公开(公告)号：US06504896B2

公开(公告)日：2003-01-07

申请号：US08917373

申请日：1997-08-26

申请人： Akira Miyake ,  Masami Tsukamoto

发明人： Akira Miyake ,  Masami Tsukamoto

IPC分类号： G21K500

CPC分类号： G03F7/70058 ,  G21K1/06

摘要： An X-ray illumination optical system includes a reflection type integrator, having cylindrical surfaces, for reflecting an X-ray beam, and a concave mirror, including a rotational parabolic surface mirror, for reflecting the X-ray beam reflected by the integrator and for illuminating an object with the X-ray beam.

摘要翻译： X射线照明光学系统包括具有用于反射X射线束的圆柱面的反射型积分器和包括旋转抛物面镜的凹面镜，用于反射由积分器反射的X射线束，并且 用X射线束照射物体。

公开(公告)号：US5995582A

公开(公告)日：1999-11-30

申请号：US835721

申请日：1997-04-10

申请人： Shigeru Terashima ,  Masami Tsukamoto

发明人： Shigeru Terashima ,  Masami Tsukamoto

IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70891 ,  G21K1/06

摘要： A deflection mirror is disposed before an X-ray mask so as to reflect an X-ray beam and to project it to the X-ray mask. The X-ray mask is disposed opposed to a wafer with a distance D therebetween, and the X-ray beam reflected by the X-ray mask is projected onto the wafer through a reduction projection optical system. The deflecting mirror is disposed, in an example, at a position satisfying a relation D>L>d/(tan .delta.1+tan .delta.2) where L is the distance from the X-ray mask to an edge of the deflection mirror closer to the path of the X-ray beam reflected by the X-ray mask, d is the width of irradiation of the X-ray beam upon the X-ray mask, and .delta.1 and .delta.2 are incidence angles of the X-ray beam at upper and lower edges of the irradiation width d, respectively, upon the X-ray mask. This assures a compact structure wherein, even when a wafer of a large diameter is used, illumination light to the mask is not intercepted.

摘要翻译： 偏转镜设置在X射线掩模之前，以便反射X射线束并将其投影到X射线掩模。 X射线掩模与其间具有距离D的晶片相对设置，并且由X射线掩模反射的X射线束通过还原投影光学系统投影到晶片上。 偏转镜例如设置在满足关系D> L> d /（tanδ1 +tanδ2）的位置处，其中L是从X射线掩模到偏转镜的边缘的距离更近 到由X射线掩模反射的X射线束的路径，d是X射线掩模上的X射线束的照射宽度，δ1和δ2是X射线的入射角 在X射线掩模上分别照射宽度d的上边缘和下边缘。 这确保了紧凑的结构，其中即使当使用大直径的晶片时，不遮挡对掩模的照明光。

公开(公告)号：US09231188B2

公开(公告)日：2016-01-05

申请号：US13989970

申请日：2011-12-15

申请人： Tatsuya Suzuki ,  Masami Tsukamoto ,  Mikio Shimada ,  Toshihiro Ifuku ,  Takanori Matsuda ,  Makoto Kubota ,  Jumpei Hayashi

发明人： Tatsuya Suzuki ,  Masami Tsukamoto ,  Mikio Shimada ,  Toshihiro Ifuku ,  Takanori Matsuda ,  Makoto Kubota ,  Jumpei Hayashi

IPC分类号： H01L41/187 ,  B41J2/16 ,  C04B35/468 ,  C04B35/626 ,  C04B35/64 ,  H01L41/43 ,  H02N2/10 ,  H02N2/16 ,  B82Y30/00

CPC分类号： H01L41/43 ,  B41J2/161 ,  B41J2/1623 ,  B41J2/1632 ,  B41J2/1642 ,  B41J2/1646 ,  B82Y30/00 ,  C04B35/4682 ,  C04B35/62655 ,  C04B35/62695 ,  C04B35/64 ,  C04B2235/3201 ,  C04B2235/3203 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3222 ,  C04B2235/3227 ,  C04B2235/3232 ,  C04B2235/3236 ,  C04B2235/3244 ,  C04B2235/3262 ,  C04B2235/3267 ,  C04B2235/3287 ,  C04B2235/3293 ,  C04B2235/3298 ,  C04B2235/3418 ,  C04B2235/441 ,  C04B2235/442 ,  C04B2235/443 ,  C04B2235/449 ,  C04B2235/5445 ,  C04B2235/5454 ,  C04B2235/6562 ,  C04B2235/6567 ,  C04B2235/761 ,  C04B2235/85 ,  H01L41/1871 ,  H02N2/106 ,  H02N2/163

摘要： Provided are a barium titanate-based piezoelectric ceramics having satisfactory piezoelectric performance and a satisfactory mechanical quality factor (Qm), and a piezoelectric element using the same. Specifically provided are a piezoelectric ceramics, including: crystal particles; and a grain boundary between the crystal particles, in which the crystal particles each include barium titanate having a perovskite-type structure and manganese at 0.04% by mass or more and 0.20% by mass or less in terms of a metal with respect to the barium titanate, and the grain boundary includes at least one compound selected from the group consisting of Ba4Ti12O27 and Ba6Ti17O40, and a piezoelectric element using the same.

摘要翻译： 提供一种具有令人满意的压电性能和令人满意的机械品质因数（Qm）的钛酸钡基压电陶瓷，以及使用它的压电元件。 具体提供的是压电陶瓷，包括：晶体颗粒; 晶体粒子各自包含钛酸钙，钛酸钙，钛，钛，钛，钛，钛，钛，钛，钛，钛， 钛酸盐，并且晶界包括至少一种选自Ba 4 Ti 12 O 27和Ba 6 Ti 17 O 40的化合物和使用其的压电元件。

公开(公告)号：US20050031072A1

公开(公告)日：2005-02-10

申请号：US10930746

申请日：2004-09-01

申请人： Akira Miyake ,  Masami Tsukamoto

发明人： Akira Miyake ,  Masami Tsukamoto

IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G21K1/06

摘要： An illumination optical system for illuminating a surface to be illuminated. The illumination optical system includes a mirror having a surface effective to shape X-rays from a source into X-rays having an arcuate sectional shape, and an optical system for illuminating the surface to be illuminated, with the X-rays having an arcuate sectional shape from the mirror and in an oblique direction with respect to that surface.

摘要翻译： 一种用于照射要被照明的表面的照明光学系统。 照明光学系统包括具有有效地将来自源的X射线成形为具有弓形截面形状的X射线的表面的反射镜，以及用于照射被照射的表面的光学系统，其中X射线具有弓形截面 形状，并且相对于该表面倾斜。

公开(公告)号：US06834098B2

公开(公告)日：2004-12-21

申请号：US10119707

申请日：2002-04-11

申请人： Akira Miyake ,  Masami Tsukamoto

发明人： Akira Miyake ,  Masami Tsukamoto

IPC分类号： G21K500

CPC分类号： G03F7/70058 ,  G21K1/06

摘要： An X-ray illumination optical system for an X-ray reduction projection exposure apparatus includes an oblique projection reflection integrator having a reflection surface provided by a plurality of small cylindrical surfaces arrayed in parallel, to perform Koehler illumination of a region of arcuate shape. It enables X-ray illumination of only an arcuate region and reduces loss of light quantity and exposure time.

摘要翻译： 用于X射线折射投影曝光装置的X射线照射光学系统包括：倾斜投影反射积分器，具有由平行排列的多个小圆柱面提供的反射面，以进行弓形区域的科勒照明。 它能够仅对弓形区域进行X射线照射，并减少光量和曝光时间的损失。

公开(公告)号：US06802925B2

公开(公告)日：2004-10-12

申请号：US10230220

申请日：2002-08-29

申请人： Masaya Kobayashi ,  Toru Nagata ,  Kenji Suzuki ,  Masami Tsukamoto

发明人： Masaya Kobayashi ,  Toru Nagata ,  Kenji Suzuki ,  Masami Tsukamoto

IPC分类号： B32B3120

CPC分类号： B41M7/0027 ,  B41M5/46 ,  Y10S428/914 ,  Y10T428/24802 ,  Y10T428/265 ,  Y10T428/2813 ,  Y10T428/2848

摘要： The present invention provides a laminating film which has a thin base material processable with a low energy and a protection layer capable of giving a high optical density and a high glossiness to a printed image by lamination, and to provide a process for lamination with the laminating film. The laminating film of the present invention comprises a base material, and an image protection layer formed on the base material and having at least an adhesion layer capable of adhering to an image surface, wherein the base material has a thickness ranging from 1.5 to 6.0 &mgr;m and has an arithmetic average roughness (Ra) of not more than 50 nm and a ten point height of roughness profile (Rz) ranging from 1200 nm to 2000 nm according to JIS B0601.

摘要翻译： 本发明提供一种层压膜，其具有能够以低能量加工的薄基材和能够通过层压赋予印刷图像高的光密度和高光泽度的保护层，并提供与层压 电影。 本发明的层压膜包括基材和形成在基材上的图像保护层，并且至少具有能够附着到图像表面的粘合层，其中基材的厚度为1.5-6.0μm 并且根据JIS B0601具有不大于50nm的算术平均粗糙度（Ra）和在1200nm至2000nm范围内的十点高度的粗糙度轮廓（Rz）。

公开(公告)号：US06084938A

公开(公告)日：2000-07-04

申请号：US813349

申请日：1997-03-07

申请人： Shinichi Hara ,  Masami Tsukamoto

发明人： Shinichi Hara ,  Masami Tsukamoto

IPC分类号： G21K5/02 ,  G03F7/20 ,  G21K5/10 ,  H01L21/027 ,  H01L21/683 ,  G21K5/00

CPC分类号： G03F7/70708 ,  G03F7/70875 ,  G21K5/10

摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

公开(公告)号：US5889758A

公开(公告)日：1999-03-30

申请号：US801463

申请日：1997-02-18

申请人： Hiroshi Maehara ,  Masami Tsukamoto

发明人： Hiroshi Maehara ,  Masami Tsukamoto

IPC分类号： G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/24 ,  G03F1/60 ,  H01L21/0278

摘要： A reflection type X-ray mask structure includes an X-ray absorptive material pattern, an X-ray reflective multilayered film for reflecting X-rays, and a supporting substrate for supporting the X-ray reflective multilayered film, wherein an X-ray reflectivity of a portion other than a pattern region is lower than that of the pattern region. With this reflection type X-ray mask structure, step-and-repeat exposure or step-and-scan exposure with a semiconductor exposure apparatus does not cause undesirable multiple exposure at a boundary portion between juxtaposed exposure regions on a wafer.

摘要翻译： 反射型X射线掩模结构包括X射线吸收材料图案，用于反射X射线的X射线反射多层膜和用于支撑X射线反射多层膜的支撑衬底，其中X射线反射率 的图案区域以外的部分低于图案区域。 利用该反射型X射线掩模结构，利用半导体曝光装置的分步重复曝光或步进扫描曝光不会在晶片上并置的曝光区域之间的边界部分产生不期望的多次曝光。

公开(公告)号：US20060156940A1

公开(公告)日：2006-07-20

申请号：US11316613

申请日：2005-12-22

申请人： Noboru Kunimine ,  Masaya Kobayashi ,  Masami Tsukamoto

发明人： Noboru Kunimine ,  Masaya Kobayashi ,  Masami Tsukamoto

IPC分类号： B41N3/00

CPC分类号： B41J11/0015 ,  B41M7/0027 ,  Y10S428/913 ,  Y10S428/914 ,  Y10T428/24802 ,  Y10T428/31801

摘要： A laminate film for protecting a printed image formed on a recording medium by an ink-jet recording system, comprising a surface layer, an intermediate layer and a penetrative layer formed on a heat-resistant substrate in that order. The surface layer and the intermediate layer have a thermally softening property, the intermediate layer has a glass transition temperature lower than that of the surface layer, and the penetrative layer has a thermally melting property.

摘要翻译： 一种用于通过喷墨记录系统保护形成在记录介质上的印刷图像的层压膜，包括依次形成在耐热基板上的表面层，中间层和穿透层。 表面层和中间层具有热软化性，中间层的玻璃化转变温度低于表面层的玻璃化转变温度，渗透层具有热熔融性。

公开(公告)号：US07061573B2

公开(公告)日：2006-06-13

申请号：US09829915

申请日：2001-04-11

申请人： Masami Tsukamoto

发明人： Masami Tsukamoto

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70933 ,  G03F7/70883 ,  G03F7/70916

摘要： An exposure apparatus for illuminating a pattern with light from a light source and for exposing a predetermined surface with light from the pattern includes (i) a projection optical system for projecting the pattern onto the predetermined surface, the projection optical system having at least one optical element having optical surfaces, and (ii) a gas supplying device for locally supplying a gas to the at least one optical element. In one aspect, the gas supplying device directly blows the gas toward one of the optical surfaces of the at least one optical element, which is closest to the predetermined surface, from the predetermined surface side.

摘要翻译： 一种用于利用来自光源的光照射图案并且用于使来自图案的光暴露预定表面的曝光装置包括（i）用于将图案投影到预定表面上的投影光学系统，该投影光学系统具有至少一个光学 具有光学表面的元件，和（ii）用于向至少一个光学元件局部供应气体的气体供给装置。 在一个方面，气体供给装置将气体直接从预定表面侧吹送至最靠近预定表面的至少一个光学元件的光学表面之一。