摘要:
A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
摘要:
A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.
摘要:
A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要:
A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.
摘要:
A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要:
A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an apodized pupil. During a calibration operation, the pixels of the SLM receive varying voltage values to move them through various angles. Light reflecting from the pixels during these movements forms individual images for each pixel at each angle. The light passes through the apodized pupil and is received on one or more sections of a detector. The apodization pattern is selected so that individual pixels remain well resolved with strong sensitivity to the pixel mirror tilt. The light intensity received for each pixel at each angle is correlated to the voltage value received at the pixel to tilt the pixel to that angle producing a result signal used by a control device to calibrate the SLM.
摘要:
A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.
摘要:
The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed the rasterizer. The rasterizer generates pattern data, based on the rasterizer input data, that is adjusted to compensate for the measured misalignment. The pattern data generated by the rasterizer is passed to the spatial light modulator and used to form a second pattern, which includes compensation for the measured misalignment. In an embodiment, deformations caused, for example, by a warping a surface of the spatial light modulator are measured and used by the rasterizer to generate pattern data that compensates for the deformations.
摘要:
A method of calculating an aerial image of a spatial light modulator array includes calculating a pixel interference matrix that represents pair wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pixel interference matrix and the effective graytones. The graytones depend only on the modulation states of the pixels. The pixel interference matrix depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pixel interference matrix can be a matrix of functions. The pixel interference matrix can be a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.