类号： G03F9/70 , G06K9/4609
摘要： An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.
摘要翻译： 用于检测形成在衬底中的与光掩模图案对准的参考图案或标记的位置的装置执行以下功能：扫描具有至少两个边缘的参考图案，并产生与扫描图案对应的时间序列图案信号 ; 提取在包括图案的预定扫描范围内图案信号的波形具有与图案的边缘相对应的形状的所有扫描位置; 根据由每对定义的两个扫描位置之间的图案信号满足预定波形条件的程度，从多个提取的扫描位置的所有可能的对中选择一对; 并且将所选择的对的两个扫描位置之间的间隔被划分成两个间隔预定比例的预定位置作为图案位置。
-
公开(公告)号：US5448332A
公开(公告)日：1995-09-05
申请号：US345325
申请日：1994-11-21
CPC分类号： G03F7/70358 , G03F9/7026
摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.
-
公开(公告)号：US06608681B2
公开(公告)日：2003-08-19
申请号：US10186687
申请日：2002-07-02
申请人： Yasuaki Tanaka , Seiro Murakami , Kenji Nishi
发明人： Yasuaki Tanaka , Seiro Murakami , Kenji Nishi
IPC分类号： G01B1100
CPC分类号： G03F7/70358 , G03F9/7026
摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.
-
公开(公告)号：US5693439A
公开(公告)日：1997-12-02
申请号：US482555
申请日：1995-06-07
申请人： Yasuaki Tanaka , Seiro Murakami , Kenji Nishi
发明人： Yasuaki Tanaka , Seiro Murakami , Kenji Nishi
CPC分类号： G03F7/70358 , G03F9/7026
摘要： An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.
摘要翻译： 用于通过步进重复方案将形成在掩模上的图案曝光在感光基板上的多个分隔区域中的图案的装置包括投影光学系统，用于将掩模的图案投影在感光基板上， 用于保持感光基板并在与投影光学系统的光轴垂直的平面内二维移动感光基板的检测单元，用于将具有预定形状的图案图像投影到感光基板上并将光反射的光电检测 通过所述感光基板沿着所述投影光学系统的光轴检测所述感光性基板上的多个点的位置，以及测量单元，其用于当分割区域中的多个测量点中的每一个 掩模的图案下一个曝光与图案图像重合或接近图案图像 在基板载台的步进操作期间，将投影光学系统的成像面与沿着光轴的下一个分割区域之间的偏移量切除，其中成像平面和下一个分割区域沿着光轴相对移动 在掩模的图案之前测量的偏移量暴露在下一个分割区域上。
-
公开(公告)号：US5739899A
公开(公告)日：1998-04-14
申请号：US649815
申请日：1996-05-17
申请人： Kenji Nishi , Seiro Murakami , Hiroshi Chiba
发明人： Kenji Nishi , Seiro Murakami , Hiroshi Chiba
CPC分类号： G03F9/7019 , A61K38/395 , G03F7/70066 , G03F7/701 , G03F7/70125 , G03F7/70258 , G03F7/70358 , G03F7/70691 , G03F9/7011 , G03F9/7026 , G03F9/7034
摘要： A projection exposure apparatus wherein a pattern formed on a mask is projected onto a substrate through a projection optical system. The apparatus has an illumination optical system for illuminating the mask by exposure light, and a first adjusting member which is disposed in the illumination optical system to change telecentricity on the substrate. The apparatus further has a second adjusting member for adjusting at least one of the position of the substrate in the direction of an optical axis of the projection optical system and the tilt of the substrate, and a control system for controlling the first and second adjusting members. The control system locally corrects the position of a spatial image formed by the projection optical system.
摘要翻译： 投影曝光装置，其中通过投影光学系统将形成在掩模上的图案投影到基板上。 该装置具有用于通过曝光来照射掩模的照明光学系统，以及设置在照明光学系统中以改变基板上的远心度的第一调节构件。 该装置还具有第二调节构件，用于调整基板在投影光学系统的光轴方向上的位置和基板的倾斜中的至少一个以及用于控制第一和第二调节构件的控制系统 。 控制系统局部校正由投影光学系统形成的空间图像的位置。
-
公开(公告)号：US5464715A
公开(公告)日：1995-11-07
申请号：US217841
申请日：1994-03-25
申请人： Kenji Nishi , Seiro Murakami
发明人： Kenji Nishi , Seiro Murakami
CPC分类号： G03F7/70358 , G03F7/70775 , G03F9/70
摘要： In a scanning-type projection exposure system, curvature of a movable mirror that is used to measure mask stage coordinate positions is determined while the mask stage is moved in the scanning direction, by measuring coordinate positions, perpendicular to the scan direction, of the mask stage and of a mask mark elongated in the scan direction. The results of the measurements are used for correcting or compensating positional deviation during scanning. Rotational deviation of a mask pattern area is determined and is corrected or compensated. Also, a mask is aligned with respect to a coordinate system of the mask stage as pre-processing for exposure, using a mask alignment mark having two crossing linear patterns and determining a coordinate position of the crossing point by moving the mask relative to an observation area.
-
-
-
-
-
-
-
-
-
搜索结果
15 条记录 (耗时 0.027 秒)
