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    Microlithographic projection exposure apparatus
    11.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US08891057B2

    公开(公告)日：2014-11-18

    申请号：US12818501

    申请日：2010-06-18

    Applicant: Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC: G03B27/42 ,  G03F7/20

    CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    Abstract translation: 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    Illumination system for illuminating a mask in a microlithographic exposure apparatus
    13.
    发明授权
    Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
    用于在微光刻曝光设备中照射掩模的照明系统

    公开(公告)号：US08467031B2

    公开(公告)日：2013-06-18

    申请号：US12795014

    申请日：2010-06-07

    Applicant: Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    Inventor： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    IPC: G03B27/68 ,  G03B27/32

    CPC classification number: G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

    Abstract: An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

    Abstract translation: 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。

    COMPONENT FOR SETTING A SCAN-INTEGRATED ILLUMINATION ENERGY IN AN OBJECT PLANE OF A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
    14.
    发明申请
    COMPONENT FOR SETTING A SCAN-INTEGRATED ILLUMINATION ENERGY IN AN OBJECT PLANE OF A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS 有权
    用于在微观投影曝光装置的对象平面中设置扫描一体化照明能量的组件

    公开(公告)号：US20110096317A1

    公开(公告)日：2011-04-28

    申请号：US12916882

    申请日：2010-11-01

    Applicant: Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

    Inventor： Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

    IPC: G03B27/72 ,  G02B26/02 ,  G03F7/20

    CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/70558

    Abstract: A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.

    Abstract translation: 公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。 该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分 可以由至少一个隔膜取消。 单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。 这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    16.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20100283985A1

    公开(公告)日：2010-11-11

    申请号：US12818844

    申请日：2010-06-18

    Applicant: Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    Inventor： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

    IPC: G03B27/54

    CPC classification number: G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

    Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

    Abstract translation: 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

    ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    17.
    发明申请
    ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    用于在微波投影曝光装置中照射掩模的照明系统

    公开(公告)号：US20100157269A1

    公开(公告)日：2010-06-24

    申请号：US12711059

    申请日：2010-02-23

    Applicant: Markus Deguenther ,  Michael Layh

    Inventor： Markus Deguenther ,  Michael Layh

    IPC: G03B27/54

    CPC classification number: G03F7/702 ,  G03F7/70116

    Abstract: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

    Abstract translation: 用于在扫描微光刻投影曝光装置中照射掩模的照明系统具有物镜，其具有物平面，至少一个瞳孔表面和可以布置掩模的图像平面。 提供反射或透明光束偏转元件的光束偏转阵列，其中每个光束偏转元件适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件布置在物镜的物平面中或紧邻物镜的物平面。

    MICROLITHOGRAPHIC ILLUMINATION SYSTEM
    19.
    发明申请
    MICROLITHOGRAPHIC ILLUMINATION SYSTEM 有权
    微电子照明系统

    公开(公告)号：US20090021715A1

    公开(公告)日：2009-01-22

    申请号：US12190179

    申请日：2008-08-12

    Applicant: Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    Inventor： Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    IPC: G03B27/54

    CPC classification number: G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70191

    Abstract: A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.

    Abstract translation: 微光刻照明系统可以包括能够在第一照明平面中产生二维强度分布的配光装置。 光栅元件的第一光栅阵列可以产生二次光源的光栅阵列。 具有附加光学效果的装置可以被布置在与两个光栅阵列相邻的空间上。 该装置可以被配置为照明角度变化装置。 该装置可以影响照明光的强度和/或相位和/或光束方向。 影响可以是使光栅元素对总照明强度的贡献度可以在整个照明场中变化。 这可以使照明强度以相对于总照明强度和/或相对于来自不同照明方向的强度贡献的限定方式影响整个照明场。

    Microlithographic illumination system
    20.
    发明授权
    Microlithographic illumination system 有权
    微光刻照明系统

    公开(公告)号：US08705005B2

    公开(公告)日：2014-04-22

    申请号：US12190179

    申请日：2008-08-12

    Applicant: Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    Inventor： Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70191

    Abstract: A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.

    Abstract translation: 微光刻照明系统可以包括能够在第一照明平面中产生二维强度分布的配光装置。 光栅元件的第一光栅阵列可以产生二次光源的光栅阵列。 具有附加光学效果的装置可以被布置在与两个光栅阵列相邻的空间上。 该装置可以被配置为照明角度变化装置。 该装置可以影响照明光的强度和/或相位和/或光束方向。 影响可以是使光栅元素对总照明强度的贡献度可以在整个照明场中变化。 这可以使照明强度以相对于总照明强度和/或相对于来自不同照明方向的强度贡献的限定方式影响整个照明场。

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