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1.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US07688423B2
公开(公告)日：2010-03-30
申请号：US12178522
申请日：2008-07-23
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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2.发明授权System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode 有权通过计算定制的最佳瞳孔场和照明模式来进行成像增强的系统和方法公开(公告)号：US07542013B2
公开(公告)日：2009-06-02
申请号：US11046236
申请日：2005-01-31
IPC分类号： G02F1/1335 , G02B26/00
CPC分类号： G03F7/70116
摘要： A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
摘要翻译： 一种基于瞳孔场分布图案化辐射束的系统和方法。 在一个实施例中，选择影响图像和照明模式的光瞳平面区域中的场的分布，以使得具有期望特性的图像。 另外和/或可选地，选择照明模式以便渲染具有期望特性的图像。 然后使用空间光调制器实现影像影像的瞳平面区域的场分布。 该系统和方法包括使用照明系统，图案发生器和投影仪。 照明系统提供一束辐射。 图案发生器基于与瞳孔平面中的场分布相对应的数据集来对辐射束进行图案化。 投影仪将图案化的光束投射到物体的目标部分上。
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3.发明授权System and method for calculating aerial image of a spatial light modulator 有权用于计算空间光调制器的空间图像的系统和方法公开(公告)号：US07394584B2
公开(公告)日：2008-07-01
申请号：US11169587
申请日：2005-06-30
申请人： Azat M. Latypov
发明人： Azat M. Latypov
CPC分类号： G03F7/70441 , G03F7/70283 , G03F7/70291 , G03F7/705 , G03F7/70508 , G03F7/70666
摘要： A method of calculating an aerial image of a spatial light modulator array includes calculating pair-wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pair-wise interference and the effective graytones. The graytones depend only on the modulation states of the pixels. The pair-wise interference depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pair-wise interference can be represented by a matrix of functions. The pair-wise interference can be represented by a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.
摘要翻译： 计算空间光调制器阵列的空间像的方法包括计算空间光调制器阵列的像素之间的成对干涉; 计算与像素的调制状态对应的有效灰度; 并基于成对干扰和有效灰度计算航空图像。 灰度只取决于像素的调制状态。 成对干扰仅取决于位置变量。 位置变量是图像平面中的位置和电磁辐射源的平面中的位置。 成对干扰可以由功能矩阵表示。 成对干扰可以由四维矩阵表示。 使用sinc函数或使用多项式函数近似有效的灰度。
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4.发明授权公开(公告)号：US07826142B2
公开(公告)日：2010-11-02
申请号：US11117490
申请日：2005-04-29
申请人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
发明人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
IPC分类号： G02B3/00
CPC分类号： G02B27/0012
摘要： An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.
摘要翻译： 本发明的实施例提供了一种用于设计光学表面的方法。 根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。 计算由每个光学表面引起的波前像差。 然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。 根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。
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公开(公告)号：US20090021748A1
公开(公告)日：2009-01-22
申请号：US12178524
申请日：2008-07-23
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/0215
摘要： A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffraction pattern onto an image plane, which includes a mechanism (e.g., a shearing grating) to introduce the lateral shear. A detector is located optically conjugate with the pupil of the projection optical system, and receives an instant fringe pattern, resulting from the interference between sheared wavefronts, from the image plane. The diffraction pattern is dynamically scanned across a pupil of the projection optical system, and the resulting time-integrated interferogram obtained from the detector is used to measure the wavefront aberration across the entire pupil.
摘要翻译： 波前测量系统包括电磁辐射源。 照明系统将电磁辐射传送到物体平面。 衍射图案的来源在物体平面中。 投影光学系统将衍射图案投影到图像平面上，该图像平面包括用于引入横向剪切的机构（例如，剪切光栅）。 检测器与投影光学系统的光瞳光学共轭，并且从图像平面接收由剪切波前的干涉导致的即时条纹图案。 衍射图案被动态地扫描投影光学系统的光瞳，并且由检测器获得的所得到的时间积分干涉图用于测量整个瞳孔上的波前像差。
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6.发明授权公开(公告)号：US06965436B2
公开(公告)日：2005-11-15
申请号：US10981706
申请日：2004-11-05
CPC分类号： G03F7/70516 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
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7.发明授权公开(公告)号：US07773287B2
公开(公告)日：2010-08-10
申请号：US11790222
申请日：2007-04-24
IPC分类号： G02B26/00
CPC分类号： G03F7/70291
摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.
摘要翻译： 公开了一种用于确定空间光调制器（SLM）的特定像素调制状态以在衬底上打印所需图案的方法和系统。 所述方法包括：在所述期望图案的物平面中选择至少一个超像素，所述超像素由至少两个像素形成。 所需图案的至少一个边缘穿过超像素内的边界，所述至少一个边缘由相对于超像素的特定斜率和位置参数限定。 该方法还包括（i）形成内插表以列出预先计算的像素调制状态，以及（ii）根据内插表确定每个像素的特定像素调制状态。 还公开了一种用于提供空间光调制器（SLM）的方法和系统。 SLM包括被构造成形成超像素组的多个反射镜。 每个超像素（i）包括来自多个反射镜的两个或更多个反射镜，并且（ii）被配置为仅切换一个像素的光。 两个或更多个反射镜中的每一个可以被单独地致动。
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8.发明授权Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane 有权利用在瞳平面上放置图案形成装置的光刻设备和装置制造方法公开(公告)号：US07423732B2
公开(公告)日：2008-09-09
申请号：US11194576
申请日：2005-08-02
申请人： Matthew Lipson , Azat M. Latypov
发明人： Matthew Lipson , Azat M. Latypov
CPC分类号： G03F7/70291 , G03F7/70283
摘要： A lithography system comprises an illumination system that supplies radiation and a projection system comprising an optical system and a patterning device located at a pupil plane. The patterning device patterns the radiation and the optical system projects the patterned radiation onto a target portion of a substrate. In one example, an additional patterning device is located at an object plane of the lithography system and patterns the radiation before the patterning device at the pupil plane.
摘要翻译： 光刻系统包括提供辐射的照明系统和包括位于光瞳面的光学系统和图案形成装置的投影系统。 图案形成装置对辐射进行图案化，光学系统将图案化的辐射投影到基板的目标部分上。 在一个示例中，附加图案形成装置位于光刻系统的物平面处，并且在图案形成装置之前在光瞳面上对辐射进行图案化。
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9.发明授权System and method for calibrating a spatial light modulator array using shearing interferometry 有权使用剪切干涉法校准空间光调制器阵列的系统和方法公开(公告)号：US06847461B1
公开(公告)日：2005-01-25
申请号：US10765947
申请日：2004-01-29
CPC分类号： G03F7/70516 , G03F7/70291
摘要： A system for calibrating a spatial light modulator array includes an illumination system and a spatial light modulator array that reflects or transmits light from the illumination system. A projection optical system images the spatial light modulator array onto an image plane. A shearing interferometer creates an interference pattern in the image plane. A controller controls modulation of elements of the spatial light modulator array. The shearing interferometer includes a diffraction grating, a prism, a folding mirror or any other arrangement for generating shear. The shearing interferometer can be a stretching shearing interferometer, a lateral shearing interferometer, or a rotational shearing interferometer. The shearing interferometer may include a diffraction grating with a pitch corresponding to a shear of the light by an integer number of elements. The projection optics resolves each element of the spatial light modulator array in the image plane. The controller can modulate alternate columns of elements of the spatial light modulator array.
摘要翻译： 用于校准空间光调制器阵列的系统包括照明系统和反射或透射来自照明系统的光的空间光调制器阵列。 投影光学系统将空间光调制器阵列成像到平面上。 剪切干涉仪在图像平面中产生干涉图案。 控制器控制空间光调制器阵列的元件的调制。 剪切干涉仪包括衍射光栅，棱镜，折叠镜或用于产生剪切的任何其它布置。 剪切干涉仪可以是拉伸剪切干涉仪，横向剪切干涉仪或旋转剪切干涉仪。 剪切干涉仪可以包括衍射光栅，其具有对应于整个数量的光的剪切的间距。 投影光学器件可以分辨图像平面中空间光调制器阵列的每个元素。 控制器可以调制空间光调制器阵列的元件的交替列。
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10.发明授权Method to remove station-induced error pattern from measured object characteristics and compensate the measured object characteristics with the error 失效从测量对象特征中去除站引起的误差模式的方法，并用误差补偿测量对象特性公开(公告)号：US06275770B1
公开(公告)日：2001-08-14
申请号：US09321034
申请日：1999-05-27
申请人： Azat M. Latypov
发明人： Azat M. Latypov
IPC分类号： G01N2100
CPC分类号： G01N21/88 , G01B11/306
摘要： In the measurement of the surface of a wafer mounted on a mounting device, a method of removing the errors induced by the mounting device from the measurement data. The method includes the steps of 1) measuring a plurality of points on the surface to obtain a first matrix which contains the device induced errors and the proper surface of the object; 2) rotating the object independently of the mounting device; 3) measuring the rotated object to obtain a second matrix which contains the device induced errors and the proper surface of the object as transformed by a rotation matrix; 4) obtaining the difference of the second matrix and the first matrix thereby eliminating the device induced error; and 5) applying the inverses of LU matrices on the difference of the rotation matrix and an identity matrix to obtain the proper surface. In step 5, the process involves flipping the wafer and measuring the surface as flipped.
摘要翻译： 在安装在安装装置上的晶片的表面的测量中，将从安装装置引起的误差除去测量数据的方法。 该方法包括以下步骤：1）测量表面上的多个点以获得包含装置感应误差和物体的适当表面的第一矩阵; 2）独立于安装装置旋转物体; 3）测量旋转对象以获得包含由旋转矩阵转换的装置感应误差和对象正确表面的第二矩阵; 4）获得第二矩阵和第一矩阵的差，从而消除器件感应误差; 以及5）将LU矩阵的反转应用于旋转矩阵和单位矩阵的差异以获得适当的表面。 在步骤5中，该过程涉及翻转晶片并且在翻转时测量表面。
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