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公开(公告)号：US07061573B2
公开(公告)日：2006-06-13
申请号：US09829915
申请日：2001-04-11
申请人： Masami Tsukamoto
发明人： Masami Tsukamoto
CPC分类号： G03F7/70933 , G03F7/70883 , G03F7/70916
摘要： An exposure apparatus for illuminating a pattern with light from a light source and for exposing a predetermined surface with light from the pattern includes (i) a projection optical system for projecting the pattern onto the predetermined surface, the projection optical system having at least one optical element having optical surfaces, and (ii) a gas supplying device for locally supplying a gas to the at least one optical element. In one aspect, the gas supplying device directly blows the gas toward one of the optical surfaces of the at least one optical element, which is closest to the predetermined surface, from the predetermined surface side.
摘要翻译： 一种用于利用来自光源的光照射图案并且用于使来自图案的光暴露预定表面的曝光装置包括（i）用于将图案投影到预定表面上的投影光学系统，该投影光学系统具有至少一个光学 具有光学表面的元件，和（ii）用于向至少一个光学元件局部供应气体的气体供给装置。 在一个方面，气体供给装置将气体直接从预定表面侧吹送至最靠近预定表面的至少一个光学元件的光学表面之一。
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公开(公告)号：US06819396B1
公开(公告)日：2004-11-16
申请号：US09712979
申请日：2000-11-16
IPC分类号： G03B2752
CPC分类号： G03F7/70983 , G03F7/70883
摘要： Disclosed is an exposure apparatus which includes an optical element, a gas supplying unit for supplying a predetermined gas around the optical element, and an organic compound decomposition mechanism for decomposing an organic compound in the gas. This structure prevents adhesion of organic compounds to the optical element without a necessity of using many filters in combination.
摘要翻译： 公开了一种曝光装置，其包括光学元件，用于在光学元件周围提供预定气体的气体供给单元和用于分解气体中的有机化合物的有机化合物分解机构。 这种结构防止有机化合物粘附到光学元件上，而不需要组合使用许多过滤器。
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公开(公告)号：US06642528B2
公开(公告)日：2003-11-04
申请号：US09986563
申请日：2001-11-09
申请人： Mitsuaki Amemiya , Masami Tsukamoto
发明人： Mitsuaki Amemiya , Masami Tsukamoto
IPC分类号： H01J3730
CPC分类号： G03F9/7053 , G03F7/70233 , H01J37/3045 , H01J2237/3175
摘要： An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beams having the accelerating voltage set in the setting step, and detecting one of radiation and electrons from the substrate after the irradiating step is performed, and determining the position of the alignment mark based on the detecting operation. The apparatus includes a device for setting such an accelerating voltage, a device for irradiating the substrate with the electron beams, and a detector for detecting one of the radiation and the electrons. In one embodiment, fluorescent X-rays are detected, while in another embodiment secondary electrons or backscattered electrons are detected.
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公开(公告)号：US06584168B2
公开(公告)日：2003-06-24
申请号：US10092280
申请日：2002-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray exposure apparatus operating in a vacuum or a reduced-pressure environment includes a mask, arranged in the vacuum or in the reduced-pressure environment, for holding a reflection X-ray mask having a mask pattern thereon, an X-ray illuminating system arranged so as to illuminate the reflection X-ray mask having the mask pattern thereon, relatively scanningly with X-rays, wherein the mask pattern being illuminated is transferred onto an object, and a cooling structure for cooling the X-ray mask held by the mask chuck.
摘要翻译： 在真空或减压环境中工作的X射线曝光装置包括在真空中或在减压环境中布置的用于保持其上具有掩模图案的反射X射线掩模的掩模，X射线 照明系统，其被布置成以X射线相对扫描地照射其上具有掩模图案的反射X射线掩模，其中照射的掩模图案被转印到物体上，并且用于冷却所述X射线掩模的冷却结构 通过面罩卡盘。
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公开(公告)号：US06310934B1
公开(公告)日：2001-10-30
申请号：US09342897
申请日：1999-06-29
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
摘要翻译： X射线投影曝光装置包括：掩模卡盘，用于保持其上具有掩模图案的反射X射线掩模，在掩模和掩模卡盘之间形成空隙;晶片卡盘，用于保持掩模图案是 转移了用于照射由掩模卡盘保持的反射X射线掩模的X射线照射系统的X射线，用于将反射X射线掩模的掩模图案投影到晶片上的X射线投影光学系统 由晶片卡盘以预定的放大率保持，以及用于将形成在掩模和掩模卡盘之间的空隙供给用于冷却掩模的冷却气体的供给。
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16.发明授权X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device 失效X射线产生装置，以及使用该X射线产生装置的曝光装置和半导体装置制造方法
公开(公告)号：US6038279A
公开(公告)日：2000-03-14
申请号：US730999
申请日：1996-10-16
申请人： Akira Miyake , Masami Tsukamoto
发明人： Akira Miyake , Masami Tsukamoto
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033
摘要： An X-ray generating device employing a laser-excited plasma light source has a plurality of luminescent points, or a luminescent portion the form of which is variable in terms of the configuration, size, position and the number of luminescent points. An object such as a mask is illuminated by X-rays generated from the light source under Kohler's illumination conditions. Also disclosed are an X-ray generating method using such a device, as well as a method of producing a semiconductor device.
摘要翻译： 采用激光激发等离子体光源的X射线产生装置具有多个发光点或发光部分，其形状在发光点的形状，大小，位置和数量上是可变的。 在K + E，uml o + EE hler的照明条件下，由光源产生的X射线照射诸如掩模的物体。 还公开了使用这种器件的X射线产生方法以及半导体器件的制造方法。
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公开(公告)号：US07072438B2
公开(公告)日：2006-07-04
申请号：US10736693
申请日：2003-12-17
IPC分类号： G21K3/00
摘要： A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
摘要翻译： 反射型掩模包括其上设置有用于反射X射线的多层膜的基板，形成在用于吸收X射线的多层膜上的掩模图案，以及用于保护掩模图案的盖。 盖可拆卸地附接到基板。
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公开(公告)号：US06836531B2
公开(公告)日：2004-12-28
申请号：US10679278
申请日：2003-10-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.
摘要翻译： 曝光装置包括用于保持物体的卡盘和用于将来自光源的光引导到由卡盘保持的物体的光学系统。 该光学系统包括具有凹面反射面的多层膜反射镜，其中卡盘的接触部分的面积被设定为使得卡盘的接触部分面积达到由卡盘保持的物体的面积的至多10％ 。
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公开(公告)号：US06668037B2
公开(公告)日：2003-12-23
申请号：US09948041
申请日：2001-09-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.
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公开(公告)号：US06317479B1
公开(公告)日：2001-11-13
申请号：US08857466
申请日：1997-05-16
IPC分类号： H01L2700
摘要： An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.
摘要翻译： X射线掩模包括形成在表面上的掩模图案，安装在表面上用于形成用于保护掩模图案的防尘空间的可拆卸保护盖，当掩模图案用X射线暴露时，保护盖被分离 ，以及用于在防尘空间和外部空气之间通风的孔。
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