公开(公告)号：US08286350B2

公开(公告)日：2012-10-16

申请号：US12699995

申请日：2010-02-04

申请人： Tsuyoshi Takahashi ,  Shuji Koyama ,  Masaki Ohsumi ,  Masahisa Watanabe

发明人： Tsuyoshi Takahashi ,  Shuji Koyama ,  Masaki Ohsumi ,  Masahisa Watanabe

IPC分类号： B21D53/76

CPC分类号： B41J2/1635 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  Y10T29/49083 ,  Y10T29/49128 ,  Y10T29/4913 ,  Y10T29/49165 ,  Y10T29/49401

摘要： An object of the invention is to provide a method of manufacturing a liquid discharge head in which a distance between a discharge opening and an energy generating element is uniform, simply and with good precision.

摘要翻译： 本发明的目的是提供一种制造排液头的方法，其中排放口和能量产生元件之间的距离是简单且精确的。

公开(公告)号：US20120088317A1

公开(公告)日：2012-04-12

申请号：US13226113

申请日：2011-09-06

申请人： Keisuke Kishimoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Taichi Yonemoto

发明人： Keisuke Kishimoto ,  Shuji Koyama ,  Hiroyuki Abo ,  Taichi Yonemoto

IPC分类号： H01L21/308

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1639

摘要： A processing method of a silicon substrate, including forming on a back surface of a silicon substrate an etching mask layer having an opening portion, measuring a thickness of the silicon substrate, irradiating the opening portion in the etching mask layer with laser from the back surface of the silicon substrate to form in the silicon substrate a modified layer with a thickness that is varied according to the measured thickness of the silicon substrate, carrying out anisotropic etching with regard to the silicon substrate having the modified layer formed therein to form in the back surface a depressed portion which does not pass through the silicon substrate and which has a bottom surface in the silicon substrate, and carrying out dry etching in the depressed portion to form a through-hole passing from the bottom surface of the depressed portion to a front surface of the silicon substrate.

摘要翻译： 一种硅衬底的处理方法，包括在硅衬底的背表面上形成具有开口部分的蚀刻掩模层，测量硅衬底的厚度，用激光从背面照射蚀刻掩模层中的开口部分 的硅衬底，以在硅衬底中形成具有根据测量的硅衬底的厚度而变化的厚度的改性层，相对于其中形成有改性层的硅衬底进行各向异性蚀刻以在背面形成 表面没有通过硅衬底并且在硅衬底中具有底表面的凹陷部分，并且在凹陷部分中进行干蚀刻以形成从凹陷部分的底表面到前面的通孔 硅衬底的表面。

公开(公告)号：US07824560B2

公开(公告)日：2010-11-02

申请号：US11679656

申请日：2007-02-27

申请人： Toshiyasu Sakai ,  Shuji Koyama ,  Kenji Ono ,  Jun Yamamuro

发明人： Toshiyasu Sakai ,  Shuji Koyama ,  Kenji Ono ,  Jun Yamamuro

IPC分类号： B41J2/16

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1645 ,  H01L21/76898

摘要： A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.

摘要翻译： 一种用于喷墨头的基​​板的制造方法，包括在硅基板中形成供墨口，该方法包括以下步骤：在基板的一侧上形成在相应位置具有开口的蚀刻掩模层 供墨口; 通过蚀刻掩模层的开口沿开口的纵向至少两行形成未穿透孔的步骤; 以及通过在开口中的基板的晶体各向异性蚀刻形成供墨口的步骤。

公开(公告)号：US20100147793A1

公开(公告)日：2010-06-17

申请号：US12635083

申请日：2009-12-10

申请人： Tadanobu Nagami ,  Junichi Kobayashi ,  Takeshi Terada ,  Makoto Watanabe ,  Hiroyuki Abo ,  Mitsunori Toshishige ,  Yoshinori Tagawa ,  Shuji Koyama ,  Kenji Fujii ,  Masaki Ohsumi ,  Jun Yamamuro ,  Hiroyuki Murayama ,  Yoshinobu Urayama ,  Taichi Yonemoto

发明人： Tadanobu Nagami ,  Junichi Kobayashi ,  Takeshi Terada ,  Makoto Watanabe ,  Hiroyuki Abo ,  Mitsunori Toshishige ,  Yoshinori Tagawa ,  Shuji Koyama ,  Kenji Fujii ,  Masaki Ohsumi ,  Jun Yamamuro ,  Hiroyuki Murayama ,  Yoshinobu Urayama ,  Taichi Yonemoto

IPC分类号： G11B5/127

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  Y10T29/49401

摘要： The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer.

摘要翻译： 本发明提供了一种液体排出头的制造方法，该液体排出头包括硅基板，该第一表面在第一表面上具有能量产生元件和从第一表面穿过该基板的供给口， 基片的第一表面。 该方法包括以下步骤：在要形成供墨口的第一表面上的一部分制备具有牺牲层的硅衬底和在第二表面上具有多个开口的蚀刻掩模层， 牺牲层的与相邻的两个开口之间的部分相对应的位置处的部分比对应于开口的位置处的牺牲层的一部分的体积小; 从多个开口蚀刻硅衬底并蚀刻牺牲层。

公开(公告)号：US20100102473A1

公开(公告)日：2010-04-29

申请号：US12574352

申请日：2009-10-06

申请人： Masahisa Watanabe ,  Shuji Koyama ,  Kenji Ono ,  Kenji Fujii ,  Shuhei Oya ,  Seiko Minami

发明人： Masahisa Watanabe ,  Shuji Koyama ,  Kenji Ono ,  Kenji Fujii ,  Shuhei Oya ,  Seiko Minami

IPC分类号： B29C41/50 ,  B29C41/38

CPC分类号： B29C41/36 ,  B29C41/38 ,  B29C41/50 ,  B29L2031/756 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1645

摘要： A method of manufacturing a liquid discharge head including a flow path member for forming a flow path communicating with a discharge port discharging a liquid forms a mold of the flow path made of a positive photosensitive resin on a substrate; applies a coated layer on the mold for forming the flow path member, which coated layer includes a solvent, an epoxy resin, and a curing agent of the epoxy resin; removes the solvent from the coated layer at a normal temperature under substantially 1 atm. so that the weight of the coated layer may become 93% or less of that of the coated layer at a time of the applying of the coated layer, and then further removes the solvent from the coated layer under a depressurized condition; cures the coated layer; and removes the mold to form the flow path.

摘要翻译： 一种液体排出头的制造方法，其特征在于，具有形成与排出液体的排出口连通的流路的流路部件，在基板上形成由正性感光性树脂构成的流路的模具， 在模具上涂覆涂层以形成流路构件，该涂层包括溶剂，环氧树脂和环氧树脂的固化剂; 在常温下在大约1atm下从涂层中除去溶剂。 使得在涂布涂层时涂层的重量可以变得比涂层的重量的93％以下，然后在减压条件下进一步从涂层中除去溶剂; 固化涂层; 并移除模具以形成流路。

公开(公告)号：US20080094454A1

公开(公告)日：2008-04-24

申请号：US11872383

申请日：2007-10-15

申请人： Shuji Koyama ,  Yoshiaki Suzuki ,  Satoshi Ibe ,  Hiroto Komiyama

发明人： Shuji Koyama ,  Yoshiaki Suzuki ,  Satoshi Ibe ,  Hiroto Komiyama

IPC分类号： B41J2/05 ,  B21D53/76

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1643 ,  B41J2/1645 ,  Y10T29/49401

摘要： A manufacturing method for an ink jet recording head including an energy generating element for generating energy for ejecting ink, wiring and electrode pad for supplying electric power to the energy generating element, and a flow path formation member in which an ink flow path is formed in fluid communication with an ink ejection outlet, the manufacturing method includes a step of preparing a substrate on which the energy generating element, the wiring and the electrode pad have been formed; a step of forming a protection layer covering edges of and around generating element and the electrode pad; a step of forming, with patterning, an adhesion layer for adhering the flow path formation member to a surface of the substrate through the protection layer, on a portion of the protection layer where the flow path formation member is formed and a portion surrounding the electrode pad; a step forming through an electroless plating, a nickel layer covering the electrode pad and a gold layer covering the nickel layer to provide a bump.

摘要翻译： 一种喷墨记录头的制造方法，包括：用于产生用于喷射油墨的能量的能量产生元件，用于向能量产生元件供应电力的布线和电极焊盘;以及流路形成部件，其中形成有墨水流路 与喷墨口流体连通，该制造方法包括制备其上形成有能量产生元件，布线和电极垫的基板的步骤; 形成覆盖发电元件和电极焊盘周围的周围的保护层的工序; 通过图案化形成用于通过保护层将流路形成部件粘附到基板的表面的粘合层的步骤，在形成有流路形成部件的保护层的一部分和围绕电极的部分 垫; 通过无电解电镀形成步骤，覆盖电极焊盘的镍层和覆盖镍层的金层以提供凸块。

公开(公告)号：US07300596B2

公开(公告)日：2007-11-27

申请号：US11481796

申请日：2006-07-07

申请人： Hiroyuki Murayama ,  Shuji Koyama ,  Yoshinori Tagawa ,  Kenji Fujii ,  Masaki Ohsumi ,  Yoshinobu Urayama ,  Jun Yamamuro ,  Tsuyoshi Takahashi ,  Masahisa Watanabe

发明人： Hiroyuki Murayama ,  Shuji Koyama ,  Yoshinori Tagawa ,  Kenji Fujii ,  Masaki Ohsumi ,  Yoshinobu Urayama ,  Jun Yamamuro ,  Tsuyoshi Takahashi ,  Masahisa Watanabe

IPC分类号： B41J2/05 ,  H01L21/00

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/164 ,  B41J2/1645

摘要： The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.

摘要翻译： 制造记录头的方法具有流路壁形成步骤，在其上形成有能量产生元件的基板上形成流路壁，嵌入材料沉积步骤，在流路壁之间和每个顶部上沉积嵌入材料 流动路径壁，抛光沉积的嵌入材料的顶部的平坦化步骤，直到流动路径壁的顶部被暴露，以及在抛光的嵌入材料的顶部上形成孔板的步骤和暴露的流动路径壁 。 在形成流路壁的步骤中，同时进行紧密接触性改善层的图案化，以改善流路壁和基板之间的紧密接触性。

公开(公告)号：US07287847B2

公开(公告)日：2007-10-30

申请号：US10990492

申请日：2004-11-18

申请人： Kenji Fujii ,  Shuji Koyama ,  Masaki Osumi ,  Shingo Nagata ,  Jun Yamamuro ,  Yoshinori Tagawa ,  Hiroyuki Murayama ,  Yoshinobu Urayama

发明人： Kenji Fujii ,  Shuji Koyama ,  Masaki Osumi ,  Shingo Nagata ,  Jun Yamamuro ,  Yoshinori Tagawa ,  Hiroyuki Murayama ,  Yoshinobu Urayama

IPC分类号： B41J2/175

CPC分类号： B41J2/1639 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1635 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2002/14403 ,  B41J2002/14475

摘要： A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is coated in such a manner that the first surface is not exposed from the plurality of holes on the first surface of the substrate; a step of forming a close contact enhancing layer on the membrane formed on the substrate; a step of forming a channel constituting member on the close contact enhancing layer to constitute a plurality of discharge ports and a plurality of ink channels communicating with the plurality of discharge ports; a step of forming an ink supply port communicating with the plurality of ink channels in the silicon substrate by anisotropic etching from a second surface facing the first surface of the substrate; and a step of forming a filter in a portion of the close contact enhancing layer positioned in an opening of the ink supply port using the layer of the membrane in which a plurality of holes are disposed as the mask.

摘要翻译： 一种制造喷墨头的喷墨头的方法，包括：制备硅衬底的步骤; 形成具有设置有多个孔的层以构成过滤掩模的膜的步骤，以及第一表面以不使第一表面从多个孔露出的方式涂覆有第一表面的层 衬底的第一表面; 在形成在基板上的膜上形成紧密接触增强层的工序; 在紧密接触增强层上形成通道构成构件以构成多个排出口和与多个排出口连通的多个墨水通道的步骤; 通过各向异性蚀刻形成与所述硅衬底中的所述多个墨通道连通的供墨口从与所述基板的所述第一表面相对的第二表面形成的步骤; 以及使用其中设置有多个孔作为掩模的膜层在位于供墨口的开口中的紧密接触增强层的一部分中形成过滤器的步骤。

公开(公告)号：US07255418B2

公开(公告)日：2007-08-14

申请号：US11299944

申请日：2005-12-13

申请人： Shuji Koyama ,  Teruo Ozaki ,  Shingo Nagata

发明人： Shuji Koyama ,  Teruo Ozaki ,  Shingo Nagata

IPC分类号： B41J2/015 ,  B41J2/135 ,  B41J2/04 ,  B41J2/05 ,  G01D15/00

CPC分类号： B41J2/1604 ,  B41J2/1603 ,  B41J2/1626 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  Y10T29/49401

摘要： An ink supply port is opened in an Si substrate on which an ink discharge energy generating element is formed, by anisotropic etching, from a back surface opposite to a surface on which the ink discharge energy generating element is formed. When the anisotropic etching is effected, OSF (oxidation induced laminate defect) is remained on the back surface of the Si substrate with OSF density equal to or greater than 2×104 parts/cm2 and a length of OSF equal to or greater than 2 μm.

摘要翻译： 在与形成有喷墨能量产生元件的表面相反的背面上，通过各向异性蚀刻在其上形成有喷墨能量产生元件的Si基板上打开供墨口。 当进行各向异性蚀刻时，OSF密度等于或大于2×10 4 / cm 2以上的Si衬底的背面上残留有OSF（氧化诱导层叠缺陷） >并且OSF的长度等于或大于2μm。

公开(公告)号：US20060098055A1

公开(公告)日：2006-05-11

申请号：US11261511

申请日：2005-10-31

申请人： Kenji Fujii ,  Shuji Koyama ,  Masaki Osumi ,  Jun Yamamuro ,  Hiroyuki Murayama

发明人： Kenji Fujii ,  Shuji Koyama ,  Masaki Osumi ,  Jun Yamamuro ,  Hiroyuki Murayama

IPC分类号： B41J2/05

CPC分类号： B41J2/1639 ,  B41J2/14129 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1642

摘要： The present invention permits to manufacture, with low cost and good through-put, a liquid discharge recording head in which a nozzle plate is formed from inorganic material. In the liquid discharge recording head according to the present invention, a nozzle plate formed from inorganic material is stacked on a front surface of a silicon substrate including heat generating resistant members for generating energy for discharging liquid and an electric circuit for driving the heat generating resistant members. The liquid can be supplied from a liquid supply port extending through the silicon substrate to flow paths provided between the silicon substrate and the nozzle plate. Recessed portions having predetermined depths are formed in a region of the surface of the silicon substrate, where the flow paths are formed, and discharge ports are formed above the recessed portions.

摘要翻译： 本发明允许以低成本和良好的通过量制造其中由无机材料形成喷嘴板的液体排出记录头。 在根据本发明的液体排出记录头中，由无机材料形成的喷嘴板堆叠在硅基板的前表面上，该硅基板包括用于产生排出液体的能量的产生发热性的部件和用于驱动发热电阻的电路 会员 液体可以从延伸穿过硅衬底的液体供应口提供到设置在硅衬底和喷嘴板之间的流动路径。 在硅基板的形成有流路的区域形成有规定深度的凹部，在凹部上形成排出口。