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1.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US07688423B2
公开(公告)日：2010-03-30
申请号：US12178522
申请日：2008-07-23
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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2.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠公开(公告)号：US07133121B2
公开(公告)日：2006-11-07
申请号：US11098561
申请日：2005-04-05
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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3.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07773199B2
公开(公告)日：2010-08-10
申请号：US12000523
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联， 第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。 第一区域和第二区域在重叠区域中重叠。
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4.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07630054B2
公开(公告)日：2009-12-08
申请号：US12000522
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。
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5.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US07410736B2
公开(公告)日：2008-08-12
申请号：US10673922
申请日：2003-09-30
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Azat Latypov
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Azat Latypov
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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6.发明授权Maskless lithography systems and methods utilizing spatial light modulator arrays 有权无掩模光刻系统和利用空间光调制器阵列的方法公开(公告)号：US07403266B2
公开(公告)日：2008-07-22
申请号：US11331064
申请日：2006-01-13
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Jason Douglas Hintersteiner , Andrew W. McCullough , Solomon S. Wasserman , Karel Diederick Van Der Mast
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Jason Douglas Hintersteiner , Andrew W. McCullough , Solomon S. Wasserman , Karel Diederick Van Der Mast
CPC分类号： G03F7/70466 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
摘要翻译： 在对象上写入图案的无掩模光刻系统。 该系统可以包括照明系统，物体，空间光调制器（SLM）和控制器。 在对象接收到光之前，SLM可以对来自照明系统的光进行图案化。 SLM可以包括一个前导集合和一组尾随SLM。 前导和后置集合中的SLM根据对象的扫描方向而改变。 控制器可以基于光脉冲周期信息，关于SLM的物理布局信息和对象的扫描速度中的至少一个来向SLM发送控制信号。 该系统还可以使用各种方法校正剂量不均匀性。
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7.发明授权Maskless lithography systems and methods utilizing spatial light modulator arrays 失效无掩模光刻系统和利用空间光调制器阵列的方法公开(公告)号：US07061591B2
公开(公告)日：2006-06-13
申请号：US10449908
申请日：2003-05-30
CPC分类号： G03F7/70466 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.
摘要翻译： 在对象上写入图案的无掩模光刻系统。 该系统可以包括照明系统，物体，空间光调制器（SLM）和控制器。 在对象接收到光之前，SLM可以对来自照明系统的光进行图案化。 SLM可以包括一个前导集合和一组尾随SLM。 前导和后置集合中的SLM根据对象的扫描方向而改变。 控制器可以基于光脉冲周期信息，关于SLM的物理布局信息和对象的扫描速度中的至少一个来向SLM发送控制信号。 该系统还可以使用各种方法校正剂量不均匀性。
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公开(公告)号：US06876440B1
公开(公告)日：2005-04-05
申请号：US10674070
申请日：2003-09-30
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
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公开(公告)号：US20070273853A1
公开(公告)日：2007-11-29
申请号：US11655999
申请日：2007-01-22
申请人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
发明人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
IPC分类号： G03B27/32
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译： 将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。
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10.发明授权System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks 有权用于模拟二进制，衰减相移和交替相移掩模的无掩模光刻的系统，装置和方法公开(公告)号：US07274502B2
公开(公告)日：2007-09-25
申请号：US11018483
申请日：2004-12-22
申请人： Nabila Baba-Ali , Arno Bleeker
发明人： Nabila Baba-Ali , Arno Bleeker
IPC分类号： G02B26/00
CPC分类号： G03F7/70291 , G02B26/0833
摘要： A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.
摘要翻译： 提出了一种用于无掩模光刻的倾斜镜设计。 在该反射镜中，倾斜部分占整个元件面积的大约60％。 周围空间相对于倾斜部分被制成100％反射和异相。 反射镜的倾斜部分和异相部分之间的比率被优化，以便在整个倾斜角范围内产生相等的正和负最大幅度。
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