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公开(公告)号：US20090021748A1
公开(公告)日：2009-01-22
申请号：US12178524
申请日：2008-07-23
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffraction pattern onto an image plane, which includes a mechanism (e.g., a shearing grating) to introduce the lateral shear. A detector is located optically conjugate with the pupil of the projection optical system, and receives an instant fringe pattern, resulting from the interference between sheared wavefronts, from the image plane. The diffraction pattern is dynamically scanned across a pupil of the projection optical system, and the resulting time-integrated interferogram obtained from the detector is used to measure the wavefront aberration across the entire pupil.
摘要翻译： 波前测量系统包括电磁辐射源。 照明系统将电磁辐射传送到物体平面。 衍射图案的来源在物体平面中。 投影光学系统将衍射图案投影到图像平面上，该图像平面包括用于引入横向剪切的机构（例如，剪切光栅）。 检测器与投影光学系统的光瞳光学共轭，并且从图像平面接收由剪切波前的干涉导致的即时条纹图案。 衍射图案被动态地扫描投影光学系统的光瞳，并且由检测器获得的所得到的时间积分干涉图用于测量整个瞳孔上的波前像差。
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2.发明授权公开(公告)号：US06965436B2
公开(公告)日：2005-11-15
申请号：US10981706
申请日：2004-11-05
CPC分类号： G03F7/70516 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
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3.发明授权System and method for calibrating a spatial light modulator array using shearing interferometry 有权使用剪切干涉法校准空间光调制器阵列的系统和方法公开(公告)号：US06847461B1
公开(公告)日：2005-01-25
申请号：US10765947
申请日：2004-01-29
CPC分类号： G03F7/70516 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要翻译： 用于校准空间光调制器阵列的系统包括照明系统和反射或透射来自照明系统的光的空间光调制器阵列。 投影光学系统将空间光调制器阵列成像到平面上。 剪切干涉仪在图像平面中产生干涉图案。 控制器控制空间光调制器阵列的元件的调制。 剪切干涉仪包括衍射光栅，棱镜，折叠镜或用于产生剪切的任何其它布置。 剪切干涉仪可以是拉伸剪切干涉仪，横向剪切干涉仪或旋转剪切干涉仪。 剪切干涉仪可以包括衍射光栅，其具有对应于整个数量的光的剪切的间距。 投影光学器件可以分辨图像平面中空间光调制器阵列的每个元素。 控制器可以调制空间光调制器阵列的元件的交替列。
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4.发明授权System and method for calibrating a spatial light modulator array using shearing interferometry 有权使用剪切干涉法校准空间光调制器阵列的系统和方法公开(公告)号：US07158238B2
公开(公告)日：2007-01-02
申请号：US11150344
申请日：2005-06-13
CPC分类号： G03F7/70591 , G01J9/0215 , G02B26/0833 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要翻译： 用于校准空间光调制器阵列的系统包括照明系统和反射或透射来自照明系统的光的空间光调制器阵列。 投影光学系统将空间光调制器阵列成像到平面上。 剪切干涉仪在图像平面中产生干涉图案。 控制器控制空间光调制器阵列的元件的调制。 剪切干涉仪包括衍射光栅，棱镜，折叠镜或用于产生剪切的任何其它布置。 剪切干涉仪可以是拉伸剪切干涉仪，横向剪切干涉仪或旋转剪切干涉仪。 剪切干涉仪可以包括衍射光栅，其具有对应于整个数量的光的剪切的间距。 投影光学器件可以分辨图像平面中空间光调制器阵列的每个元素。 控制器可以调制空间光调制器阵列的元件的交替列。
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公开(公告)号：US07580559B2
公开(公告)日：2009-08-25
申请号：US10765948
申请日：2004-01-29
CPC分类号： G03F7/70291 , G02B27/58
摘要： A method and system as used to calibrate a reflective SLM. The system can include the SLM having an array of pixels and a projection optical system resolving individual pixels and having an apodized pupil. During a calibration operation, the pixels of the SLM receive varying voltage values to move them through various angles. Light reflecting from the pixels during these movements forms individual images for each pixel at each angle. The light passes through the apodized pupil and is received on one or more sections of a detector. The apodization pattern is selected so that individual pixels remain well resolved with strong sensitivity to the pixel mirror tilt. The light intensity received for each pixel at each angle is correlated to the voltage value received at the pixel to tilt the pixel to that angle producing a result signal used by a control device to calibrate the SLM.
摘要翻译： 用于校准反光SLM的方法和系统。 该系统可以包括具有像素阵列的SLM和分辨各个像素并具有变迹光瞳的投影光学系统。 在校准操作期间，SLM的像素接收变化的电压值以将它们移动通过各种角度。 在这些移动期间从像素反射的光在每个角度形成每个像素的单独图像。 光穿过变迹的瞳孔并被接收在检测器的一个或多个部分上。 选择变迹图案，使得各个像素以对像素镜倾斜的强敏感性保持良好地分辨。 在每个角度处为每个像素接收的光强度与在像素处接收的电压值相关，以将像素倾斜到该角度，产生由控制装置用于校准SLM的结果信号。
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6.发明授权System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool 有权用于补偿无掩模光刻工具中的静态和动态不对准和变形的系统和方法公开(公告)号：US07102733B2
公开(公告)日：2006-09-05
申请号：US10917380
申请日：2004-08-13
CPC分类号： G03F7/70508 , G03F7/70291 , G03F7/70433 , G03F7/70616
摘要： The present invention provides systems and methods for maskless lithographic printing that compensate for static and/or dynamic misalignments and deformations. In an embodiment, a misalignment of a pattern formed by a spatial light modulator is measuring during printing. Rasterizer input data is generated based on the measured misalignment and passed the rasterizer. The rasterizer generates pattern data, based on the rasterizer input data, that is adjusted to compensate for the measured misalignment. The pattern data generated by the rasterizer is passed to the spatial light modulator and used to form a second pattern, which includes compensation for the measured misalignment. In an embodiment, deformations caused, for example, by a warping a surface of the spatial light modulator are measured and used by the rasterizer to generate pattern data that compensates for the deformations.
摘要翻译： 本发明提供了用于无光平版印刷的系统和方法，其补偿静态和/或动态的不对准和变形。 在一个实施例中，在打印期间测量由空间光调制器形成的图案的未对准。 光栅化器输入数据基于测量的未对准生成，并通过光栅化器。 光栅化器基于光栅化器输入数据生成图案数据，其被调整以补偿测量的未对准。 由光栅化器产生的图案数据被传递到空间光调制器并用于形成第二图案，其包括对所测量的未对准的补偿。 在一个实施例中，例如通过使空间光调制器的表面翘曲引起的变形被光栅化器测量和使用，以产生补偿变形的图案数据。
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7.发明授权System and method for calculating aerial image of a spatial light modulator 有权用于计算空间光调制器的空间图像的系统和方法公开(公告)号：US07394584B2
公开(公告)日：2008-07-01
申请号：US11169587
申请日：2005-06-30
申请人： Azat M. Latypov
发明人： Azat M. Latypov
CPC分类号： G03F7/70441 , G03F7/70283 , G03F7/70291 , G03F7/705 , G03F7/70508 , G03F7/70666
摘要： A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.
摘要翻译： 计算空间光调制器阵列的空间像的方法包括计算空间光调制器阵列的像素之间的成对干涉; 计算与像素的调制状态对应的有效灰度; 并基于成对干扰和有效灰度计算航空图像。 灰度只取决于像素的调制状态。 成对干扰仅取决于位置变量。 位置变量是图像平面中的位置和电磁辐射源的平面中的位置。 成对干扰可以由功能矩阵表示。 成对干扰可以由四维矩阵表示。 使用sinc函数或使用多项式函数近似有效的灰度。
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8.发明授权公开(公告)号：US07826142B2
公开(公告)日：2010-11-02
申请号：US11117490
申请日：2005-04-29
申请人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
发明人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
IPC分类号： G02B3/00
CPC分类号： G02B27/0012
摘要： An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.
摘要翻译： 本发明的实施例提供了一种用于设计光学表面的方法。 根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。 计算由每个光学表面引起的波前像差。 然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。 根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。
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9.发明授权公开(公告)号：US07773287B2
公开(公告)日：2010-08-10
申请号：US11790222
申请日：2007-04-24
IPC分类号： G02B26/00
CPC分类号： G03F7/70291
摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.
摘要翻译： 公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。 所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。 所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。 该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。 还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。 每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。 两个或更多个反射镜中的每一个可以被单独地致动。
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10.发明授权Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane 有权利用在瞳平面上放置图案形成装置的光刻设备和装置制造方法公开(公告)号：US07423732B2
公开(公告)日：2008-09-09
申请号：US11194576
申请日：2005-08-02
申请人： Matthew Lipson , Azat M. Latypov
发明人： Matthew Lipson , Azat M. Latypov
CPC分类号： G03F7/70291 , G03F7/70283
摘要： A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patterned radiation onto a target portion of a substrate. In one example, an additional patterning device is located at an object plane of the lithography system and patterns the radiation before the patterning device at the pupil plane.
摘要翻译： 光刻系统包括提供辐射的照明系统和包括位于光瞳面的光学系统和图案形成装置的投影系统。 图案形成装置对辐射进行图案化，光学系统将图案化的辐射投影到基板的目标部分上。 在一个示例中，附加图案形成装置位于光刻系统的物平面处，并且在图案形成装置之前在光瞳面上对辐射进行图案化。
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